[{"department":[{"_id":"103"}],"volume":87,"title":"Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers","date_created":"2023-03-24T13:13:01Z","extern":"1","user_id":"220548","alternative_id":["6895"],"publication_identifier":{"eissn":["1089-7550"],"issn":["0021-8979"]},"type":"journal_article","issue":"9","publication_status":"published","publication":"Journal of Applied Physics","research_group":[{"name":"Bielefelder Institut für Angewandte Materialforschung (BIfAM)","_id":"af778127-b366-11ed-bde2-daed2b8eafee"}],"status":"public","citation":{"ieee":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers,” <i>Journal of Applied Physics</i>, vol. 87, no. 9, pp. 4849–4851, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Heitmann, S.</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span> ; <span style=\"font-variant:small-caps;\">Hempel, T.</span> ; <span style=\"font-variant:small-caps;\">Schepper, W.</span> ; <span style=\"font-variant:small-caps;\">Reiss, G.</span> ; <span style=\"font-variant:small-caps;\">Alof, C.</span>: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. In: <i>Journal of Applied Physics</i> Bd. 87, AIP Publishing (2000), Nr. 9, S. 4849–4851","bibtex":"@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87}, DOI={<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann, S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.}, year={2000}, pages={4849–4851} }","apa":"Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., &#38; Alof, C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>, <i>87</i>(9), 4849–4851. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>","short":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal of Applied Physics 87 (2000) 4849–4851.","chicago":"Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i> 87, no. 9 (2000): 4849–51. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>.","mla":"Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i>, vol. 87, no. 9, AIP Publishing, 2000, pp. 4849–51, doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>.","ama":"Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>. 2000;87(9):4849-4851. doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>"},"author":[{"first_name":"S.","full_name":"Heitmann, S.","last_name":"Heitmann"},{"full_name":"Hütten, A.","last_name":"Hütten","first_name":"A."},{"first_name":"T.","full_name":"Hempel, T.","last_name":"Hempel"},{"first_name":"W.","last_name":"Schepper","full_name":"Schepper, W."},{"full_name":"Reiss, G.","last_name":"Reiss","first_name":"G."},{"first_name":"C.","full_name":"Alof, C.","last_name":"Alof"}],"page":"4849-4851","publisher":"AIP Publishing","date_updated":"2026-05-11T08:27:08Z","intvolume":"        87","doi":"10.1063/1.373179","language":[{"iso":"eng"}],"year":"2000","_id":"2685"},{"publication":"Der Aktuar","issue":"1","publication_status":"published","type":"review","user_id":"220548","date_created":"2025-02-18T18:09:08Z","title":"Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München","department":[{"_id":"103"}],"_id":"5682","year":"2000","language":[{"iso":"ger"}],"date_updated":"2026-03-17T15:29:21Z","author":[{"orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","last_name":"Cottin","first_name":"Claudia","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953063","id":"33935"}],"citation":{"ieee":"C. Cottin, “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München,” <i>Der Aktuar</i>, no. 1. 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. In: <i>Der Aktuar</i> (2000), Nr. 1","apa":"Cottin, C. (2000). Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>.","bibtex":"@article{Cottin_2000, title={Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München}, number={1}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, 2000.","mla":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, no. 1, 2000.","ama":"Cottin C. Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>. 2000;(1)."},"status":"public"},{"user_id":"220548","type":"review","issue":"2","publication_status":"published","publication":"Der Aktuar","department":[{"_id":"103"}],"title":"Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg","date_created":"2025-02-18T18:24:41Z","language":[{"iso":"ger"}],"year":"2000","_id":"5683","status":"public","citation":{"ama":"Cottin C. Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>. 2000;(2).","mla":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, no. 2, 2000.","chicago":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, 2000.","short":"C. Cottin, Der Aktuar (2000).","bibtex":"@article{Cottin_2000, title={Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. In: <i>Der Aktuar</i> (2000), Nr. 2","ieee":"C. Cottin, “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg,” <i>Der Aktuar</i>, no. 2. 