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Senderak <i>et al.</i>, “Thermal stability of W1−xSix/Si multilayers under rapid thermal annealing,” <i>Journal of Applied Physics</i>, vol. 81, no. 5, pp. 2229–2235, 1997.","mla":"Senderak, R., et al. “Thermal Stability of W1−xSix/Si Multilayers under Rapid Thermal Annealing.” <i>Journal of Applied Physics</i>, vol. 81, no. 5, AIP Publishing, 1997, pp. 2229–35, doi:<a href=\"https://doi.org/10.1063/1.364273\">10.1063/1.364273</a>.","ama":"Senderak R, Jergel M, Luby S, et al. Thermal stability of W1−xSix/Si multilayers under rapid thermal annealing. <i>Journal of Applied Physics</i>. 1997;81(5):2229-2235. doi:<a href=\"https://doi.org/10.1063/1.364273\">10.1063/1.364273</a>","chicago":"Senderak, R., M. Jergel, S. Luby, E. Majkova, V. Holy, G. Haindl, Frank Hamelmann, U. Kleineberg, and U. Heinzmann. “Thermal Stability of W1−xSix/Si Multilayers under Rapid Thermal Annealing.” <i>Journal of Applied Physics</i> 81, no. 5 (1997): 2229–35. <a href=\"https://doi.org/10.1063/1.364273\">https://doi.org/10.1063/1.364273</a>.","short":"R. Senderak, M. Jergel, S. Luby, E. Majkova, V. Holy, G. Haindl, F. Hamelmann, U. Kleineberg, U. Heinzmann, Journal of Applied Physics 81 (1997) 2229–2235."},"status":"public","doi":"10.1063/1.364273","intvolume":"        81","date_updated":"2026-03-17T15:28:46Z","page":"2229-2235","publisher":"AIP Publishing"}]