---
_id: '3543'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: A.
  full_name: Aschentrup, A.
  last_name: Aschentrup
- first_name: A.
  full_name: Brechling, A.
  last_name: Brechling
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
- first_name: M.
  full_name: Abrashev, M.
  last_name: Abrashev
- first_name: A.
  full_name: Szekeres, A.
  last_name: Szekeres
- first_name: K.
  full_name: Gesheva, K.
  last_name: Gesheva
citation:
  alphadin: '<span style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span
    style="font-variant:small-caps;">Aschentrup, A.</span> ; <span style="font-variant:small-caps;">Brechling,
    A.</span> ; <span style="font-variant:small-caps;">Heinzmann, U.</span> ; <span
    style="font-variant:small-caps;">Abrashev, M.</span> ; <span style="font-variant:small-caps;">Szekeres,
    A.</span> ; <span style="font-variant:small-caps;">Gesheva, K.</span>: Plasma-assisted
    deposition of thin carbon films from methane and the influence of the plasma parameters
    and additional gases. In: <i>Vacuum</i> Bd. 76, Elsevier BV (2004), Nr. 2–3, S. 139–142'
  ama: Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of
    thin carbon films from methane and the influence of the plasma parameters and
    additional gases. <i>Vacuum</i>. 2004;76(2-3):139-142. doi:<a href="https://doi.org/10.1016/j.vacuum.2004.07.074">10.1016/j.vacuum.2004.07.074</a>
  apa: Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Abrashev, M.,
    Szekeres, A., &#38; Gesheva, K. (2004). Plasma-assisted deposition of thin carbon
    films from methane and the influence of the plasma parameters and additional gases.
    <i>Vacuum</i>, <i>76</i>(2–3), 139–142. <a href="https://doi.org/10.1016/j.vacuum.2004.07.074">https://doi.org/10.1016/j.vacuum.2004.07.074</a>
  bibtex: '@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Abrashev_Szekeres_Gesheva_2004,
    title={Plasma-assisted deposition of thin carbon films from methane and the influence
    of the plasma parameters and additional gases}, volume={76}, DOI={<a href="https://doi.org/10.1016/j.vacuum.2004.07.074">10.1016/j.vacuum.2004.07.074</a>},
    number={2–3}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank
    and Aschentrup, A. and Brechling, A. and Heinzmann, U. and Abrashev, M. and Szekeres,
    A. and Gesheva, K.}, year={2004}, pages={139–142} }'
  chicago: 'Hamelmann, Frank, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev,
    A. Szekeres, and K. Gesheva. “Plasma-Assisted Deposition of Thin Carbon Films
    from Methane and the Influence of the Plasma Parameters and Additional Gases.”
    <i>Vacuum</i> 76, no. 2–3 (2004): 139–42. <a href="https://doi.org/10.1016/j.vacuum.2004.07.074">https://doi.org/10.1016/j.vacuum.2004.07.074</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “Plasma-assisted deposition of thin carbon films
    from methane and the influence of the plasma parameters and additional gases,”
    <i>Vacuum</i>, vol. 76, no. 2–3, pp. 139–142, 2004.
  mla: Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Carbon Films from
    Methane and the Influence of the Plasma Parameters and Additional Gases.” <i>Vacuum</i>,
    vol. 76, no. 2–3, Elsevier BV, 2004, pp. 139–42, doi:<a href="https://doi.org/10.1016/j.vacuum.2004.07.074">10.1016/j.vacuum.2004.07.074</a>.
  short: F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A.
    Szekeres, K. Gesheva, Vacuum 76 (2004) 139–142.
date_created: 2023-09-01T09:56:38Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/j.vacuum.2004.07.074
intvolume: '        76'
issue: 2-3
language:
- iso: eng
page: 139-142
publication: Vacuum
publication_identifier:
  issn:
  - 0042207X
publication_status: published
publisher: Elsevier BV
status: public
title: Plasma-assisted deposition of thin carbon films from methane and the influence
  of the plasma parameters and additional gases
type: journal_article
user_id: '216459'
volume: 76
year: '2004'
...
