Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition
F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, Thin Solid Films 446 (2004) 167–171.

Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD
F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.

W/Si multilayers deposited by hot-filament MOCVD
F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, U. Heinzmann, Thin Solid Films 338 (1999) 70–74.