2000."},"author":[{"last_name":"Cottin","orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","first_name":"Claudia","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953010","id":"33935"}],"date_updated":"2026-03-17T15:29:21Z"},{"issue":"2","publication":"Der Aktuar","publication_status":"published","publication_identifier":{"issn":["0948-7794"]},"type":"journal_article","user_id":"33935","date_created":"2025-02-18T18:26:23Z","title":"Arbeitsmarkt für (Versicherungs-)Mathematiker","department":[{"_id":"103"}],"_id":"5684","year":"2000","language":[{"iso":"ger"}],"date_updated":"2026-03-17T15:29:21Z","citation":{"ieee":"C. Cottin, “Arbeitsmarkt für (Versicherungs-)Mathematiker,” <i>Der Aktuar</i>, no. 2, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Arbeitsmarkt für (Versicherungs-)Mathematiker. In: <i>Der Aktuar</i> (2000), Nr. 2","apa":"Cottin, C. (2000). Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>, (2).","bibtex":"@article{Cottin_2000, title={Arbeitsmarkt für (Versicherungs-)Mathematiker}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","chicago":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2 (2000).","short":"C. Cottin, Der Aktuar (2000).","mla":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2, 2000.","ama":"Cottin C. Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>. 2000;(2)."},"author":[{"id":"33935","first_name":"Claudia","last_name":"Cottin","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027"}],"status":"public"},{"department":[{"_id":"103"}],"title":"Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München","date_created":"2025-02-18T18:27:36Z","user_id":"220548","type":"review","issue":"4","publication_status":"published","status":"public","author":[{"last_name":"Cottin","orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","first_name":"Claudia","id":"33935","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178952850"}],"citation":{"ieee":"C. Cottin, “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” no. 4. 2000.","apa":"Cottin, C. (2000). Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München.","bibtex":"@article{Cottin_2000, title={Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München}, number={4}, author={Cottin, Claudia}, year={2000} }","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München (2000), Nr. 4","short":"C. Cottin, (2000).","chicago":"Cottin, Claudia. “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” 2000.","ama":"Cottin C. Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München. 2000;(4).","mla":"Cottin, Claudia. <i>Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München</i>. no. 4, 2000."},"date_updated":"2026-03-17T15:29:21Z","language":[{"iso":"ger"}],"year":"2000","_id":"5685"},{"language":[{"iso":"eng"}],"_id":"5631","year":"2000","date_updated":"2026-03-17T15:29:20Z","publisher":"Elsevier BV","page":"63-70","doi":"10.1016/S0898-1221(00)00140-1","intvolume":"        40","status":"public","author":[{"full_name":"Chalmers, Bruce","last_name":"Chalmers","first_name":"Bruce"},{"full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","last_name":"Cottin","id":"33935","first_name":"Claudia"},{"last_name":"Shekhtman","full_name":"Shekhtman, Boris","first_name":"Boris"}],"citation":{"ama":"Chalmers B, Cottin C, Shekhtman B. Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>. 2000;40(1):63-70. doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>","mla":"Chalmers, Bruce, et al. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, Elsevier BV, 2000, pp. 63–70, doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>.","chicago":"Chalmers, Bruce, Claudia Cottin, and Boris Shekhtman. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i> 40, no. 1 (2000): 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>.","short":"B. Chalmers, C. Cottin, B. Shekhtman, Computers &#38; Mathematics with Applications 40 (2000) 63–70.","bibtex":"@article{Chalmers_Cottin_Shekhtman_2000, title={Minimal Boolean sum and blending-type projections and extensions}, volume={40}, DOI={<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>}, number={1}, journal={Computers &#38; Mathematics with Applications}, publisher={Elsevier BV}, author={Chalmers, Bruce and Cottin, Claudia and Shekhtman, Boris}, year={2000}, pages={63–70} }","apa":"Chalmers, B., Cottin, C., &#38; Shekhtman, B. (2000). Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>, <i>40</i>(1), 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>","alphadin":"<span style=\"font-variant:small-caps;\">Chalmers, Bruce</span> ; <span style=\"font-variant:small-caps;\">Cottin, Claudia</span> ; <span style=\"font-variant:small-caps;\">Shekhtman, Boris</span>: Minimal Boolean sum and blending-type projections and extensions. In: <i>Computers &#38; Mathematics with Applications</i> Bd. 40, Elsevier BV (2000), Nr. 1, S. 63–70","ieee":"B. Chalmers, C. Cottin, and B. Shekhtman, “Minimal Boolean sum and blending-type projections and extensions,” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, pp. 63–70, 2000."},"publication":"Computers & Mathematics with Applications","publication_status":"published","issue":"1","alternative_id":["4475"],"user_id":"33935","publication_identifier":{"issn":["0898-1221"]},"type":"journal_article","volume":40,"date_created":"2025-02-16T18:47:25Z","title":"Minimal Boolean sum and blending-type projections and extensions","department":[{"_id":"103"}]},{"department":[{"_id":"102"}],"date_created":"2025-01-03T08:14:23Z","title":"Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung","volume":77,"type":"journal_article","publication_identifier":{"issn":["0932-8351"]},"user_id":"220548","issue":"3","publication_status":"published","publication":"Die Bautechnik","author":[{"first_name":"Konstantin","full_name":"Meskouris, Konstantin","last_name":"Meskouris"},{"first_name":"Uwe","id":"202449","full_name":"Weitkemper, Uwe","last_name":"Weitkemper"}],"citation":{"ieee":"K. Meskouris and U. Weitkemper, “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung,” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Meskouris, Konstantin</span> ; <span style=\"font-variant:small-caps;\">Weitkemper, Uwe</span>: Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. In: <i>Die Bautechnik</i> Bd. 77 (2000), Nr. 3","apa":"Meskouris, K., &#38; Weitkemper, U. (2000). Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>, <i>77</i>(3).","bibtex":"@article{Meskouris_Weitkemper_2000, title={Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung}, volume={77}, number={3}, journal={Die Bautechnik}, author={Meskouris, Konstantin and Weitkemper, Uwe}, year={2000} }","short":"K. Meskouris, U. Weitkemper, Die Bautechnik 77 (2000).","chicago":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i> 77, no. 3 (2000).","mla":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","ama":"Meskouris K, Weitkemper U. Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>. 2000;77(3)."},"status":"public","intvolume":"        77","date_updated":"2026-03-17T15:29:15Z","_id":"5259","year":"2000","language":[{"iso":"ger"}]},{"date_updated":"2026-03-17T15:29:06Z","publisher":"IMACS","citation":{"ieee":"R. H. W. Hoppe and S. Petrova, “Applications of the Newton interior-point method for Maxwell´s equations,” in <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, Lausanne, Schweiz, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Hoppe, Ronald H.W.</span> ; <span style=\"font-variant:small-caps;\">Petrova, Svetozara</span>: Applications of the Newton interior-point method for Maxwell´s equations. In: <span style=\"font-variant:small-caps;\">Deville, M.</span> (Hrsg.): <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ : IMACS, 2000","bibtex":"@inproceedings{Hoppe_Petrova_2000, place={New Brunswick, NJ}, title={Applications of the Newton interior-point method for Maxwell´s equations}, booktitle={16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000}, publisher={IMACS}, author={Hoppe, Ronald H.W. and Petrova, Svetozara}, editor={Deville, MichelEditor}, year={2000} }","apa":"Hoppe, R. H. W., &#38; Petrova, S. (2000). Applications of the Newton interior-point method for Maxwell´s equations. In M. Deville (Ed.), <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS.","short":"R.H.W. Hoppe, S. Petrova, in: M. Deville (Ed.), 16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000, IMACS, New Brunswick, NJ, 2000.","chicago":"Hoppe, Ronald H.W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” In <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville. New Brunswick, NJ: IMACS, 2000.","mla":"Hoppe, Ronald H. W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville, IMACS, 2000.","ama":"Hoppe RHW, Petrova S. Applications of the Newton interior-point method for Maxwell´s equations. In: Deville M, ed. <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS; 2000."},"author":[{"last_name":"Hoppe","full_name":"Hoppe, Ronald H.W.","first_name":"Ronald H.W."