[{"doi":"10.1063/1.373179","intvolume":"        87","date_updated":"2026-05-08T14:09:52Z","page":"4849-4851","publisher":"AIP Publishing","author":[{"full_name":"Heitmann, S.","last_name":"Heitmann","first_name":"S."},{"first_name":"A.","last_name":"Hütten","full_name":"Hütten, A."},{"full_name":"Hempel, T.","last_name":"Hempel","first_name":"T."},{"first_name":"W.","full_name":"Schepper, W.","last_name":"Schepper"},{"first_name":"G.","full_name":"Reiss, G.","last_name":"Reiss"},{"last_name":"Alof","full_name":"Alof, C.","first_name":"C."}],"citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Heitmann, S.</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span> ; <span style=\"font-variant:small-caps;\">Hempel, T.</span> ; <span style=\"font-variant:small-caps;\">Schepper, W.</span> ; <span style=\"font-variant:small-caps;\">Reiss, G.</span> ; <span style=\"font-variant:small-caps;\">Alof, C.</span>: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. In: <i>Journal of Applied Physics</i> Bd. 87, AIP Publishing (2000), Nr. 9, S. 4849–4851","bibtex":"@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87}, DOI={<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann, S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.}, year={2000}, pages={4849–4851} }","apa":"Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., &#38; Alof, C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>, <i>87</i>(9), 4849–4851. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>","ieee":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers,” <i>Journal of Applied Physics</i>, vol. 87, no. 9, pp. 4849–4851, 2000.","mla":"Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i>, vol. 87, no. 9, AIP Publishing, 2000, pp. 4849–51, doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>.","ama":"Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>. 2000;87(9):4849-4851. doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>","short":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal of Applied Physics 87 (2000) 4849–4851.","chicago":"Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i> 87, no. 9 (2000): 4849–51. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>."},"status":"public","abstract":[{"lang":"eng","text":"                  The evolution of the giant magnetoresistance (GMR) effect in sputtered combination multilayers (CMLs) of type Py1.8nm//{(Cu1.8nm/Py1.6nm)N/(Cu0.9nm/Py1.6nm)N}y with Py (permalloy=Ni81Fe19) has been investigated at room temperature. It is shown that the GMR characteristic of these CMLs can be phenomenologically predicted, if the physical properties are known, i.e., the GMR effect amplitude, double layer conductance, and bilinear and biquadratic antiferromagnetic exchange coupling constants of the two underlying {Cu/Py}N base systems at the first (Cu0.9nm) and second (Cu1.8nm) antiferromagnetic coupling maximum (AFCM). The GMR characteristic of the simplest CML with N=1 is, e.g., determined by averaging the bilinear and biquadratic exchange coupling constants of the two base systems. The GMR characteristics of CML with N⩾2 are a superposition of that of the underlying {Cu/Py}N base systems weighted by the fraction of the corresponding double layer conductance. Furthermore, it is demonstrated that the CMLs are interesting from an application point of view since they combine the temperature stability of the underlying {Cu/Py}N base system at the second AFCM with a larger GMR effect amplitude.\r\n                "}],"_id":"6895","year":"2000","language":[{"iso":"eng"}],"date_created":"2026-05-08T14:09:24Z","article_type":"original","title":"Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers","volume":87,"quality_controlled":"1","department":[{"_id":"103"}],"research_group":[{"_id":"af778127-b366-11ed-bde2-daed2b8eafee","name":"Bielefelder Institut für Angewandte Materialforschung (BIfAM)"}],"publication_status":"published","issue":"9","publication":"Journal of Applied Physics","publication_identifier":{"eissn":["1089-7550"],"issn":["0021-8979"]},"type":"journal_article","user_id":"202389"},{"date_updated":"2026-03-17T15:29:21Z","status":"public","citation":{"ieee":"C. Cottin, “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München,” <i>Der Aktuar</i>, no. 1. 2000.","apa":"Cottin, C. (2000). Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>.","bibtex":"@article{Cottin_2000, title={Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München}, number={1}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. In: <i>Der Aktuar</i> (2000), Nr. 1","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, 2000.","ama":"Cottin C. Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>. 2000;(1).","mla":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, no. 1, 2000."},"author":[{"full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","last_name":"Cottin","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953063","id":"33935","first_name":"Claudia"}],"language":[{"iso":"ger"}],"_id":"5682","year":"2000","date_created":"2025-02-18T18:09:08Z","title":"Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München","department":[{"_id":"103"}],"publication":"Der Aktuar","publication_status":"published","issue":"1","user_id":"220548","type":"review"},{"user_id":"220548","type":"review","publication_status":"published","publication":"Der Aktuar","issue":"2","department":[{"_id":"103"}],"title":"Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg","date_created":"2025-02-18T18:24:41Z","language":[{"iso":"ger"}],"year":"2000","_id":"5683","status":"public","citation":{"mla":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, no. 2, 2000.","ama":"Cottin C. Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>. 2000;(2).","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. In: <i>Der Aktuar</i> (2000), Nr. 2","bibtex":"@article{Cottin_2000, title={Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>.","ieee":"C. Cottin, “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg,” <i>Der Aktuar</i>, no. 2. 2000."},"author":[{"first_name":"Claudia","id":"33935","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953010","last_name":"Cottin","orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia"}],"date_updated":"2026-03-17T15:29:21Z"},{"citation":{"ieee":"C. Cottin, “Arbeitsmarkt für (Versicherungs-)Mathematiker,” <i>Der Aktuar</i>, no. 2, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Arbeitsmarkt für (Versicherungs-)Mathematiker. In: <i>Der Aktuar</i> (2000), Nr. 2","bibtex":"@article{Cottin_2000, title={Arbeitsmarkt für (Versicherungs-)Mathematiker}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>, (2).","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2 (2000).","mla":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2, 2000.","ama":"Cottin C. Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>. 2000;(2)."},"author":[{"last_name":"Cottin","orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","first_name":"Claudia","id":"33935"}],"status":"public","date_updated":"2026-03-17T15:29:21Z","_id":"5684","year":"2000","language":[{"iso":"ger"}],"department":[{"_id":"103"}],"date_created":"2025-02-18T18:26:23Z","title":"Arbeitsmarkt für (Versicherungs-)Mathematiker","type":"journal_article","publication_identifier":{"issn":["0948-7794"]},"user_id":"33935","publication":"Der Aktuar","publication_status":"published","issue":"2"},{"language":[{"iso":"ger"}],"_id":"5685","year":"2000","status":"public","citation":{"chicago":"Cottin, Claudia. “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” 2000.","short":"C. Cottin, (2000).","mla":"Cottin, Claudia. <i>Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München</i>. no. 4, 2000.","ama":"Cottin C. Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München. 2000;(4).","ieee":"C. Cottin, “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” no. 4. 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München (2000), Nr. 4","bibtex":"@article{Cottin_2000, title={Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München}, number={4}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München."},"author":[{"orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","last_name":"Cottin","first_name":"Claudia","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178952850","id":"33935"}],"date_updated":"2026-03-17T15:29:21Z","user_id":"220548","type":"review","publication_status":"published","issue":"4","department":[{"_id":"103"}],"date_created":"2025-02-18T18:27:36Z","title":"Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München"},{"volume":40,"date_created":"2025-02-16T18:47:25Z","title":"Minimal Boolean sum and blending-type projections and extensions","department":[{"_id":"103"}],"issue":"1","publication":"Computers & Mathematics with Applications","publication_status":"published","alternative_id":["4475"],"user_id":"33935","publication_identifier":{"issn":["0898-1221"]},"type":"journal_article","date_updated":"2026-03-17T15:29:20Z","publisher":"Elsevier BV","page":"63-70","doi":"10.1016/S0898-1221(00)00140-1","intvolume":"        40","status":"public","author":[{"last_name":"Chalmers","full_name":"Chalmers, Bruce","first_name":"Bruce"},{"id":"33935","first_name":"Claudia","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","last_name":"Cottin"},{"last_name":"Shekhtman","full_name":"Shekhtman, Boris","first_name":"Boris"}],"citation":{"mla":"Chalmers, Bruce, et al. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, Elsevier BV, 2000, pp. 63–70, doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>.","ama":"Chalmers B, Cottin C, Shekhtman B. Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>. 2000;40(1):63-70. doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>","short":"B. Chalmers, C. Cottin, B. Shekhtman, Computers &#38; Mathematics with Applications 40 (2000) 63–70.","chicago":"Chalmers, Bruce, Claudia Cottin, and Boris Shekhtman. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i> 40, no. 1 (2000): 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>.","alphadin":"<span style=\"font-variant:small-caps;\">Chalmers, Bruce</span> ; <span style=\"font-variant:small-caps;\">Cottin, Claudia</span> ; <span style=\"font-variant:small-caps;\">Shekhtman, Boris</span>: Minimal Boolean sum and blending-type projections and extensions. In: <i>Computers &#38; Mathematics with Applications</i> Bd. 40, Elsevier BV (2000), Nr. 1, S. 63–70","apa":"Chalmers, B., Cottin, C., &#38; Shekhtman, B. (2000). Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>, <i>40</i>(1), 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>","bibtex":"@article{Chalmers_Cottin_Shekhtman_2000, title={Minimal Boolean sum and blending-type projections and extensions}, volume={40}, DOI={<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>}, number={1}, journal={Computers &#38; Mathematics with Applications}, publisher={Elsevier BV}, author={Chalmers, Bruce and Cottin, Claudia and Shekhtman, Boris}, year={2000}, pages={63–70} }","ieee":"B. Chalmers, C. Cottin, and B. Shekhtman, “Minimal Boolean sum and blending-type projections and extensions,” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, pp. 63–70, 2000."},"language":[{"iso":"eng"}],"_id":"5631","year":"2000"},{"citation":{"chicago":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i> 77, no. 3 (2000).","short":"K. Meskouris, U. Weitkemper, Die Bautechnik 77 (2000).","ama":"Meskouris K, Weitkemper U. Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>. 2000;77(3).","mla":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","ieee":"K. Meskouris and U. Weitkemper, “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung,” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","bibtex":"@article{Meskouris_Weitkemper_2000, title={Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung}, volume={77}, number={3}, journal={Die Bautechnik}, author={Meskouris, Konstantin and Weitkemper, Uwe}, year={2000} }","apa":"Meskouris, K., &#38; Weitkemper, U. (2000). Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>, <i>77</i>(3).","alphadin":"<span style=\"font-variant:small-caps;\">Meskouris, Konstantin</span> ; <span style=\"font-variant:small-caps;\">Weitkemper, Uwe</span>: Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. In: <i>Die Bautechnik</i> Bd. 77 (2000), Nr. 3"},"author":[{"full_name":"Meskouris, Konstantin","last_name":"Meskouris","first_name":"Konstantin"},{"last_name":"Weitkemper","full_name":"Weitkemper, Uwe","first_name":"Uwe","id":"202449"}],"status":"public","intvolume":"        77","date_updated":"2026-03-17T15:29:15Z","year":"2000","_id":"5259","language":[{"iso":"ger"}],"department":[{"_id":"102"}],"title":"Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung","date_created":"2025-01-03T08:14:23Z","volume":77,"publication_identifier":{"issn":["0932-8351"]},"type":"journal_article","user_id":"220548","issue":"3","publication":"Die Bautechnik","publication_status":"published"},{"user_id":"220548","type":"conference","publication_identifier":{"isbn":["3-9522075-1-9"]},"project":[{"name":"Institute for Data Science Solutions","_id":"f432a2ee-bceb-11ed-a251-a83585c5074d"}],"publication":"16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000","title":"Applications of the Newton interior-point method for Maxwell´s equations","date_created":"2024-07-04T11:30:04Z","language":[{"iso":"eng"}],"year":"2000","editor":[{"first_name":"Michel","full_name":"Deville, Michel","last_name":"Deville"}],"_id":"4765","conference":{"end_date":"2000-08-25","start_date":"2000-08-21","location":"Lausanne, Schweiz","name":"16th IMACS World Congress on Scientific Computation"},"status":"public","place":"New Brunswick, NJ","author":[{"last_name":"Hoppe","full_name":"Hoppe, Ronald H.W.","first_name":"Ronald H.W."