---
_id: '3544'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: A
  full_name: Aschentrup, A
  last_name: Aschentrup
- first_name: A
  full_name: Brechling, A
  last_name: Brechling
- first_name: U
  full_name: Heinzmann, U
  last_name: Heinzmann
- first_name: A
  full_name: Gushterov, A
  last_name: Gushterov
- first_name: A
  full_name: Szekeres, A
  last_name: Szekeres
- first_name: S
  full_name: Simeonov, S
  last_name: Simeonov
citation:
  alphadin: '<span style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span
    style="font-variant:small-caps;">Aschentrup, A</span> ; <span style="font-variant:small-caps;">Brechling,
    A</span> ; <span style="font-variant:small-caps;">Heinzmann, U</span> ; <span
    style="font-variant:small-caps;">Gushterov, A</span> ; <span style="font-variant:small-caps;">Szekeres,
    A</span> ; <span style="font-variant:small-caps;">Simeonov, S</span>: Plasma-assisted
    deposition of thin silicon oxide films in a remote PECVD reactor and characterization
    of films produced under different conditions. In: <i>Vacuum</i> Bd. 75, Elsevier
    BV (2004), Nr. 4, S. 307–312'
  ama: Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of
    thin silicon oxide films in a remote PECVD reactor and characterization of films
    produced under different conditions. <i>Vacuum</i>. 2004;75(4):307-312. doi:<a
    href="https://doi.org/10.1016/j.vacuum.2004.03.012">10.1016/j.vacuum.2004.03.012</a>
  apa: Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A.,
    Szekeres, A., &#38; Simeonov, S. (2004). Plasma-assisted deposition of thin silicon
    oxide films in a remote PECVD reactor and characterization of films produced under
    different conditions. <i>Vacuum</i>, <i>75</i>(4), 307–312. <a href="https://doi.org/10.1016/j.vacuum.2004.03.012">https://doi.org/10.1016/j.vacuum.2004.03.012</a>
  bibtex: '@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Gushterov_Szekeres_Simeonov_2004,
    title={Plasma-assisted deposition of thin silicon oxide films in a remote PECVD
    reactor and characterization of films produced under different conditions}, volume={75},
    DOI={<a href="https://doi.org/10.1016/j.vacuum.2004.03.012">10.1016/j.vacuum.2004.03.012</a>},
    number={4}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank
    and Aschentrup, A and Brechling, A and Heinzmann, U and Gushterov, A and Szekeres,
    A and Simeonov, S}, year={2004}, pages={307–312} }'
  chicago: 'Hamelmann, Frank, A Aschentrup, A Brechling, U Heinzmann, A Gushterov,
    A Szekeres, and S Simeonov. “Plasma-Assisted Deposition of Thin Silicon Oxide
    Films in a Remote PECVD Reactor and Characterization of Films Produced under Different
    Conditions.” <i>Vacuum</i> 75, no. 4 (2004): 307–12. <a href="https://doi.org/10.1016/j.vacuum.2004.03.012">https://doi.org/10.1016/j.vacuum.2004.03.012</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “Plasma-assisted deposition of thin silicon oxide
    films in a remote PECVD reactor and characterization of films produced under different
    conditions,” <i>Vacuum</i>, vol. 75, no. 4, pp. 307–312, 2004.
  mla: Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Silicon Oxide
    Films in a Remote PECVD Reactor and Characterization of Films Produced under Different
    Conditions.” <i>Vacuum</i>, vol. 75, no. 4, Elsevier BV, 2004, pp. 307–12, doi:<a
    href="https://doi.org/10.1016/j.vacuum.2004.03.012">10.1016/j.vacuum.2004.03.012</a>.
  short: F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, A. Gushterov, A.
    Szekeres, S. Simeonov, Vacuum 75 (2004) 307–312.
date_created: 2023-09-01T09:57:16Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/j.vacuum.2004.03.012
intvolume: '        75'
issue: '4'
language:
- iso: eng
page: 307-312
publication: Vacuum
publication_identifier:
  issn:
  - 0042207X
publication_status: published
publisher: Elsevier BV
status: public
title: Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor
  and characterization of films produced under different conditions
type: journal_article
user_id: '216459'
volume: 75
year: '2004'
...
