[{"date_created":"2023-09-01T09:55:56Z","title":"Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition","volume":446,"type":"journal_article","publication_identifier":{"issn":["00406090"]},"user_id":"216459","publication_status":"published","issue":"2","publication":"Thin Solid Films","author":[{"last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","id":"208487","first_name":"Frank"},{"first_name":"A.","last_name":"Brechling","full_name":"Brechling, A."},{"first_name":"A.","last_name":"Aschentrup","full_name":"Aschentrup, A."},{"first_name":"U.","last_name":"Heinzmann","full_name":"Heinzmann, U."},{"first_name":"P.","full_name":"Jutzi, P.","last_name":"Jutzi"},{"first_name":"J.","last_name":"Sandrock","full_name":"Sandrock, J."},{"first_name":"U.","full_name":"Siemeling, U.","last_name":"Siemeling"},{"last_name":"Ivanova","full_name":"Ivanova, T.","first_name":"T."},{"last_name":"Szekeres","full_name":"Szekeres, A.","first_name":"A."},{"full_name":"Gesheva, K.","last_name":"Gesheva","first_name":"K."}],"citation":{"ama":"Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. <i>Thin Solid Films</i>. 2004;446(2):167-171. doi:<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>","mla":"Hamelmann, Frank, et al. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” <i>Thin Solid Films</i>, vol. 446, no. 2, Elsevier BV, 2004, pp. 167–71, doi:<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>.","short":"F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, Thin Solid Films 446 (2004) 167–171.","chicago":"Hamelmann, Frank, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, and K. Gesheva. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” <i>Thin Solid Films</i> 446, no. 2 (2004): 167–71. <a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">https://doi.org/10.1016/j.tsf.2003.09.045</a>.","apa":"Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., … Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. <i>Thin Solid Films</i>, <i>446</i>(2), 167–171. <a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">https://doi.org/10.1016/j.tsf.2003.09.045</a>","bibtex":"@article{Hamelmann_Brechling_Aschentrup_Heinzmann_Jutzi_Sandrock_Siemeling_Ivanova_Szekeres_Gesheva_2004, title={Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition}, volume={446}, DOI={<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>}, number={2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Brechling, A. and Aschentrup, A. and Heinzmann, U. and Jutzi, P. and Sandrock, J. and Siemeling, U. and Ivanova, T. and Szekeres, A. and Gesheva, K.}, year={2004}, pages={167–171} }","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Brechling, A.</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Sandrock, J.</span> ; <span style=\"font-variant:small-caps;\">Siemeling, U.</span> ; <span style=\"font-variant:small-caps;\">Ivanova, T.</span> ; u. a.</span>: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. In: <i>Thin Solid Films</i> Bd. 446, Elsevier BV (2004), Nr. 2, S. 167–171","ieee":"F. Hamelmann <i>et al.</i>, “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition,” <i>Thin Solid Films</i>, vol. 446, no. 2, pp. 167–171, 2004."},"status":"public","doi":"10.1016/j.tsf.2003.09.045","intvolume":"       446","date_updated":"2026-03-17T15:28:46Z","page":"167-171","publisher":"Elsevier BV","_id":"3542","year":"2004","language":[{"iso":"eng"}]},{"type":"journal_article","publication_identifier":{"issn":["00406090"]},"user_id":"216459","issue":"1-2","publication_status":"published","publication":"Thin Solid Films","title":"Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD","date_created":"2023-09-01T10:03:34Z","volume":358,"year":"2000","_id":"3550","language":[{"iso":"eng"}],"citation":{"mla":"Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>.","ama":"Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>. 2000;358(1-2):90-93. doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>","chicago":"Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i> 358, no. 1–2 (2000): 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.","short":"F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93","bibtex":"@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }","apa":"Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>, <i>358</i>(1–2), 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>","ieee":"F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000."