},{"last_name":"Petrova","full_name":"Petrova, Svetozara","id":"201871","first_name":"Svetozara"}],"citation":{"short":"R.H.W. Hoppe, S. Petrova, in: M. Deville (Ed.), 16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000, IMACS, New Brunswick, NJ, 2000.","chicago":"Hoppe, Ronald H.W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” In <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville. New Brunswick, NJ: IMACS, 2000.","mla":"Hoppe, Ronald H. W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville, IMACS, 2000.","ama":"Hoppe RHW, Petrova S. Applications of the Newton interior-point method for Maxwell´s equations. In: Deville M, ed. <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS; 2000.","ieee":"R. H. W. Hoppe and S. Petrova, “Applications of the Newton interior-point method for Maxwell´s equations,” in <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, Lausanne, Schweiz, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Hoppe, Ronald H.W.</span> ; <span style=\"font-variant:small-caps;\">Petrova, Svetozara</span>: Applications of the Newton interior-point method for Maxwell´s equations. In: <span style=\"font-variant:small-caps;\">Deville, M.</span> (Hrsg.): <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ : IMACS, 2000","bibtex":"@inproceedings{Hoppe_Petrova_2000, place={New Brunswick, NJ}, title={Applications of the Newton interior-point method for Maxwell´s equations}, booktitle={16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000}, publisher={IMACS}, author={Hoppe, Ronald H.W. and Petrova, Svetozara}, editor={Deville, MichelEditor}, year={2000} }","apa":"Hoppe, R. H. W., &#38; Petrova, S. (2000). Applications of the Newton interior-point method for Maxwell´s equations. In M. Deville (Ed.), <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS."},"publisher":"IMACS","date_updated":"2026-03-17T15:29:06Z"},{"language":[{"iso":"eng"}],"year":"2000","_id":"4766","status":"public","author":[{"id":"201871","first_name":"Svetozara","last_name":"Petrova","full_name":"Petrova, Svetozara"},{"full_name":"Tobiska, L.","last_name":"Tobiska","first_name":"L."},{"full_name":"Vassilevski, P.S.","last_name":"Vassilevski","first_name":"P.S."}],"citation":{"ama":"Petrova S, Tobiska L, Vassilevski PS. Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>. 2000;8(3):223-242.","mla":"Petrova, Svetozara, et al. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, VSP BV, 2000, pp. 223–42.","chicago":"Petrova, Svetozara, L. Tobiska, and P.S. Vassilevski. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> 8, no. 3 (2000): 223–42.","short":"S. Petrova, L. Tobiska, P.S. Vassilevski, EAST WEST JOURNAL OF NUMERICAL MATHEMATICS 8 (2000) 223–242.","bibtex":"@article{Petrova_Tobiska_Vassilevski_2000, title={Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems}, volume={8}, number={3}, journal={EAST WEST JOURNAL OF NUMERICAL MATHEMATICS}, publisher={VSP BV}, author={Petrova, Svetozara and Tobiska, L. and Vassilevski, P.S.}, year={2000}, pages={223–242} }","apa":"Petrova, S., Tobiska, L., &#38; Vassilevski, P. S. (2000). Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, <i>8</i>(3), 223–242.","alphadin":"<span style=\"font-variant:small-caps;\">Petrova, Svetozara</span> ; <span style=\"font-variant:small-caps;\">Tobiska, L.</span> ; <span style=\"font-variant:small-caps;\">Vassilevski, P.S.</span>: Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. In: <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> Bd. 8, VSP BV (2000), Nr. 3, S. 223–242","ieee":"S. Petrova, L. Tobiska, and P. S. Vassilevski, “Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems,” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, pp. 223–242, 2000."},"publisher":"VSP BV","page":"223-242","date_updated":"2026-03-17T15:29:06Z","intvolume":"         8","user_id":"220548","main_file_link":[{"url":"https://www.researchgate.net/publication/268251851_Multigrid_methods_based_on_matrix-dependent_coarse_spaces_for_nonconforming_streamline-diffusion_finite_element_discretization_of_convection-diffusion_problems"}],"publication_identifier":{"issn":["1570-2820"]},"type":"journal_article","project":[{"_id":"f432a2ee-bceb-11ed-a251-a83585c5074d","name":"Institute for Data Science Solutions"}],"publication":"EAST WEST JOURNAL OF NUMERICAL MATHEMATICS","issue":"3","volume":8,"title":"Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems","date_created":"2024-07-04T11:33:57Z"},{"status":"public","author":[{"first_name":"A.","full_name":"Klipp, A.","last_name":"Klipp"},{"last_name":"Petri","full_name":"Petri, S. H. A.","first_name":"S. H. A."