---
_id: '3545'
author:
- first_name: T.
  full_name: Ivanova, T.
  last_name: Ivanova
- first_name: K.
  full_name: Gesheva, K.
  last_name: Gesheva
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: G.
  full_name: Popkirov, G.
  last_name: Popkirov
- first_name: M.
  full_name: Abrashev, M.
  last_name: Abrashev
- first_name: M.
  full_name: Ganchev, M.
  last_name: Ganchev
- first_name: E.
  full_name: Tzvetkova, E.
  last_name: Tzvetkova
citation:
  alphadin: '<span style="font-variant:small-caps;">Ivanova, T.</span> ; <span style="font-variant:small-caps;">Gesheva,
    K.</span> ; <span style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span
    style="font-variant:small-caps;">Popkirov, G.</span> ; <span style="font-variant:small-caps;">Abrashev,
    M.</span> ; <span style="font-variant:small-caps;">Ganchev, M.</span> ; <span
    style="font-variant:small-caps;">Tzvetkova, E.</span>: Optical and electrochromic
    properties of CVD mixed MoO3–WO3 thin films. In: <i>Vacuum</i> Bd. 76, Elsevier
    BV (2004), Nr. 2–3, S. 195–198'
  ama: Ivanova T, Gesheva K, Hamelmann F, et al. Optical and electrochromic properties
    of CVD mixed MoO3–WO3 thin films. <i>Vacuum</i>. 2004;76(2-3):195-198. doi:<a
    href="https://doi.org/10.1016/j.vacuum.2004.07.012">10.1016/j.vacuum.2004.07.012</a>
  apa: Ivanova, T., Gesheva, K., Hamelmann, F., Popkirov, G., Abrashev, M., Ganchev,
    M., &#38; Tzvetkova, E. (2004). Optical and electrochromic properties of CVD mixed
    MoO3–WO3 thin films. <i>Vacuum</i>, <i>76</i>(2–3), 195–198. <a href="https://doi.org/10.1016/j.vacuum.2004.07.012">https://doi.org/10.1016/j.vacuum.2004.07.012</a>
  bibtex: '@article{Ivanova_Gesheva_Hamelmann_Popkirov_Abrashev_Ganchev_Tzvetkova_2004,
    title={Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films},
    volume={76}, DOI={<a href="https://doi.org/10.1016/j.vacuum.2004.07.012">10.1016/j.vacuum.2004.07.012</a>},
    number={2–3}, journal={Vacuum}, publisher={Elsevier BV}, author={Ivanova, T. and
    Gesheva, K. and Hamelmann, Frank and Popkirov, G. and Abrashev, M. and Ganchev,
    M. and Tzvetkova, E.}, year={2004}, pages={195–198} }'
  chicago: 'Ivanova, T., K. Gesheva, Frank Hamelmann, G. Popkirov, M. Abrashev, M.
    Ganchev, and E. Tzvetkova. “Optical and Electrochromic Properties of CVD Mixed
    MoO3–WO3 Thin Films.” <i>Vacuum</i> 76, no. 2–3 (2004): 195–98. <a href="https://doi.org/10.1016/j.vacuum.2004.07.012">https://doi.org/10.1016/j.vacuum.2004.07.012</a>.'
  ieee: T. Ivanova <i>et al.</i>, “Optical and electrochromic properties of CVD mixed
    MoO3–WO3 thin films,” <i>Vacuum</i>, vol. 76, no. 2–3, pp. 195–198, 2004.
  mla: Ivanova, T., et al. “Optical and Electrochromic Properties of CVD Mixed MoO3–WO3
    Thin Films.” <i>Vacuum</i>, vol. 76, no. 2–3, Elsevier BV, 2004, pp. 195–98, doi:<a
    href="https://doi.org/10.1016/j.vacuum.2004.07.012">10.1016/j.vacuum.2004.07.012</a>.
  short: T. Ivanova, K. Gesheva, F. Hamelmann, G. Popkirov, M. Abrashev, M. Ganchev,
    E. Tzvetkova, Vacuum 76 (2004) 195–198.
date_created: 2023-09-01T09:57:56Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/j.vacuum.2004.07.012
intvolume: '        76'
issue: 2-3
language:
- iso: eng
page: 195-198
publication: Vacuum
publication_identifier:
  issn:
  - 0042207X
publication_status: published
publisher: Elsevier BV
status: public
title: Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films
type: journal_article
user_id: '216459'
volume: 76
year: '2004'
...