@article{3542,
  author       = {Hamelmann, Frank and Brechling, A. and Aschentrup, A. and Heinzmann, U. and Jutzi, P. and Sandrock, J. and Siemeling, U. and Ivanova, T. and Szekeres, A. and Gesheva, K.},
  issn         = {00406090},
  journal      = {Thin Solid Films},
  number       = {2},
  pages        = {167--171},
  publisher    = {Elsevier BV},
  title        = {{Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition}},
  doi          = {10.1016/j.tsf.2003.09.045},
  volume       = {446},
  year         = {2004},
}

@article{3550,
  author       = {Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and Jergel, M and Luby, S},
  issn         = {00406090},
  journal      = {Thin Solid Films},
  number       = {1-2},
  pages        = {90--93},
  publisher    = {Elsevier BV},
  title        = {{Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}},
  doi          = {10.1016/S0040-6090(99)00695-1},
  volume       = {358},
  year         = {2000},
}

@article{3553,
  author       = {Hamelmann, Frank and Petri, S.H.A. and Klipp, A. and Haindl, G. and Hartwich, J. and Dreeskornfeld, L. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.},
  issn         = {00406090},
  journal      = {Thin Solid Films},
  number       = {1-2},
  pages        = {70--74},
  publisher    = {Elsevier BV},
  title        = {{W/Si multilayers deposited by hot-filament MOCVD}},
  doi          = {10.1016/S0040-6090(98)00996-1},
  volume       = {338},
  year         = {1999},
}