[{"title":"The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions","date_created":"2023-09-01T10:01:28Z","user_id":"216459","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"type":"book_chapter","publication":"Organosilicon Chemistry IV","publication_status":"published","status":"public","place":"Weinheim, Germany","author":[{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"first_name":"S. H. A.","full_name":"Petri, S. H. A.","last_name":"Petri"},{"first_name":"P.","last_name":"Jutzi","full_name":"Jutzi, P."},{"first_name":"Frank","id":"208487","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank","last_name":"Hamelmann"},{"last_name":"Heinmann","full_name":"Heinmann, U.","first_name":"U."}],"citation":{"ama":"Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:806-811. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>","mla":"Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 806–11, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>.","short":"A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 806–811.","chicago":"Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>.","bibtex":"@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany}, title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp, A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }","apa":"Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., &#38; Heinmann, U. (2000). The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>","alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Heinmann, U.</span>: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811","ieee":"A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811."},"publisher":"Wiley-VCH Verlag GmbH","page":"806-811","date_updated":"2026-03-17T15:28:46Z","doi":"10.1002/9783527619917.ch123","language":[{"iso":"eng"}],"year":"2000","_id":"3548","editor":[{"first_name":"Norbert","full_name":"Auner, Norbert","last_name":"Auner"},{"first_name":"Johann","full_name":"Weis, Johann","last_name":"Weis"}]},{"page":"798-805","publisher":"Wiley-VCH Verlag GmbH","date_updated":"2026-03-17T15:28:46Z","doi":"10.1002/9783527619917.ch122","status":"public","place":"Weinheim, Germany","author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874"},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"last_name":"Hartwich","full_name":"Hartwich, J.","first_name":"J."},{"last_name":"Kleineberg","full_name":"Kleineberg, U.","first_name":"U."},{"last_name":"Heinzmann","full_name":"Heinzmann, U.","first_name":"U."},{"first_name":"A.","full_name":"Klipp, A.","last_name":"Klipp"},{"first_name":"S. H. A.","full_name":"Petri, S. H. A.","last_name":"Petri"},{"first_name":"P.","full_name":"Jutzi, P.","last_name":"Jutzi"}],"citation":{"ieee":"F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805","bibtex":"@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000, place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={798–805} }","apa":"Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp, A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>","short":"F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.","chicago":"Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>.","mla":"Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 798–805, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>.","ama":"Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>"},"language":[{"iso":"eng"}],"year":"2000","editor":[{"first_name":"Norbert","last_name":"Auner","full_name":"Auner, Norbert"},{"first_name":"Johann","last_name":"Weis","full_name":"Weis, Johann"}],"_id":"3549","title":"In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors","date_created":"2023-09-01T10:02:22Z","publication_status":"published","publication":"Organosilicon Chemistry IV","user_id":"216459","publication_identifier":{"isbn":["9783527298549"],"eisbn":["9783527619917"]},"type":"book_chapter"}]