---
_id: '3542'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: A.
  full_name: Brechling, A.
  last_name: Brechling
- first_name: A.
  full_name: Aschentrup, A.
  last_name: Aschentrup
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
- first_name: J.
  full_name: Sandrock, J.
  last_name: Sandrock
- first_name: U.
  full_name: Siemeling, U.
  last_name: Siemeling
- first_name: T.
  full_name: Ivanova, T.
  last_name: Ivanova
- first_name: A.
  full_name: Szekeres, A.
  last_name: Szekeres
- first_name: K.
  full_name: Gesheva, K.
  last_name: Gesheva
citation:
  alphadin: '<span style="font-variant:small-caps;"><span style="font-variant:small-caps;">Hamelmann,
    Frank</span> ; <span style="font-variant:small-caps;">Brechling, A.</span> ; <span
    style="font-variant:small-caps;">Aschentrup, A.</span> ; <span style="font-variant:small-caps;">Heinzmann,
    U.</span> ; <span style="font-variant:small-caps;">Jutzi, P.</span> ; <span style="font-variant:small-caps;">Sandrock,
    J.</span> ; <span style="font-variant:small-caps;">Siemeling, U.</span> ; <span
    style="font-variant:small-caps;">Ivanova, T.</span> ; u. a.</span>: Thin molybdenum
    oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with
    plasma-assisted chemical vapor deposition. In: <i>Thin Solid Films</i> Bd. 446,
    Elsevier BV (2004), Nr. 2, S. 167–171'
  ama: Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films
    produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted
    chemical vapor deposition. <i>Thin Solid Films</i>. 2004;446(2):167-171. doi:<a
    href="https://doi.org/10.1016/j.tsf.2003.09.045">10.1016/j.tsf.2003.09.045</a>
  apa: Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock,
    J., … Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl
    1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. <i>Thin
    Solid Films</i>, <i>446</i>(2), 167–171. <a href="https://doi.org/10.1016/j.tsf.2003.09.045">https://doi.org/10.1016/j.tsf.2003.09.045</a>
  bibtex: '@article{Hamelmann_Brechling_Aschentrup_Heinzmann_Jutzi_Sandrock_Siemeling_Ivanova_Szekeres_Gesheva_2004,
    title={Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile
    with plasma-assisted chemical vapor deposition}, volume={446}, DOI={<a href="https://doi.org/10.1016/j.tsf.2003.09.045">10.1016/j.tsf.2003.09.045</a>},
    number={2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann,
    Frank and Brechling, A. and Aschentrup, A. and Heinzmann, U. and Jutzi, P. and
    Sandrock, J. and Siemeling, U. and Ivanova, T. and Szekeres, A. and Gesheva, K.},
    year={2004}, pages={167–171} }'
  chicago: 'Hamelmann, Frank, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi,
    J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, and K. Gesheva. “Thin Molybdenum
    Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with
    Plasma-Assisted Chemical Vapor Deposition.” <i>Thin Solid Films</i> 446, no. 2
    (2004): 167–71. <a href="https://doi.org/10.1016/j.tsf.2003.09.045">https://doi.org/10.1016/j.tsf.2003.09.045</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “Thin molybdenum oxide films produced by molybdenum
    pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition,”
    <i>Thin Solid Films</i>, vol. 446, no. 2, pp. 167–171, 2004.
  mla: Hamelmann, Frank, et al. “Thin Molybdenum Oxide Films Produced by Molybdenum
    Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.”
    <i>Thin Solid Films</i>, vol. 446, no. 2, Elsevier BV, 2004, pp. 167–71, doi:<a
    href="https://doi.org/10.1016/j.tsf.2003.09.045">10.1016/j.tsf.2003.09.045</a>.
  short: F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock,
    U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, Thin Solid Films 446 (2004)
    167–171.
date_created: 2023-09-01T09:55:56Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/j.tsf.2003.09.045
intvolume: '       446'
issue: '2'
language:
- iso: eng
page: 167-171
publication: Thin Solid Films
publication_identifier:
  issn:
  - '00406090'
publication_status: published
publisher: Elsevier BV
status: public
title: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile
  with plasma-assisted chemical vapor deposition
type: journal_article
user_id: '216459'
volume: 446
year: '2004'
...
