@article{3543,
  author       = {Hamelmann, Frank and Aschentrup, A. and Brechling, A. and Heinzmann, U. and Abrashev, M. and Szekeres, A. and Gesheva, K.},
  issn         = {0042207X},
  journal      = {Vacuum},
  number       = {2-3},
  pages        = {139--142},
  publisher    = {Elsevier BV},
  title        = {{Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases}},
  doi          = {10.1016/j.vacuum.2004.07.074},
  volume       = {76},
  year         = {2004},
}

@article{3544,
  author       = {Hamelmann, Frank and Aschentrup, A and Brechling, A and Heinzmann, U and Gushterov, A and Szekeres, A and Simeonov, S},
  issn         = {0042207X},
  journal      = {Vacuum},
  number       = {4},
  pages        = {307--312},
  publisher    = {Elsevier BV},
  title        = {{Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions}},
  doi          = {10.1016/j.vacuum.2004.03.012},
  volume       = {75},
  year         = {2004},
}

@article{3545,
  author       = {Ivanova, T. and Gesheva, K. and Hamelmann, Frank and Popkirov, G. and Abrashev, M. and Ganchev, M. and Tzvetkova, E.},
  issn         = {0042207X},
  journal      = {Vacuum},
  number       = {2-3},
  pages        = {195--198},
  publisher    = {Elsevier BV},
  title        = {{Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films}},
  doi          = {10.1016/j.vacuum.2004.07.012},
  volume       = {76},
  year         = {2004},
}