[{"_id":"3551","year":"2000","language":[{"iso":"eng"}],"doi":"10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","intvolume":"         6","date_updated":"2026-03-17T15:28:46Z","page":"63-66","publisher":"Wiley","citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span>: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: <i>Chemical Vapor Deposition</i> Bd. 6, Wiley (2000), Nr. 2, S. 63–66","apa":"Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., &#38; Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>, <i>6</i>(2), 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","bibtex":"@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }","ieee":"A. Klipp <i>et al.</i>, “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, pp. 63–66, 2000.","mla":"Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.","ama":"Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>. 2000;6(2):63-66. doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","short":"A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.","chicago":"Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i> 6, no. 2 (2000): 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>."},"author":[{"full_name":"Klipp, A.","last_name":"Klipp","first_name":"A."},{"id":"208487","first_name":"Frank","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","last_name":"Hamelmann"},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"first_name":"J.","last_name":"Hartwich","full_name":"Hartwich, J."},{"last_name":"Kleineberg","full_name":"Kleineberg, U.","first_name":"U."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."},{"first_name":"U.","last_name":"Heinzmann","full_name":"Heinzmann, U."}],"status":"public","publication_status":"published","issue":"2","publication":"Chemical Vapor Deposition","type":"journal_article","publication_identifier":{"issn":["09481907"],"eissn":["15213862"]},"user_id":"216459","date_created":"2023-09-01T10:04:14Z","title":"Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films","volume":6}]