},{"last_name":"Petrova","full_name":"Petrova, Svetozara","id":"201871","first_name":"Svetozara"}],"place":"New Brunswick, NJ","status":"public","conference":{"location":"Lausanne, Schweiz","name":"16th IMACS World Congress on Scientific Computation","start_date":"2000-08-21","end_date":"2000-08-25"},"editor":[{"full_name":"Deville, Michel","last_name":"Deville","first_name":"Michel"}],"_id":"4765","year":"2000","language":[{"iso":"eng"}],"date_created":"2024-07-04T11:30:04Z","title":"Applications of the Newton interior-point method for Maxwell´s equations","publication":"16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000","project":[{"_id":"f432a2ee-bceb-11ed-a251-a83585c5074d","name":"Institute for Data Science Solutions"}],"type":"conference","publication_identifier":{"isbn":["3-9522075-1-9"]},"user_id":"220548"},{"date_updated":"2026-03-17T15:29:06Z","publisher":"VSP BV","page":"223-242","intvolume":"         8","status":"public","author":[{"full_name":"Petrova, Svetozara","last_name":"Petrova","first_name":"Svetozara","id":"201871"},{"first_name":"L.","full_name":"Tobiska, L.","last_name":"Tobiska"},{"full_name":"Vassilevski, P.S.","last_name":"Vassilevski","first_name":"P.S."}],"citation":{"ieee":"S. Petrova, L. Tobiska, and P. S. Vassilevski, “Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems,” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, pp. 223–242, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Petrova, Svetozara</span> ; <span style=\"font-variant:small-caps;\">Tobiska, L.</span> ; <span style=\"font-variant:small-caps;\">Vassilevski, P.S.</span>: Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. In: <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> Bd. 8, VSP BV (2000), Nr. 3, S. 223–242","apa":"Petrova, S., Tobiska, L., &#38; Vassilevski, P. S. (2000). Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, <i>8</i>(3), 223–242.","bibtex":"@article{Petrova_Tobiska_Vassilevski_2000, title={Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems}, volume={8}, number={3}, journal={EAST WEST JOURNAL OF NUMERICAL MATHEMATICS}, publisher={VSP BV}, author={Petrova, Svetozara and Tobiska, L. and Vassilevski, P.S.}, year={2000}, pages={223–242} }","short":"S. Petrova, L. Tobiska, P.S. Vassilevski, EAST WEST JOURNAL OF NUMERICAL MATHEMATICS 8 (2000) 223–242.","chicago":"Petrova, Svetozara, L. Tobiska, and P.S. Vassilevski. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> 8, no. 3 (2000): 223–42.","mla":"Petrova, Svetozara, et al. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, VSP BV, 2000, pp. 223–42.","ama":"Petrova S, Tobiska L, Vassilevski PS. Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>. 2000;8(3):223-242."},"language":[{"iso":"eng"}],"_id":"4766","year":"2000","volume":8,"date_created":"2024-07-04T11:33:57Z","title":"Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems","publication":"EAST WEST JOURNAL OF NUMERICAL MATHEMATICS","issue":"3","main_file_link":[{"url":"https://www.researchgate.net/publication/268251851_Multigrid_methods_based_on_matrix-dependent_coarse_spaces_for_nonconforming_streamline-diffusion_finite_element_discretization_of_convection-diffusion_problems"}],"user_id":"220548","project":[{"_id":"f432a2ee-bceb-11ed-a251-a83585c5074d","name":"Institute for Data Science Solutions"}],"publication_identifier":{"issn":["1570-2820"]},"type":"journal_article"},{"language":[{"iso":"eng"}],"year":"2000","_id":"3548","editor":[{"last_name":"Auner","full_name":"Auner, Norbert","first_name":"Norbert"},{"first_name":"Johann","last_name":"Weis","full_name":"Weis, Johann"}],"publisher":"Wiley-VCH Verlag GmbH","page":"806-811","date_updated":"2026-03-17T15:28:46Z","doi":"10.1002/9783527619917.ch123","status":"public","place":"Weinheim, Germany","author":[{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"full_name":"Petri, S. H. A.","last_name":"Petri","first_name":"S. H. A."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."},{"first_name":"Frank","id":"208487","last_name":"Hamelmann","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank"},{"full_name":"Heinmann, U.","last_name":"Heinmann","first_name":"U."}],"citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Heinmann, U.</span>: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811","bibtex":"@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany}, title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp, A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }","apa":"Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., &#38; Heinmann, U. (2000). The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>","ieee":"A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.","mla":"Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 806–11, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>.","ama":"Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:806-811. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>","chicago":"Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>.","short":"A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 806–811."