---
_id: '3546'
author:
- first_name: Frank
  full_name: Hamelmann, Frank
  id: '208487'
  last_name: Hamelmann
  orcid: 0000-0001-6141-9874
- first_name: A.
  full_name: Aschentrup, A.
  last_name: Aschentrup
- first_name: J.
  full_name: Schmalhorst, J.
  last_name: Schmalhorst
- first_name: U.
  full_name: Kleineberg, U.
  last_name: Kleineberg
- first_name: U.
  full_name: Heinzmann, U.
  last_name: Heinzmann
- first_name: K.
  full_name: Dittmar, K.
  last_name: Dittmar
- first_name: P.
  full_name: Jutzi, P.
  last_name: Jutzi
citation:
  alphadin: '<span style="font-variant:small-caps;">Hamelmann, Frank</span> ; <span
    style="font-variant:small-caps;">Aschentrup, A.</span> ; <span style="font-variant:small-caps;">Schmalhorst,
    J.</span> ; <span style="font-variant:small-caps;">Kleineberg, U.</span> ; <span
    style="font-variant:small-caps;">Heinzmann, U.</span> ; <span style="font-variant:small-caps;">Dittmar,
    K.</span> ; <span style="font-variant:small-caps;">Jutzi, P.</span>: Silicon oxide
    nanolayers for soft X-ray optics produced by plasma enhanced CVD. In: <i>Le Journal
    de Physique IV</i> Bd. 11, EDP Sciences (2001), Nr. 3, S. 431–436'
  ama: Hamelmann F, Aschentrup A, Schmalhorst J, et al. Silicon oxide nanolayers for
    soft X-ray optics produced by plasma enhanced CVD. <i>Le Journal de Physique IV</i>.
    2001;11(3):431-436. doi:<a href="https://doi.org/10.1051/jp4:2001354">10.1051/jp4:2001354</a>
  apa: Hamelmann, F., Aschentrup, A., Schmalhorst, J., Kleineberg, U., Heinzmann,
    U., Dittmar, K., &#38; Jutzi, P. (2001). Silicon oxide nanolayers for soft X-ray
    optics produced by plasma enhanced CVD. <i>Le Journal de Physique IV</i>, <i>11</i>(3),
    431–436. <a href="https://doi.org/10.1051/jp4:2001354">https://doi.org/10.1051/jp4:2001354</a>
  bibtex: '@article{Hamelmann_Aschentrup_Schmalhorst_Kleineberg_Heinzmann_Dittmar_Jutzi_2001,
    title={Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced
    CVD}, volume={11}, DOI={<a href="https://doi.org/10.1051/jp4:2001354">10.1051/jp4:2001354</a>},
    number={3}, journal={Le Journal de Physique IV}, publisher={EDP Sciences}, author={Hamelmann,
    Frank and Aschentrup, A. and Schmalhorst, J. and Kleineberg, U. and Heinzmann,
    U. and Dittmar, K. and Jutzi, P.}, year={2001}, pages={431–436} }'
  chicago: 'Hamelmann, Frank, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann,
    K. Dittmar, and P. Jutzi. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced
    by Plasma Enhanced CVD.” <i>Le Journal de Physique IV</i> 11, no. 3 (2001): 431–36.
    <a href="https://doi.org/10.1051/jp4:2001354">https://doi.org/10.1051/jp4:2001354</a>.'
  ieee: F. Hamelmann <i>et al.</i>, “Silicon oxide nanolayers for soft X-ray optics
    produced by plasma enhanced CVD,” <i>Le Journal de Physique IV</i>, vol. 11, no.
    3, pp. 431–436, 2001.
  mla: Hamelmann, Frank, et al. “Silicon Oxide Nanolayers for Soft X-Ray Optics Produced
    by Plasma Enhanced CVD.” <i>Le Journal de Physique IV</i>, vol. 11, no. 3, EDP
    Sciences, 2001, pp. 431–36, doi:<a href="https://doi.org/10.1051/jp4:2001354">10.1051/jp4:2001354</a>.
  short: F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann,
    K. Dittmar, P. Jutzi, Le Journal de Physique IV 11 (2001) 431–436.
date_created: 2023-09-01T09:58:36Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1051/jp4:2001354
intvolume: '        11'
issue: '3'
language:
- iso: eng
page: 431-436
publication: Le Journal de Physique IV
publication_identifier:
  issn:
  - 1155-4339
publication_status: published
publisher: EDP Sciences
status: public
title: Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced
  CVD
type: journal_article
user_id: '216459'
volume: 11
year: '2001'
...