Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases
F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A. Szekeres, K. Gesheva, Vacuum 76 (2004) 139–142.

Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions
F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, A. Gushterov, A. Szekeres, S. Simeonov, Vacuum 75 (2004) 307–312.

Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films
T. Ivanova, K. Gesheva, F. Hamelmann, G. Popkirov, M. Abrashev, M. Ganchev, E. Tzvetkova, Vacuum 76 (2004) 195–198.