},"publication_status":"published","publication":"Organosilicon Chemistry IV","user_id":"216459","type":"book_chapter","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"title":"The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions","date_created":"2023-09-01T10:01:28Z"},{"publication":"Organosilicon Chemistry IV","publication_status":"published","type":"book_chapter","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"user_id":"216459","title":"In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors","date_created":"2023-09-01T10:02:22Z","year":"2000","_id":"3549","editor":[{"first_name":"Norbert","full_name":"Auner, Norbert","last_name":"Auner"},{"last_name":"Weis","full_name":"Weis, Johann","first_name":"Johann"}],"language":[{"iso":"eng"}],"doi":"10.1002/9783527619917.ch122","page":"798-805","publisher":"Wiley-VCH Verlag GmbH","date_updated":"2026-03-17T15:28:46Z","place":"Weinheim, Germany","citation":{"ieee":"F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805","apa":"Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp, A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>","bibtex":"@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000, place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={798–805} }","short":"F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.","chicago":"Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>.","mla":"Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 798–805, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>.","ama":"Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>"},"author":[{"first_name":"Frank","id":"208487","last_name":"Hamelmann","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank"},{"last_name":"Haindl","full_name":"Haindl, G.","first_name":"G."},{"first_name":"J.","full_name":"Hartwich, J.","last_name":"Hartwich"},{"first_name":"U.","full_name":"Kleineberg, U.","last_name":"Kleineberg"},{"full_name":"Heinzmann, U.","last_name":"Heinzmann","first_name":"U."},{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"last_name":"Petri","full_name":"Petri, S. H. A.","first_name":"S. H. A."},{"first_name":"P.","last_name":"Jutzi","full_name":"Jutzi, P."}],"status":"public"},{"user_id":"216459","type":"journal_article","publication_identifier":{"issn":["00406090"]},"publication":"Thin Solid Films","issue":"1-2","publication_status":"published","volume":358,"title":"Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD","date_created":"2023-09-01T10:03:34Z","language":[{"iso":"eng"}],"year":"2000","_id":"3550","status":"public","citation":{"chicago":"Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i> 358, no. 1–2 (2000): 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.","short":"F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.","ama":"Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>. 2000;358(1-2):90-93. doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>","mla":"Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>.","ieee":"F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000.","bibtex":"@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }","apa":"Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>, <i>358</i>(1–2), 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93"},"author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874"},{"full_name":"Haindl, G","last_name":"Haindl","first_name":"G"},{"full_name":"Schmalhorst, J","last_name":"Schmalhorst","first_name":"J"},{"last_name":"Aschentrup","full_name":"Aschentrup, A","first_name":"A"},{"last_name":"Majkova","full_name":"Majkova, E","first_name":"E"},{"first_name":"U","full_name":"Kleineberg, U","last_name":"Kleineberg"},{"first_name":"U","last_name":"Heinzmann","full_name":"Heinzmann, U"},{"last_name":"Klipp","full_name":"Klipp, A","first_name":"A"},{"full_name":"Jutzi, P","last_name":"Jutzi","first_name":"P"},{"full_name":"Anopchenko, A","last_name":"Anopchenko","first_name":"A"},{"full_name":"Jergel, M","last_name":"Jergel","first_name":"M"},{"last_name":"Luby","full_name":"Luby, S","first_name":"S"}],"page":"90-93","publisher":"Elsevier BV","date_updated":"2026-03-17T15:28:46Z","intvolume":"       358","doi":"10.1016/S0040-6090(99)00695-1"},{"user_id":"216459","publication_identifier":{"issn":["09481907"],"eissn":["15213862"]},"type":"journal_article","publication_status":"published","publication":"Chemical Vapor Deposition","issue":"2","volume":6,"title":"Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films","date_created":"2023-09-01T10:04:14Z","language":[{"iso":"eng"}],"year":"2000","_id":"3551","status":"public","citation":{"ieee":"A. Klipp <i>et al.