},{"first_name":"P.","last_name":"Jutzi","full_name":"Jutzi, P."},{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874"},{"last_name":"Heinmann","full_name":"Heinmann, U.","first_name":"U."}],"citation":{"ieee":"A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.","bibtex":"@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany}, title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp, A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }","apa":"Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., &#38; Heinmann, U. (2000). The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>","alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Heinmann, U.</span>: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811","chicago":"Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>.","short":"A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 806–811.","ama":"Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:806-811. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>","mla":"Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 806–11, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>."},"place":"Weinheim, Germany","date_updated":"2026-03-17T15:28:46Z","page":"806-811","publisher":"Wiley-VCH Verlag GmbH","doi":"10.1002/9783527619917.ch123","language":[{"iso":"eng"}],"editor":[{"first_name":"Norbert","last_name":"Auner","full_name":"Auner, Norbert"},{"full_name":"Weis, Johann","last_name":"Weis","first_name":"Johann"}],"_id":"3548","year":"2000","date_created":"2023-09-01T10:01:28Z","title":"The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions","user_id":"216459","type":"book_chapter","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"publication":"Organosilicon Chemistry IV","publication_status":"published"},{"status":"public","place":"Weinheim, Germany","author":[{"first_name":"Frank","id":"208487","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank","last_name":"Hamelmann"},{"first_name":"G.","full_name":"Haindl, G.","last_name":"Haindl"},{"last_name":"Hartwich","full_name":"Hartwich, J.","first_name":"J."},{"first_name":"U.","last_name":"Kleineberg","full_name":"Kleineberg, U."},{"first_name":"U.","full_name":"Heinzmann, U.","last_name":"Heinzmann"},{"last_name":"Klipp","full_name":"Klipp, A.","first_name":"A."},{"full_name":"Petri, S. H. A.","last_name":"Petri","first_name":"S. H. A."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."}],"citation":{"ieee":"F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.","apa":"Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp, A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>","bibtex":"@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000, place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={798–805} }","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805","chicago":"Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>.","short":"F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.","ama":"Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>","mla":"Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 798–805, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>."},"publisher":"Wiley-VCH Verlag GmbH","page":"798-805","date_updated":"2026-03-17T15:28:46Z","doi":"10.1002/9783527619917.ch122","language":[{"iso":"eng"}],"year":"2000","_id":"3549","editor":[{"first_name":"Norbert","last_name":"Auner","full_name":"Auner, Norbert"},{"full_name":"Weis, Johann","last_name":"Weis","first_name":"Johann"}],"title":"In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors","date_created":"2023-09-01T10:02:22Z","user_id":"216459","publication_identifier":{"isbn":["9783527298549"],"eisbn":["9783527619917"]},"type":"book_chapter","publication":"Organosilicon Chemistry IV","publication_status":"published"},{"issue":"1-2","publication_status":"published","publication":"Thin Solid Films","user_id":"216459","publication_identifier":{"issn":["00406090"]},"type":"journal_article","volume":358,"date_created":"2023-09-01T10:03:34Z","title":"Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD","language":[{"iso":"eng"}],"_id":"3550","year":"2000","date_updated":"2026-03-17T15:28:46Z","publisher":"Elsevier BV","page":"90-93","doi":"10.1016/S0040-6090(99)00695-1","intvolume":"       358","status":"public","author":[{"first_name":"Frank","id":"208487","last_name":"Hamelmann","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank"},{"first_name":"G","last_name":"Haindl","full_name":"Haindl, G"},{"full_name":"Schmalhorst, J","last_name":"Schmalhorst","first_name":"J"},{"first_name":"A","full_name":"Aschentrup, A","last_name":"Aschentrup"},{"full_name":"Majkova, E","last_name":"Majkova","first_name":"E"},{"first_name":"U","last_name":"Kleineberg","full_name":"Kleineberg, U"},{"first_name":"U","full_name":"Heinzmann, U","last_name":"Heinzmann"},{"first_name":"A","full_name":"Klipp, A","last_name":"Klipp"},{"last_name":"Jutzi","full_name":"Jutzi, P","first_name":"P"},{"last_name":"Anopchenko","full_name":"Anopchenko, A","first_name":"A"},{"first_name":"M","full_name":"Jergel, M","last_name":"Jergel"},{"first_name":"S","last_name":"Luby","full_name":"Luby, S"}],"citation":{"ama":"Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>. 