---
_id: '3548'
author:
- first_name: A.
  full_name: Klipp, A.
  last_name: Klipp
- first_name: S. H. A.
  full_name: Petri, S. H. A.
  last_name: Petri
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: U.
  full_name: Heinmann, U.
  last_name: Heinmann
citation:
  alphadin: '<span style="font-variant:small-caps;">Klipp, A.</span> ; <span style="font-variant:small-caps;">Petri,
    S. H. A.</span> ; <span style="font-variant:small-caps;">Jutzi, P.</span> ; <span
    style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span style="font-variant:small-caps;">Heinmann,
    U.</span>: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
    under Thermal CVD Conditions. In: <span style="font-variant:small-caps;">Auner,
    N.</span> ; <span style="font-variant:small-caps;">Weis, J.</span> (Hrsg.): <i>Organosilicon
    Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811'
  ama: 'Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl
    Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In:
    Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH
    Verlag GmbH; 2000:806-811. doi:<a href="https://doi.org/10.1002/9783527619917.ch123">10.1002/9783527619917.ch123</a>'
  apa: 'Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., &#38; Heinmann, U. (2000).
    The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
    under Thermal CVD Conditions. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon
    Chemistry IV</i> (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href="https://doi.org/10.1002/9783527619917.ch123">https://doi.org/10.1002/9783527619917.ch123</a>'
  bibtex: '@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany},
    title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
    under Thermal CVD Conditions}, DOI={<a href="https://doi.org/10.1002/9783527619917.ch123">10.1002/9783527619917.ch123</a>},
    booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp,
    A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner,
    Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }'
  chicago: 'Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann.
    “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation
    under Thermal CVD Conditions.” In <i>Organosilicon Chemistry IV</i>, edited by
    Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH,
    2000. <a href="https://doi.org/10.1002/9783527619917.ch123">https://doi.org/10.1002/9783527619917.ch123</a>.'
  ieee: 'A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis
    of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal
    CVD Conditions,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds.
    Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.'
  mla: Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes
    and Their Fragmentation under Thermal CVD Conditions.” <i>Organosilicon Chemistry
    IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000,
    pp. 806–11, doi:<a href="https://doi.org/10.1002/9783527619917.ch123">10.1002/9783527619917.ch123</a>.
  short: 'A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner,
    J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany,
    2000, pp. 806–811.'
date_created: 2023-09-01T10:01:28Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/9783527619917.ch123
editor:
- first_name: Norbert
  full_name: Auner, Norbert
  last_name: Auner
- first_name: Johann
  full_name: Weis, Johann
  last_name: Weis
language:
- iso: eng
page: 806-811
place: Weinheim, Germany
publication: Organosilicon Chemistry IV
publication_identifier:
  eisbn:
  - '9783527619917'
  isbn:
  - '9783527298549'
publication_status: published
publisher: Wiley-VCH Verlag GmbH
status: public
title: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
  under Thermal CVD Conditions
type: book_chapter
user_id: '216459'
year: '2000'
...
---
_id: '3549'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: G.
  full_name: Haindl, G.
  last_name: Haindl
- first_name: J.
  full_name: Hartwich, J.
  last_name: Hartwich
- first_name: U.
  full_name: Kleineberg, U.
  last_name: Kleineberg
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
- first_name: A.
  full_name: Klipp, A.
  last_name: Klipp
- first_name: S. H. A.
  full_name: Petri, S. H. A.
  last_name: Petri
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
citation:
  alphadin: '<span style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span
    style="font-variant:small-caps;">Haindl, G.</span> ; <span style="font-variant:small-caps;">Hartwich,
    J.</span> ; <span style="font-variant:small-caps;">Kleineberg, U.</span> ; <span
    style="font-variant:small-caps;">Heinzmann, U.</span> ; <span style="font-variant:small-caps;">Klipp,
    A.</span> ; <span style="font-variant:small-caps;">Petri, S. H. A.</span> ; <span
    style="font-variant:small-caps;">Jutzi, P.</span>: In-Situ Controlled Deposition
    of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3
    as Silicon Precursors. In: <span style="font-variant:small-caps;">Auner, N.</span>
    ; <span style="font-variant:small-caps;">Weis, J.</span> (Hrsg.): <i>Organosilicon
    Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805'
  ama: 'Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of
    Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as
    Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>.
    Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href="https://doi.org/10.1002/9783527619917.ch122">10.1002/9783527619917.ch122</a>'
  apa: 'Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp,
    A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by
    Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In
    N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805).
    Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href="https://doi.org/10.1002/9783527619917.ch122">https://doi.org/10.1002/9783527619917.ch122</a>'
  bibtex: '@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000,
    place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon
    Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors},
    DOI={<a href="https://doi.org/10.1002/9783527619917.ch122">10.1002/9783527619917.ch122</a>},
    booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann,
    Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and
    Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis,
    JohannEditors}, year={2000}, pages={798–805} }'
  chicago: 'Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann,
    A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin
    Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon
    Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and
    Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href="https://doi.org/10.1002/9783527619917.ch122">https://doi.org/10.1002/9783527619917.ch122</a>.'
  ieee: 'F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon
    Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,”
    in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany:
    Wiley-VCH Verlag GmbH, 2000, pp. 798–805.'
  mla: Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films
    by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.”
    <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH
    Verlag GmbH, 2000, pp. 798–805, doi:<a href="https://doi.org/10.1002/9783527619917.ch122">10.1002/9783527619917.ch122</a>.
  short: 'F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp,
    S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry
    IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.'
date_created: 2023-09-01T10:02:22Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/9783527619917.ch122
editor:
- first_name: Norbert
  full_name: Auner, Norbert
  last_name: Auner
- first_name: Johann
  full_name: Weis, Johann
  last_name: Weis
language:
- iso: eng
page: 798-805
place: Weinheim, Germany
publication: Organosilicon Chemistry IV
publication_identifier:
  eisbn:
  - '9783527619917'
  isbn:
  - '9783527298549'
publication_status: published
publisher: Wiley-VCH Verlag GmbH
status: public
title: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with
  (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors
type: book_chapter
user_id: '216459'
year: '2000'
...