},"author":[{"full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","last_name":"Hamelmann","id":"208487","first_name":"Frank"},{"last_name":"Haindl","full_name":"Haindl, G","first_name":"G"},{"first_name":"J","last_name":"Schmalhorst","full_name":"Schmalhorst, J"},{"first_name":"A","last_name":"Aschentrup","full_name":"Aschentrup, A"},{"first_name":"E","full_name":"Majkova, E","last_name":"Majkova"},{"first_name":"U","last_name":"Kleineberg","full_name":"Kleineberg, U"},{"first_name":"U","last_name":"Heinzmann","full_name":"Heinzmann, U"},{"full_name":"Klipp, A","last_name":"Klipp","first_name":"A"},{"last_name":"Jutzi","full_name":"Jutzi, P","first_name":"P"},{"full_name":"Anopchenko, A","last_name":"Anopchenko","first_name":"A"},{"full_name":"Jergel, M","last_name":"Jergel","first_name":"M"},{"full_name":"Luby, S","last_name":"Luby","first_name":"S"}],"status":"public","intvolume":"       358","doi":"10.1016/S0040-6090(99)00695-1","publisher":"Elsevier BV","page":"90-93","date_updated":"2026-03-17T15:28:46Z"},{"language":[{"iso":"eng"}],"_id":"3553","year":"1999","status":"public","citation":{"ieee":"F. Hamelmann <i>et al.</i>, “W/Si multilayers deposited by hot-filament MOCVD,” <i>Thin Solid Films</i>, vol. 338, no. 1–2, pp. 70–74, 1999.","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Petri, S.H.A.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Dreeskornfeld, L.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; u. a.</span>: W/Si multilayers deposited by hot-filament MOCVD. In: <i>Thin Solid Films</i> Bd. 338, Elsevier BV (1999), Nr. 1–2, S. 70–74","apa":"Hamelmann, F., Petri, S. H. A., Klipp, A., Haindl, G., Hartwich, J., Dreeskornfeld, L., … Heinzmann, U. (1999). W/Si multilayers deposited by hot-filament MOCVD. <i>Thin Solid Films</i>, <i>338</i>(1–2), 70–74. <a href=\"https://doi.org/10.1016/S0040-6090(98)00996-1\">https://doi.org/10.1016/S0040-6090(98)00996-1</a>","bibtex":"@article{Hamelmann_Petri_Klipp_Haindl_Hartwich_Dreeskornfeld_Kleineberg_Jutzi_Heinzmann_1999, title={W/Si multilayers deposited by hot-filament MOCVD}, volume={338}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(98)00996-1\">10.1016/S0040-6090(98)00996-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Petri, S.H.A. and Klipp, A. and Haindl, G. and Hartwich, J. and Dreeskornfeld, L. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={1999}, pages={70–74} }","chicago":"Hamelmann, Frank, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, and U. Heinzmann. “W/Si Multilayers Deposited by Hot-Filament MOCVD.” <i>Thin Solid Films</i> 338, no. 1–2 (1999): 70–74. <a href=\"https://doi.org/10.1016/S0040-6090(98)00996-1\">https://doi.org/10.1016/S0040-6090(98)00996-1</a>.","short":"F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, U. Heinzmann, Thin Solid Films 338 (1999) 70–74.","mla":"Hamelmann, Frank, et al. “W/Si Multilayers Deposited by Hot-Filament MOCVD.” <i>Thin Solid Films</i>, vol. 338, no. 1–2, Elsevier BV, 1999, pp. 70–74, doi:<a href=\"https://doi.org/10.1016/S0040-6090(98)00996-1\">10.1016/S0040-6090(98)00996-1</a>.","ama":"Hamelmann F, Petri SHA, Klipp A, et al. W/Si multilayers deposited by hot-filament MOCVD. <i>Thin Solid Films</i>. 1999;338(1-2):70-74. doi:<a href=\"https://doi.org/10.1016/S0040-6090(98)00996-1\">10.1016/S0040-6090(98)00996-1</a>"},"author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874"},{"full_name":"Petri, S.H.A.","last_name":"Petri","first_name":"S.H.A."},{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"first_name":"J.","full_name":"Hartwich, J.","last_name":"Hartwich"},{"last_name":"Dreeskornfeld","full_name":"Dreeskornfeld, L.","first_name":"L."},{"first_name":"U.","last_name":"Kleineberg","full_name":"Kleineberg, U."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."},{"first_name":"U.","full_name":"Heinzmann, U.","last_name":"Heinzmann"}],"date_updated":"2026-03-17T15:28:46Z","publisher":"Elsevier BV","page":"70-74","doi":"10.1016/S0040-6090(98)00996-1","intvolume":"       338","user_id":"216459","publication_identifier":{"issn":["00406090"]},"type":"journal_article","issue":"1-2","publication_status":"published","publication":"Thin Solid Films","volume":338,"date_created":"2023-09-01T10:05:42Z","title":"W/Si multilayers deposited by hot-filament MOCVD"}]