2000;358(1-2):90-93. doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>","mla":"Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>.","short":"F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.","chicago":"Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i> 358, no. 1–2 (2000): 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.","bibtex":"@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }","apa":"Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>, <i>358</i>(1–2), 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93","ieee":"F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000."}},{"volume":6,"title":"Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films","date_created":"2023-09-01T10:04:14Z","publication":"Chemical Vapor Deposition","publication_status":"published","issue":"2","user_id":"216459","type":"journal_article","publication_identifier":{"issn":["09481907"],"eissn":["15213862"]},"page":"63-66","publisher":"Wiley","date_updated":"2026-03-17T15:28:46Z","intvolume":"         6","doi":"10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","status":"public","citation":{"bibtex":"@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }","apa":"Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., &#38; Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>, <i>6</i>(2), 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span>: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: <i>Chemical Vapor Deposition</i> Bd. 6, Wiley (2000), Nr. 2, S. 63–66","ieee":"A. Klipp <i>et al.</i>, “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, pp. 63–66, 2000.","ama":"Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>. 2000;6(2):63-66. doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","mla":"Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.","short":"A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.","chicago":"Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i> 6, no. 2 (2000): 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>."},"author":[{"first_name":"A.","full_name":"Klipp, A.","last_name":"Klipp"},{"id":"208487","first_name":"Frank","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","last_name":"Hamelmann"},{"first_name":"G.","last_name":"Haindl","full_name":"Haindl, G."},{"full_name":"Hartwich, J.","last_name":"Hartwich","first_name":"J."},{"last_name":"Kleineberg","full_name":"Kleineberg, U.","first_name":"U."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."},{"first_name":"U.","last_name":"Heinzmann","full_name":"Heinzmann, U."}],"language":[{"iso":"eng"}],"year":"2000","_id":"3551"},{"language":[{"iso":"eng"}],"_id":"3581","year":"2000","date_updated":"2026-03-17T15:28:46Z","page":"61-83","intvolume":"         1","status":"public","citation":{"apa":"Brandt-Pook, H., Wachsmuth, S., Socher, G., Kummert, F., &#38; Sagerer, G. (2000). Integration of vision and speech understanding using bayesian networks, . <i>Videre: A Journal of Computer Vision Research</i>, <i>1</i>(4), 61–83.","bibtex":"@article{Brandt-Pook_Wachsmuth_Socher_Kummert_Sagerer_2000, title={Integration of vision and speech understanding using bayesian networks, }, volume={1}, number={4}, journal={Videre: A Journal of Computer Vision Research}, author={Brandt-Pook, Hans and Wachsmuth, S. and Socher, G. and Kummert, F. and Sagerer, G.}, year={2000}, pages={61–83} }","alphadin":"<span style=\"font-variant:small-caps;\">Brandt-Pook, Hans</span> ; <span style=\"font-variant:small-caps;\">Wachsmuth, S.</span> ; <span style=\"font-variant:small-caps;\">Socher, G.</span> ; <span style=\"font-variant:small-caps;\">Kummert, F.</span> ; <span style=\"font-variant:small-caps;\">Sagerer, G.</span>: Integration of vision and speech understanding using bayesian networks, . In: <i>Videre: A Journal of Computer Vision Research</i> Bd. 1 (2000), Nr. 4, S. 61–83","ieee":"H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer, “Integration of vision and speech understanding using bayesian networks, ,” <i>Videre: A Journal of Computer Vision Research</i>, vol. 1, no. 4, pp. 61–83, 2000.","ama":"Brandt-Pook H, Wachsmuth S, Socher G, Kummert F, Sagerer G. Integration of vision and speech understanding using bayesian networks, . <i>Videre: A Journal of Computer Vision Research</i>. 