</i>, “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, pp. 63–66, 2000.","apa":"Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., &#38; Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>, <i>6</i>(2), 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","bibtex":"@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }","alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span>: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: <i>Chemical Vapor Deposition</i> Bd. 6, Wiley (2000), Nr. 2, S. 63–66","short":"A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.","chicago":"Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i> 6, no. 2 (2000): 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.","ama":"Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>. 2000;6(2):63-66. doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","mla":"Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>."},"author":[{"first_name":"A.","last_name":"Klipp","full_name":"Klipp, A."},{"first_name":"Frank","id":"208487","last_name":"Hamelmann","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank"},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"first_name":"J.","last_name":"Hartwich","full_name":"Hartwich, J."},{"last_name":"Kleineberg","full_name":"Kleineberg, U.","first_name":"U."},{"first_name":"P.","full_name":"Jutzi, P.","last_name":"Jutzi"},{"first_name":"U.","full_name":"Heinzmann, U.","last_name":"Heinzmann"}],"publisher":"Wiley","page":"63-66","date_updated":"2026-03-17T15:28:46Z","intvolume":"         6","doi":"10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q"},{"status":"public","citation":{"mla":"Brandt-Pook, Hans, et al. “Integration of Vision and Speech Understanding Using Bayesian Networks, .” <i>Videre: A Journal of Computer Vision Research</i>, vol. 1, no. 4, 2000, pp. 61–83.","ama":"Brandt-Pook H, Wachsmuth S, Socher G, Kummert F, Sagerer G. Integration of vision and speech understanding using bayesian networks, . <i>Videre: A Journal of Computer Vision Research</i>. 2000;1(4):61-83.","chicago":"Brandt-Pook, Hans, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer. “Integration of Vision and Speech Understanding Using Bayesian Networks, .” <i>Videre: A Journal of Computer Vision Research</i> 1, no. 4 (2000): 61–83.","short":"H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, G. Sagerer, Videre: A Journal of Computer Vision Research 1 (2000) 61–83.","alphadin":"<span style=\"font-variant:small-caps;\">Brandt-Pook, Hans</span> ; <span style=\"font-variant:small-caps;\">Wachsmuth, S.</span> ; <span style=\"font-variant:small-caps;\">Socher, G.</span> ; <span style=\"font-variant:small-caps;\">Kummert, F.</span> ; <span style=\"font-variant:small-caps;\">Sagerer, G.</span>: Integration of vision and speech understanding using bayesian networks, . In: <i>Videre: A Journal of Computer Vision Research</i> Bd. 1 (2000), Nr. 4, S. 61–83","bibtex":"@article{Brandt-Pook_Wachsmuth_Socher_Kummert_Sagerer_2000, title={Integration of vision and speech understanding using bayesian networks, }, volume={1}, number={4}, journal={Videre: A Journal of Computer Vision Research}, author={Brandt-Pook, Hans and Wachsmuth, S. and Socher, G. and Kummert, F. and Sagerer, G.}, year={2000}, pages={61–83} }","apa":"Brandt-Pook, H., Wachsmuth, S., Socher, G., Kummert, F., &#38; Sagerer, G. (2000). Integration of vision and speech understanding using bayesian networks, . <i>Videre: A Journal of Computer Vision Research</i>, <i>1</i>(4), 61–83.","ieee":"H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer, “Integration of vision and speech understanding using bayesian networks, ,” <i>Videre: A Journal of Computer Vision Research</i>, vol. 1, no. 4, pp. 61–83, 2000."},"author":[{"first_name":"Hans","orcid_put_code_url":"https://api.orcid.org/v2.0/0009-0002-6668-2684/work/156951512","id":"206531","last_name":"Brandt-Pook","orcid":"0009-0002-6668-2684","full_name":"Brandt-Pook, Hans"},{"first_name":"S.","full_name":"Wachsmuth, S.","last_name":"Wachsmuth"},{"first_name":"G.","full_name":"Socher, G.","last_name":"Socher"},{"first_name":"F.","full_name":"Kummert, F.","last_name":"Kummert"},{"last_name":"Sagerer","full_name":"Sagerer, G.","first_name":"G."}],"page":"61-83","date_updated":"2026-03-17T15:28:46Z","intvolume":"         1","language":[{"iso":"eng"}],"year":"2000","_id":"3581","volume":1,"title":"Integration of vision and speech understanding using bayesian networks, ","date_created":"2023-09-11T21:48:21Z","user_id":"249224","type":"journal_article","publication_identifier":{"issn":["1089-2788"]},"publication":"Videre: A Journal of Computer Vision Research","issue":"4"},{"doi":"10.1524/auto.2000.48.8.a57","intvolume":"        48","date_updated":"2026-03-17T15:28:21Z","publisher":"Walter de Gruyter GmbH","author":[{"first_name":"Bernhard","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0002-4339-0438/work/102900665","id":"33931","orcid":"0000-0002-4339-0438","full_name":"Bachmann, Bernhard","last_name":"Bachmann"},{"first_name":"H.","full_name":"Wiesmann, H.","last_name":"Wiesmann"}],"citation":{"bibtex":"@article{Bachmann_Wiesmann_2000, title={Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15)}, volume={48}, DOI={<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>}, number={8A57}, journal={at - Automatisierungstechnik}, publisher={Walter de Gruyter GmbH}, author={Bachmann, Bernhard and Wiesmann, H.