---
_id: '3550'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: G
  full_name: Haindl, G
  last_name: Haindl
- first_name: J
  full_name: Schmalhorst, J
  last_name: Schmalhorst
- first_name: A
  full_name: Aschentrup, A
  last_name: Aschentrup
- first_name: E
  full_name: Majkova, E
  last_name: Majkova
- first_name: U
  full_name: Kleineberg, U
  last_name: Kleineberg
- first_name: U
  full_name: Heinzmann, U
  last_name: Heinzmann
- first_name: A
  full_name: Klipp, A
  last_name: Klipp
- first_name: P
  full_name: Jutzi, P
  last_name: Jutzi
- first_name: A
  full_name: Anopchenko, A
  last_name: Anopchenko
- first_name: M
  full_name: Jergel, M
  last_name: Jergel
- first_name: S
  full_name: Luby, S
  last_name: Luby
citation:
  alphadin: '<span style="font-variant:small-caps;"><span style="font-variant:small-caps;">Hamelmann,
    Frank</span> ; <span style="font-variant:small-caps;">Haindl, G</span> ; <span
    style="font-variant:small-caps;">Schmalhorst, J</span> ; <span style="font-variant:small-caps;">Aschentrup,
    A</span> ; <span style="font-variant:small-caps;">Majkova, E</span> ; <span style="font-variant:small-caps;">Kleineberg,
    U</span> ; <span style="font-variant:small-caps;">Heinzmann, U</span> ; <span
    style="font-variant:small-caps;">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon
    oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced
    MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93'
  ama: Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer
    with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin
    Solid Films</i>. 2000;358(1-2):90-93. doi:<a href="https://doi.org/10.1016/S0040-6090(99)00695-1">10.1016/S0040-6090(99)00695-1</a>
  apa: Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg,
    U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces
    produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>,
    <i>358</i>(1–2), 90–93. <a href="https://doi.org/10.1016/S0040-6090(99)00695-1">https://doi.org/10.1016/S0040-6090(99)00695-1</a>
  bibtex: '@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et
    al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced
    by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href="https://doi.org/10.1016/S0040-6090(99)00695-1">10.1016/S0040-6090(99)00695-1</a>},
    number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann,
    Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg,
    U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000},
    pages={90–93} }'
  chicago: 'Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U
    Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth
    Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid
    Films</i> 358, no. 1–2 (2000): 90–93. <a href="https://doi.org/10.1016/S0040-6090(99)00695-1">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth
    interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid
    Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000.
  mla: Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth
    Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid
    Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href="https://doi.org/10.1016/S0040-6090(99)00695-1">10.1016/S0040-6090(99)00695-1</a>.
  short: F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg,
    U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid
    Films 358 (2000) 90–93.
date_created: 2023-09-01T10:03:34Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0040-6090(99)00695-1
intvolume: '       358'
issue: 1-2
language:
- iso: eng
page: 90-93
publication: Thin Solid Films
publication_identifier:
  issn:
  - '00406090'
publication_status: published
publisher: Elsevier BV
status: public
title: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in
  situ controlled plasma-enhanced MOCVD
type: journal_article
user_id: '216459'
volume: 358
year: '2000'
...
