---
_id: '3551'
author:
- first_name: A.
  full_name: Klipp, A.
  last_name: Klipp
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: G.
  full_name: Haindl, G.
  last_name: Haindl
- first_name: J.
  full_name: Hartwich, J.
  last_name: Hartwich
- first_name: U.
  full_name: Kleineberg, U.
  last_name: Kleineberg
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
citation:
  alphadin: '<span style="font-variant:small-caps;">Klipp, A.</span> ; <span style="font-variant:small-caps;">Hamelmann,
    Frank</span> ; <span style="font-variant:small-caps;">Haindl, G.</span> ; <span
    style="font-variant:small-caps;">Hartwich, J.</span> ; <span style="font-variant:small-caps;">Kleineberg,
    U.</span> ; <span style="font-variant:small-caps;">Jutzi, P.</span> ; <span style="font-variant:small-caps;">Heinzmann,
    U.</span>: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD
    of Thin Silicon Films. In: <i>Chemical Vapor Deposition</i> Bd. 6, Wiley (2000),
    Nr. 2, S. 63–66'
  ama: Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane
    as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>.
    2000;6(2):63-66. doi:<a href="https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>
  apa: Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi,
    P., &#38; Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel
    Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>,
    <i>6</i>(2), 63–66. <a href="https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>
  bibtex: '@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000,
    title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of
    Thin Silicon Films}, volume={6}, DOI={<a href="https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>},
    number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp,
    A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and
    Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }'
  chicago: 'Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P.
    Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
    for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i> 6, no. 2
    (2000): 63–66. <a href="https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.'
  ieee: A. Klipp <i>et al.</i>, “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
    for the CVD of Thin Silicon Films,” <i>Chemical Vapor Deposition</i>, vol. 6,
    no. 2, pp. 63–66, 2000.
  mla: Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
    for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i>, vol. 6,
    no. 2, Wiley, 2000, pp. 63–66, doi:<a href="https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.
  short: A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi,
    U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.
date_created: 2023-09-01T10:04:14Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
intvolume: '         6'
issue: '2'
language:
- iso: eng
page: 63-66
publication: Chemical Vapor Deposition
publication_identifier:
  eissn:
  - '15213862'
  issn:
  - '09481907'
publication_status: published
publisher: Wiley
status: public
title: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin
  Silicon Films
type: journal_article
user_id: '216459'
volume: 6
year: '2000'
...