[{"_id":"3546","year":"2001","language":[{"iso":"eng"}],"doi":"10.1051/jp4:2001354","intvolume":"        11","date_updated":"2026-03-17T15:28:46Z","page":"431-436","publisher":"EDP Sciences","author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874"},{"full_name":"Aschentrup, A.","last_name":"Aschentrup","first_name":"A."},{"last_name":"Schmalhorst","full_name":"Schmalhorst, J.","first_name":"J."},{"first_name":"U.","full_name":"Kleineberg, U.","last_name":"Kleineberg"},{"full_name":"Heinzmann, U.","last_name":"Heinzmann","first_name":"U."},{"first_name":"K.","last_name":"Dittmar","full_name":"Dittmar, K."},{"full_name":"Jutzi, P.","last_name":"Jutzi","first_name":"P."}],"citation":{"bibtex":"@article{Hamelmann_Aschentrup_Schmalhorst_Kleineberg_Heinzmann_Dittmar_Jutzi_2001, title={Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD}, volume={11}, DOI={<a href=\"https://doi.org/10.1051/jp4:2001354\">10.1051/jp4:2001354</a>}, number={3}, journal={Le Journal de Physique IV}, publisher={EDP Sciences}, author={Hamelmann, Frank and Aschentrup, A. and Schmalhorst, J. and Kleineberg, U. and Heinzmann, U. and Dittmar, K. and Jutzi, P.}, year={2001}, pages={431–436} }","apa":"Hamelmann, F., Aschentrup, A., Schmalhorst, J., Kleineberg, U., Heinzmann, U., Dittmar, K., &#38; Jutzi, P. (2001). Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. <i>Le Journal de Physique IV</i>, <i>11</i>(3), 431–436. <a href=\"https://doi.org/10.1051/jp4:2001354\">https://doi.org/10.1051/jp4:2001354</a>","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A.</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Dittmar, K.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. In: <i>Le Journal de Physique IV</i> Bd. 11, EDP Sciences (2001), Nr. 3, S. 431–436","ieee":"F. Hamelmann <i>et al.</i>, “Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD,” <i>Le Journal de Physique IV</i>, vol. 11, no. 3, pp. 431–436, 2001.","ama":"Hamelmann F, Aschentrup A, Schmalhorst J, et al. Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD. <i>Le Journal de Physique IV</i>. 2001;11(3):431-436. doi:<a href=\"https://doi.org/10.1051/jp4:2001354\">10.1051/jp4:2001354</a>","mla":"Hamelmann, Frank, et al. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced by Plasma Enhanced CVD.” <i>Le Journal de Physique IV</i>, vol. 11, no. 3, EDP Sciences, 2001, pp. 431–36, doi:<a href=\"https://doi.org/10.1051/jp4:2001354\">10.1051/jp4:2001354</a>.","short":"F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, P. Jutzi, Le Journal de Physique IV 11 (2001) 431–436.","chicago":"Hamelmann, Frank, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, and P. Jutzi. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced by Plasma Enhanced CVD.” <i>Le Journal de Physique IV</i> 11, no. 3 (2001): 431–36. <a href=\"https://doi.org/10.1051/jp4:2001354\">https://doi.org/10.1051/jp4:2001354</a>."},"status":"public","publication":"Le Journal de Physique IV","issue":"3","publication_status":"published","publication_identifier":{"issn":["1155-4339"]},"type":"journal_article","user_id":"216459","date_created":"2023-09-01T09:58:36Z","title":"Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD","volume":11}]