---
_id: '3553'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: S.H.A.
  full_name: Petri, S.H.A.
  last_name: Petri
- first_name: A.
  full_name: Klipp, A.
  last_name: Klipp
- first_name: G.
  full_name: Haindl, G.
  last_name: Haindl
- first_name: J.
  full_name: Hartwich, J.
  last_name: Hartwich
- first_name: L.
  full_name: Dreeskornfeld, L.
  last_name: Dreeskornfeld
- first_name: U.
  full_name: Kleineberg, U.
  last_name: Kleineberg
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
citation:
  alphadin: '<span style="font-variant:small-caps;"><span style="font-variant:small-caps;">Hamelmann,
    Frank</span> ; <span style="font-variant:small-caps;">Petri, S.H.A.</span> ; <span
    style="font-variant:small-caps;">Klipp, A.</span> ; <span style="font-variant:small-caps;">Haindl,
    G.</span> ; <span style="font-variant:small-caps;">Hartwich, J.</span> ; <span
    style="font-variant:small-caps;">Dreeskornfeld, L.</span> ; <span style="font-variant:small-caps;">Kleineberg,
    U.</span> ; <span style="font-variant:small-caps;">Jutzi, P.</span> ; u. a.</span>:
    W/Si multilayers deposited by hot-filament MOCVD. In: <i>Thin Solid Films</i>
    Bd. 338, Elsevier BV (1999), Nr. 1–2, S. 70–74'
  ama: Hamelmann F, Petri SHA, Klipp A, et al. W/Si multilayers deposited by hot-filament
    MOCVD. <i>Thin Solid Films</i>. 1999;338(1-2):70-74. doi:<a href="https://doi.org/10.1016/S0040-6090(98)00996-1">10.1016/S0040-6090(98)00996-1</a>
  apa: Hamelmann, F., Petri, S. H. A., Klipp, A., Haindl, G., Hartwich, J., Dreeskornfeld,
    L., … Heinzmann, U. (1999). W/Si multilayers deposited by hot-filament MOCVD.
    <i>Thin Solid Films</i>, <i>338</i>(1–2), 70–74. <a href="https://doi.org/10.1016/S0040-6090(98)00996-1">https://doi.org/10.1016/S0040-6090(98)00996-1</a>
  bibtex: '@article{Hamelmann_Petri_Klipp_Haindl_Hartwich_Dreeskornfeld_Kleineberg_Jutzi_Heinzmann_1999,
    title={W/Si multilayers deposited by hot-filament MOCVD}, volume={338}, DOI={<a
    href="https://doi.org/10.1016/S0040-6090(98)00996-1">10.1016/S0040-6090(98)00996-1</a>},
    number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann,
    Frank and Petri, S.H.A. and Klipp, A. and Haindl, G. and Hartwich, J. and Dreeskornfeld,
    L. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={1999}, pages={70–74}
    }'
  chicago: 'Hamelmann, Frank, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld,
    U. Kleineberg, P. Jutzi, and U. Heinzmann. “W/Si Multilayers Deposited by Hot-Filament
    MOCVD.” <i>Thin Solid Films</i> 338, no. 1–2 (1999): 70–74. <a href="https://doi.org/10.1016/S0040-6090(98)00996-1">https://doi.org/10.1016/S0040-6090(98)00996-1</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “W/Si multilayers deposited by hot-filament MOCVD,”
    <i>Thin Solid Films</i>, vol. 338, no. 1–2, pp. 70–74, 1999.
  mla: Hamelmann, Frank, et al. “W/Si Multilayers Deposited by Hot-Filament MOCVD.”
    <i>Thin Solid Films</i>, vol. 338, no. 1–2, Elsevier BV, 1999, pp. 70–74, doi:<a
    href="https://doi.org/10.1016/S0040-6090(98)00996-1">10.1016/S0040-6090(98)00996-1</a>.
  short: F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld,
    U. Kleineberg, P. Jutzi, U. Heinzmann, Thin Solid Films 338 (1999) 70–74.
date_created: 2023-09-01T10:05:42Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0040-6090(98)00996-1
intvolume: '       338'
issue: 1-2
language:
- iso: eng
page: 70-74
publication: Thin Solid Films
publication_identifier:
  issn:
  - '00406090'
publication_status: published
publisher: Elsevier BV
status: public
title: W/Si multilayers deposited by hot-filament MOCVD
type: journal_article
user_id: '216459'
volume: 338
year: '1999'
...