@article{3551,
  author       = {Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.},
  issn         = {15213862},
  journal      = {Chemical Vapor Deposition},
  number       = {2},
  pages        = {63--66},
  publisher    = {Wiley},
  title        = {{Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}},
  doi          = {10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q},
  volume       = {6},
  year         = {2000},
}