2000;1(4):61-83.","mla":"Brandt-Pook, Hans, et al. “Integration of Vision and Speech Understanding Using Bayesian Networks, .” <i>Videre: A Journal of Computer Vision Research</i>, vol. 1, no. 4, 2000, pp. 61–83.","short":"H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, G. Sagerer, Videre: A Journal of Computer Vision Research 1 (2000) 61–83.","chicago":"Brandt-Pook, Hans, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer. “Integration of Vision and Speech Understanding Using Bayesian Networks, .” <i>Videre: A Journal of Computer Vision Research</i> 1, no. 4 (2000): 61–83."},"author":[{"last_name":"Brandt-Pook","full_name":"Brandt-Pook, Hans","orcid":"0009-0002-6668-2684","orcid_put_code_url":"https://api.orcid.org/v2.0/0009-0002-6668-2684/work/156951512","id":"206531","first_name":"Hans"},{"first_name":"S.","full_name":"Wachsmuth, S.","last_name":"Wachsmuth"},{"first_name":"G.","last_name":"Socher","full_name":"Socher, G."},{"first_name":"F.","full_name":"Kummert, F.","last_name":"Kummert"},{"first_name":"G.","last_name":"Sagerer","full_name":"Sagerer, G."}],"issue":"4","publication":"Videre: A Journal of Computer Vision Research","user_id":"249224","type":"journal_article","publication_identifier":{"issn":["1089-2788"]},"volume":1,"date_created":"2023-09-11T21:48:21Z","title":"Integration of vision and speech understanding using bayesian networks, "},{"date_created":"2023-03-24T13:13:01Z","title":"Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers","volume":87,"issue":"9","publication":"Journal of Applied Physics","publication_status":"published","type":"journal_article","publication_identifier":{"eissn":["1089-7550"],"issn":["0021-8979"]},"extern":"1","user_id":"245590","doi":"10.1063/1.373179","intvolume":"        87","date_updated":"2026-03-17T15:28:35Z","publisher":"AIP Publishing","page":"4849-4851","author":[{"last_name":"Heitmann","full_name":"Heitmann, S.","first_name":"S."},{"first_name":"A.","full_name":"Hütten, A.","last_name":"Hütten"},{"last_name":"Hempel","full_name":"Hempel, T.","first_name":"T."},{"first_name":"W.","last_name":"Schepper","full_name":"Schepper, W."},{"first_name":"G.","full_name":"Reiss, G.","last_name":"Reiss"},{"first_name":"C.","full_name":"Alof, C.","last_name":"Alof"}],"citation":{"ieee":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers,” <i>Journal of Applied Physics</i>, vol. 87, no. 9, pp. 4849–4851, 2000.","apa":"Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., &#38; Alof, C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>, <i>87</i>(9), 4849–4851. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>","bibtex":"@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87}, DOI={<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann, S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.}, year={2000}, pages={4849–4851} }","alphadin":"<span style=\"font-variant:small-caps;\">Heitmann, S.</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span> ; <span style=\"font-variant:small-caps;\">Hempel, T.</span> ; <span style=\"font-variant:small-caps;\">Schepper, W.</span> ; <span style=\"font-variant:small-caps;\">Reiss, G.</span> ; <span style=\"font-variant:small-caps;\">Alof, C.</span>: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. In: <i>Journal of Applied Physics</i> Bd. 87, AIP Publishing (2000), Nr. 9, S. 4849–4851","chicago":"Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i> 87, no. 9 (2000): 4849–51. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>.","short":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal of Applied Physics 87 (2000) 4849–4851.","ama":"Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>. 2000;87(9):4849-4851. doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>","mla":"Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i>, vol. 87, no. 9, AIP Publishing, 2000, pp. 4849–51, doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>."},"status":"public","_id":"2685","year":"2000","language":[{"iso":"eng"}]},{"_id":"1505","year":"2000","language":[{"iso":"ger"}],"article_number":"A57","citation":{"mla":"Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” <i>at - Automatisierungstechnik</i>, vol. 48, no. 8, A57, Walter de Gruyter GmbH, 2000, doi:<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>.","ama":"Bachmann B, Wiesmann H. Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). <i>at - Automatisierungstechnik</i>. 2000;48(8). doi:<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>","short":"B. Bachmann, H. Wiesmann, at - Automatisierungstechnik 48 (2000).","chicago":"Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” <i>at - Automatisierungstechnik</i> 48, no. 8 (2000). <a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">https://doi.org/10.1524/auto.2000.48.8.a57</a>.","alphadin":"<span style=\"font-variant:small-caps;\">Bachmann, Bernhard</span> ; <span style=\"font-variant:small-caps;\">Wiesmann, H.</span>: Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). In: <i>at - Automatisierungstechnik</i> Bd. 48, Walter de Gruyter GmbH (2000), Nr. 8","apa":"Bachmann, B., &#38; Wiesmann, H. (2000). Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). <i>at - Automatisierungstechnik</i>, <i>48</i>(8). <a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">https://doi.org/10.1524/auto.2000.48.8.a57</a>","bibtex":"@article{Bachmann_Wiesmann_2000, title={Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15)}, volume={48}, DOI={<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>}, number={8A57}, journal={at - Automatisierungstechnik}, publisher={Walter de Gruyter GmbH}, author={Bachmann, Bernhard and Wiesmann, H.}, year={2000} }","ieee":"B. Bachmann and H. Wiesmann, “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15),” <i>at - Automatisierungstechnik</i>, vol. 48, no. 8, 2000."},"author":[{"last_name":"Bachmann","orcid":"0000-0002-4339-0438","full_name":"Bachmann, Bernhard","first_name":"Bernhard","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0002-4339-0438/work/102900665","id":"33931"},{"first_name":"H.","full_name":"Wiesmann, H.","last_name":"Wiesmann"}],"status":"public","doi":"10.1524/auto.2000.48.8.a57","intvolume":"        48","date_updated":"2026-03-17T15:28:21Z","publisher":"Walter de Gruyter GmbH","type":"journal_article","publication_identifier":{"eissn":["2196-677X"],"issn":["0178-2312"]},"user_id":"220548","publication":"at - Automatisierungstechnik","publication_status":"published","issue":"8","date_created":"2021-11-09T13:12:41Z","title":"Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15)","volume":48},{"quality_controlled":"1","date_created":"2021-06-03T12:37:56Z","article_type":"original","title":"Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data","volume":14,"type":"journal_article","publication_identifier":{"issn":["1121-7081"],"eissn":["1467-9914"]},"user_id":"249199","publication":"Labour","issue":"4","publication_status":"published","citation":{"ieee":"M. Pannenberg and J. Schwarze, “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data,” <i>Labour</i>, vol. 14, no. 4, pp. 645–655, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Pannenberg, Markus</span> ; <span style=\"font-variant:small-caps;\">Schwarze, Johannes</span>: Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. In: <i>Labour</i> Bd. 14, Wiley (2000), Nr. 4, S. 645–655","bibtex":"@article{Pannenberg_Schwarze_2000, title={Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data}, volume={14}, DOI={<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>}, number={4}, journal={Labour}, publisher={Wiley}, author={Pannenberg, Markus and Schwarze, Johannes}, year={2000}, pages={645–655} }","apa":"Pannenberg, M., &#38; Schwarze, J. (2000). Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. <i>Labour</i>, <i>14</i>(4), 645–655. <a href=\"https://doi.org/10.1111/1467-9914.00150\">https://doi.org/10.1111/1467-9914.00150</a>","chicago":"Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data.” <i>Labour</i> 14, no. 4 (2000): 645–55. <a href=\"https://doi.org/10.1111/1467-9914.00150\">https://doi.org/10.1111/1467-9914.00150</a>.","short":"M. Pannenberg, J. Schwarze, Labour 14 (2000) 645–655.","mla":"Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data.” <i>Labour</i>, vol. 14, no. 4, Wiley, 2000, pp. 645–55, doi:<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>.","ama":"Pannenberg M, Schwarze J. Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. <i>Labour</i>. 2000;14(4):645-655. doi:<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>"},"author":[{"full_name":"Pannenberg, Markus","last_name":"Pannenberg","first_name":"Markus","id":"201086"},{"full_name":"Schwarze, Johannes","last_name":"Schwarze","first_name":"Johannes"}],"status":"public","doi":"10.1111/1467-9914.00150","intvolume":"        14","date_updated":"2026-03-17T15:28:15Z","publisher":"Wiley","page":"645-655","_id":"1156","year":"2000","language":[{"iso":"eng"}]}]