}, year={2000} }","apa":"Bachmann, B., &#38; Wiesmann, H. (2000). Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). <i>at - Automatisierungstechnik</i>, <i>48</i>(8). <a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">https://doi.org/10.1524/auto.2000.48.8.a57</a>","alphadin":"<span style=\"font-variant:small-caps;\">Bachmann, Bernhard</span> ; <span style=\"font-variant:small-caps;\">Wiesmann, H.</span>: Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). In: <i>at - Automatisierungstechnik</i> Bd. 48, Walter de Gruyter GmbH (2000), Nr. 8","ieee":"B. Bachmann and H. Wiesmann, “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15),” <i>at - Automatisierungstechnik</i>, vol. 48, no. 8, 2000.","ama":"Bachmann B, Wiesmann H. Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). <i>at - Automatisierungstechnik</i>. 2000;48(8). doi:<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>","mla":"Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” <i>at - Automatisierungstechnik</i>, vol. 48, no. 8, A57, Walter de Gruyter GmbH, 2000, doi:<a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">10.1524/auto.2000.48.8.a57</a>.","chicago":"Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” <i>at - Automatisierungstechnik</i> 48, no. 8 (2000). <a href=\"https://doi.org/10.1524/auto.2000.48.8.a57\">https://doi.org/10.1524/auto.2000.48.8.a57</a>.","short":"B. Bachmann, H. Wiesmann, at - Automatisierungstechnik 48 (2000)."},"status":"public","article_number":"A57","_id":"1505","year":"2000","language":[{"iso":"ger"}],"date_created":"2021-11-09T13:12:41Z","title":"Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15)","volume":48,"issue":"8","publication":"at - Automatisierungstechnik","publication_status":"published","type":"journal_article","publication_identifier":{"issn":["0178-2312"],"eissn":["2196-677X"]},"user_id":"220548"},{"quality_controlled":"1","date_created":"2021-06-03T12:37:56Z","article_type":"original","title":"Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data","volume":14,"publication_identifier":{"eissn":["1467-9914"],"issn":["1121-7081"]},"type":"journal_article","user_id":"249199","publication_status":"published","publication":"Labour","issue":"4","citation":{"short":"M. Pannenberg, J. Schwarze, Labour 14 (2000) 645–655.","chicago":"Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data.” <i>Labour</i> 14, no. 4 (2000): 645–55. <a href=\"https://doi.org/10.1111/1467-9914.00150\">https://doi.org/10.1111/1467-9914.00150</a>.","mla":"Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data.” <i>Labour</i>, vol. 14, no. 4, Wiley, 2000, pp. 645–55, doi:<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>.","ama":"Pannenberg M, Schwarze J. Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. <i>Labour</i>. 2000;14(4):645-655. doi:<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>","ieee":"M. Pannenberg and J. Schwarze, “Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data,” <i>Labour</i>, vol. 14, no. 4, pp. 645–655, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Pannenberg, Markus</span> ; <span style=\"font-variant:small-caps;\">Schwarze, Johannes</span>: Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. In: <i>Labour</i> Bd. 14, Wiley (2000), Nr. 4, S. 645–655","apa":"Pannenberg, M., &#38; Schwarze, J. (2000). Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data. <i>Labour</i>, <i>14</i>(4), 645–655. <a href=\"https://doi.org/10.1111/1467-9914.00150\">https://doi.org/10.1111/1467-9914.00150</a>","bibtex":"@article{Pannenberg_Schwarze_2000, title={Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data}, volume={14}, DOI={<a href=\"https://doi.org/10.1111/1467-9914.00150\">10.1111/1467-9914.00150</a>}, number={4}, journal={Labour}, publisher={Wiley}, author={Pannenberg, Markus and Schwarze, Johannes}, year={2000}, pages={645–655} }"},"author":[{"first_name":"Markus","id":"201086","last_name":"Pannenberg","full_name":"Pannenberg, Markus"},{"full_name":"Schwarze, Johannes","last_name":"Schwarze","first_name":"Johannes"}],"status":"public","doi":"10.1111/1467-9914.00150","intvolume":"        14","date_updated":"2026-03-17T15:28:15Z","page":"645-655","publisher":"Wiley","_id":"1156","year":"2000","language":[{"iso":"eng"}]}]