[{"type":"book_chapter","publication_identifier":{"isbn":["3-7785-2829-7","978-3-7785-2829-7"]},"user_id":"220548","publication":"Virtuelle Instrumente in der Praxis","publication_status":"published","department":[{"_id":"102"}],"title":"A New Laboratory Device Communication Profile Standard based on Measurement Bus","date_created":"2023-05-31T15:01:07Z","year":"2001","editor":[{"full_name":"Jamal, Rahman","last_name":"Jamal","first_name":"Rahman"},{"full_name":"Jaschinski, Hans","last_name":"Jaschinski","first_name":"Hans"}],"_id":"3121","language":[{"iso":"ger"}],"place":"Heidelberg","author":[{"last_name":"Battermann","full_name":"Battermann, Sven","orcid":"0000-0001-7203-7396","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-7203-7396/work/173943094","id":"219522","first_name":"Sven"},{"first_name":"Ulrich","full_name":"Wagner, Ulrich","last_name":"Wagner"}],"citation":{"ieee":"S. Battermann and U. Wagner, “A New Laboratory Device Communication Profile Standard based on Measurement Bus,” in <i>Virtuelle Instrumente in der Praxis</i>, R. Jamal and H. Jaschinski, Eds. Heidelberg: Hüthig GmbH &#38; Co. KG, 2001, pp. 19–25.","apa":"Battermann, S., &#38; Wagner, U. (2001). A New Laboratory Device Communication Profile Standard based on Measurement Bus. In R. Jamal &#38; H. Jaschinski (Eds.), <i>Virtuelle Instrumente in der Praxis</i> (pp. 19–25). Heidelberg: Hüthig GmbH &#38; Co. KG.","bibtex":"@inbook{Battermann_Wagner_2001, place={Heidelberg}, title={A New Laboratory Device Communication Profile Standard based on Measurement Bus}, booktitle={Virtuelle Instrumente in der Praxis}, publisher={Hüthig GmbH &#38; Co. KG}, author={Battermann, Sven and Wagner, Ulrich}, editor={Jamal, Rahman and Jaschinski, HansEditors}, year={2001}, pages={19–25} }","alphadin":"<span style=\"font-variant:small-caps;\">Battermann, Sven</span> ; <span style=\"font-variant:small-caps;\">Wagner, Ulrich</span>: A New Laboratory Device Communication Profile Standard based on Measurement Bus. In: <span style=\"font-variant:small-caps;\">Jamal, R.</span> ; <span style=\"font-variant:small-caps;\">Jaschinski, H.</span> (Hrsg.): <i>Virtuelle Instrumente in der Praxis</i>. Heidelberg : Hüthig GmbH &#38; Co. KG, 2001, S. 19–25","chicago":"Battermann, Sven, and Ulrich Wagner. “A New Laboratory Device Communication Profile Standard based on Measurement Bus.” In <i>Virtuelle Instrumente in der Praxis</i>, edited by Rahman Jamal and Hans Jaschinski, 19–25. Heidelberg: Hüthig GmbH &#38; Co. KG, 2001.","short":"S. Battermann, U. Wagner, in: R. Jamal, H. Jaschinski (Eds.), Virtuelle Instrumente in der Praxis, Hüthig GmbH &#38; Co. KG, Heidelberg, 2001, pp. 19–25.","ama":"Battermann S, Wagner U. A New Laboratory Device Communication Profile Standard based on Measurement Bus. In: Jamal R, Jaschinski H, eds. <i>Virtuelle Instrumente in der Praxis</i>. Heidelberg: Hüthig GmbH &#38; Co. KG; 2001:19-25.","mla":"Battermann, Sven, and Ulrich Wagner. “A New Laboratory Device Communication Profile Standard based on Measurement Bus.” <i>Virtuelle Instrumente in der Praxis</i>, edited by Rahman Jamal and Hans Jaschinski, Hüthig GmbH &#38; Co. KG, 2001, pp. 19–25."},"conference":{"name":"Virtuelle Instrumente in der Praxis VIP 2001","location":"München"},"status":"public","page":"19-25","publisher":"Hüthig GmbH & Co. KG","date_updated":"2026-03-17T15:28:41Z"},{"citation":{"ama":"Schleiwies J, Schmitz G, Heitmann S, Hütten A. Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. <i>Applied Physics Letters</i>. 2001;78(22):3439-3441. doi:<a href=\"https://doi.org/10.1063/1.1374999\">10.1063/1.1374999</a>","mla":"Schleiwies, J., et al. “Nanoanalysis of Co/Cu/NiFe Thin Films by Tomographic Atom Probe.” <i>Applied Physics Letters</i>, vol. 78, no. 22, AIP Publishing, 2001, pp. 3439–41, doi:<a href=\"https://doi.org/10.1063/1.1374999\">10.1063/1.1374999</a>.","chicago":"Schleiwies, J., G. Schmitz, Sonja Heitmann, and A. Hütten. “Nanoanalysis of Co/Cu/NiFe Thin Films by Tomographic Atom Probe.” <i>Applied Physics Letters</i> 78, no. 22 (2001): 3439–41. <a href=\"https://doi.org/10.1063/1.1374999\">https://doi.org/10.1063/1.1374999</a>.","short":"J. Schleiwies, G. Schmitz, S. Heitmann, A. Hütten, Applied Physics Letters 78 (2001) 3439–3441.","apa":"Schleiwies, J., Schmitz, G., Heitmann, S., &#38; Hütten, A. (2001). Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. <i>Applied Physics Letters</i>, <i>78</i>(22), 3439–3441. <a href=\"https://doi.org/10.1063/1.1374999\">https://doi.org/10.1063/1.1374999</a>","bibtex":"@article{Schleiwies_Schmitz_Heitmann_Hütten_2001, title={Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe}, volume={78}, DOI={<a href=\"https://doi.org/10.1063/1.1374999\">10.1063/1.1374999</a>}, number={22}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Schleiwies, J. and Schmitz, G. and Heitmann, Sonja and Hütten, A.}, year={2001}, pages={3439–3441} }","alphadin":"<span style=\"font-variant:small-caps;\">Schleiwies, J.</span> ; <span style=\"font-variant:small-caps;\">Schmitz, G.</span> ; <span style=\"font-variant:small-caps;\">Heitmann, Sonja</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span>: Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe. In: <i>Applied Physics Letters</i> Bd. 78, AIP Publishing (2001), Nr. 22, S. 3439–3441","ieee":"J. Schleiwies, G. Schmitz, S. Heitmann, and A. Hütten, “Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe,” <i>Applied Physics Letters</i>, vol. 78, no. 22, pp. 3439–3441, 2001."},"author":[{"first_name":"J.","full_name":"Schleiwies, J.","last_name":"Schleiwies"},{"first_name":"G.","full_name":"Schmitz, G.","last_name":"Schmitz"},{"last_name":"Heitmann","orcid":"0000-0002-5503-2128","full_name":"Heitmann, Sonja","first_name":"Sonja","id":"202389"},{"first_name":"A.","last_name":"Hütten","full_name":"Hütten, A."}],"status":"public","doi":"10.1063/1.1374999","intvolume":"        78","date_updated":"2026-03-17T15:28:35Z","page":"3439-3441","publisher":"AIP Publishing","_id":"2683","year":"2001","language":[{"iso":"eng"}],"quality_controlled":"1","department":[{"_id":"103"}],"date_created":"2023-03-24T13:12:58Z","title":"Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe","volume":78,"type":"journal_article","publication_identifier":{"issn":["0003-6951"],"eissn":["1077-3118"]},"user_id":"202389","extern":"1","research_group":[{"_id":"af778127-b366-11ed-bde2-daed2b8eafee","name":"Bielefelder Institut für Angewandte Materialforschung (BIfAM)"}],"issue":"22","publication_status":"published","publication":"Applied Physics Letters"},{"status":"public","author":[{"first_name":"Sonja","id":"202389","orcid":"0000-0002-5503-2128","full_name":"Heitmann, Sonja","last_name":"Heitmann"},{"first_name":"A.","last_name":"Hütten","full_name":"Hütten, A."},{"first_name":"T.","last_name":"Hempel","full_name":"Hempel, T."},{"last_name":"Schepper","full_name":"Schepper, W.","first_name":"W."},{"first_name":"G.","full_name":"Reiss, G.","last_name":"Reiss"}],"citation":{"ama":"Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G. Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers. <i>Journal of Magnetism and Magnetic Materials</i>. 2001;226-230:1752-1754. doi:<a href=\"https://doi.org/10.1016/S0304-8853(00)00885-4\">10.1016/S0304-8853(00)00885-4</a>","mla":"Heitmann, Sonja, et al. “Enhanced GMR Amplitude and Temperature Stability of Copper/Permalloy Combination Multilayers.” <i>Journal of Magnetism and Magnetic Materials</i>, vol. 226–230, Elsevier BV, 2001, pp. 1752–54, doi:<a href=\"https://doi.org/10.1016/S0304-8853(00)00885-4\">10.1016/S0304-8853(00)00885-4</a>.","short":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, Journal of Magnetism and Magnetic Materials 226–230 (2001) 1752–1754.","chicago":"Heitmann, Sonja, A. Hütten, T. Hempel, W. Schepper, and G. Reiss. “Enhanced GMR Amplitude and Temperature Stability of Copper/Permalloy Combination Multilayers.” <i>Journal of Magnetism and Magnetic Materials</i> 226–230 (2001): 1752–54. <a href=\"https://doi.org/10.1016/S0304-8853(00)00885-4\">https://doi.org/10.1016/S0304-8853(00)00885-4</a>.","apa":"Heitmann, S., Hütten, A., Hempel, T., Schepper, W., &#38; Reiss, G. (2001). Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers. <i>Journal of Magnetism and Magnetic Materials</i>, <i>226</i>–<i>230</i>, 1752–1754. <a href=\"https://doi.org/10.1016/S0304-8853(00)00885-4\">https://doi.org/10.1016/S0304-8853(00)00885-4</a>","bibtex":"@article{Heitmann_Hütten_Hempel_Schepper_Reiss_2001, title={Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers}, volume={226–230}, DOI={<a href=\"https://doi.org/10.1016/S0304-8853(00)00885-4\">10.1016/S0304-8853(00)00885-4</a>}, journal={Journal of Magnetism and Magnetic Materials}, publisher={Elsevier BV}, author={Heitmann, Sonja and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G.}, year={2001}, pages={1752–1754} }","alphadin":"<span style=\"font-variant:small-caps;\">Heitmann, Sonja</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span> ; <span style=\"font-variant:small-caps;\">Hempel, T.</span> ; <span style=\"font-variant:small-caps;\">Schepper, W.</span> ; <span style=\"font-variant:small-caps;\">Reiss, G.</span>: Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers. In: <i>Journal of Magnetism and Magnetic Materials</i> Bd. 226–230, Elsevier BV (2001), S. 1752–1754","ieee":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, and G. Reiss, “Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers,” <i>Journal of Magnetism and Magnetic Materials</i>, vol. 226–230, pp. 1752–1754, 2001."},"date_updated":"2026-03-17T15:28:35Z","page":"1752-1754","publisher":"Elsevier BV","doi":"10.1016/S0304-8853(00)00885-4","language":[{"iso":"eng"}],"_id":"2684","year":"2001","department":[{"_id":"103"}],"quality_controlled":"1","volume":"226-230","date_created":"2023-03-24T13:12:59Z","title":"Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers","extern":"1","user_id":"202389","type":"journal_article","publication_identifier":{"issn":["03048853"]},"research_group":[{"_id":"af778127-b366-11ed-bde2-daed2b8eafee","name":"Bielefelder Institut für Angewandte Materialforschung (BIfAM)"}],"publication_status":"published","publication":"Journal of Magnetism and Magnetic Materials"},{"user_id":"220548","extern":"1","publication_identifier":{"issn":["0935-0187"]},"type":"journal_article","issue":"10","publication_status":"published","publication":"SPS Magazin","department":[{"_id":"102"}],"date_created":"2023-02-11T17:38:19Z","title":"Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen","language":[{"iso":"ger"}],"_id":"2404","year":"2001","status":"public","citation":{"bibtex":"@article{Wagner_Battermann_2001, title={Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen}, number={10}, journal={SPS Magazin}, publisher={Technik-Dokumentations-Verlag GmbH}, author={Wagner, Ulrich and Battermann, Sven}, year={2001}, pages={42–46} }","apa":"Wagner, U., &#38; Battermann, S. (2001). Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen. <i>SPS Magazin</i>, (10), 42–46.","alphadin":"<span style=\"font-variant:small-caps;\">Wagner, Ulrich</span> ; <span style=\"font-variant:small-caps;\">Battermann, Sven</span>: Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen. In: <i>SPS Magazin</i>, Technik-Dokumentations-Verlag GmbH (2001), Nr. 10, S. 42–46","ieee":"U. Wagner and S. Battermann, “Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen,” <i>SPS Magazin</i>, no. 10, pp. 42–46, 2001.","ama":"Wagner U, Battermann S. Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen. <i>SPS Magazin</i>. 2001;(10):42-46.","mla":"Wagner, Ulrich, and Sven Battermann. “Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen.” <i>SPS Magazin</i>, no. 10, Technik-Dokumentations-Verlag GmbH, 2001, pp. 42–46.","chicago":"Wagner, Ulrich, and Sven Battermann. “Installation und Betrieb: Feldbusse in sicherheitsgerichteten Applikationen.” <i>SPS Magazin</i>, no. 10 (2001): 42–46.","short":"U. Wagner, S. Battermann, SPS Magazin (2001) 42–46."},"author":[{"full_name":"Wagner, Ulrich","last_name":"Wagner","first_name":"Ulrich"},{"last_name":"Battermann","full_name":"Battermann, Sven","orcid":"0000-0001-7203-7396","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-7203-7396/work/173942340","id":"219522","first_name":"Sven"}],"date_updated":"2026-03-17T15:28:32Z","page":"42-46","publisher":"Technik-Dokumentations-Verlag GmbH"},{"status":"public","author":[{"full_name":"Wagner, Ulrich","last_name":"Wagner","first_name":"Ulrich"},{"id":"219522","first_name":"Sven","last_name":"Battermann","full_name":"Battermann, Sven","orcid":"0000-0001-7203-7396"}],"citation":{"ieee":"U. Wagner and S. Battermann, “Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus,” <i>Chemie Ingenieur Technik</i>, vol. 73, no. 6, pp. 656–656, 2001.","bibtex":"@article{Wagner_Battermann_2001, title={Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus}, volume={73}, DOI={<a href=\"https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8\">10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8</a>}, number={6}, journal={Chemie Ingenieur Technik}, publisher={Wiley}, author={Wagner, Ulrich and Battermann, Sven}, year={2001}, pages={656–656} }","apa":"Wagner, U., &#38; Battermann, S. (2001). Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus. <i>Chemie Ingenieur Technik</i>, <i>73</i>(6), 656–656. <a href=\"https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8\">https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8</a>","alphadin":"<span style=\"font-variant:small-caps;\">Wagner, Ulrich</span> ; <span style=\"font-variant:small-caps;\">Battermann, Sven</span>: Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus. In: <i>Chemie Ingenieur Technik</i> Bd. 73, Wiley (2001), Nr. 6, S. 656–656","short":"U. Wagner, S. Battermann, Chemie Ingenieur Technik 73 (2001) 656–656.","chicago":"Wagner, Ulrich, and Sven Battermann. “Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus.” <i>Chemie Ingenieur Technik</i> 73, no. 6 (2001): 656–656. <a href=\"https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8\">https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8</a>.","ama":"Wagner U, Battermann S. Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus. <i>Chemie Ingenieur Technik</i>. 2001;73(6):656-656. doi:<a href=\"https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8\">10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8</a>","mla":"Wagner, Ulrich, and Sven Battermann. “Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus.” <i>Chemie Ingenieur Technik</i>, vol. 73, no. 6, Wiley, 2001, pp. 656–656, doi:<a href=\"https://doi.org/10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8\">10.1002/1522-2640(200106)73:6&#60;656::AID-CITE6562222&#62;3.0.CO;2-8</a>."},"date_updated":"2026-03-17T15:28:29Z","page":"656-656","publisher":"Wiley","doi":"10.1002/1522-2640(200106)73:6<656::AID-CITE6562222>3.0.CO;2-8","intvolume":"        73","language":[{"iso":"eng"}],"_id":"2139","year":"2001","volume":73,"date_created":"2022-09-24T09:06:30Z","title":"Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus","user_id":"219522","extern":"1","publication_identifier":{"eissn":["15222640"],"issn":["0009286X"]},"type":"journal_article","issue":"6","publication_status":"published","publication":"Chemie Ingenieur Technik"},{"series_title":"VDI Berichte","type":"conference","project":[{"_id":"f89a05bb-bcea-11ed-9442-ed382659bc06","name":"Bielefelder Institut für Angewandte Materialforschung"}],"user_id":"35809","corporate_editor":["VDI"],"title":"Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke","date_created":"2022-04-22T14:08:18Z","volume":1646,"year":"2001","_id":"1904","language":[{"iso":"eng"}],"intvolume":"      1646","page":"293","date_updated":"2026-03-17T15:28:26Z","author":[{"first_name":"Michael","full_name":"von der Beeck, Michael","last_name":"von der Beeck"},{"first_name":"Peter","last_name":"Braun","full_name":"Braun, Peter"},{"first_name":"Martin","last_name":"Rappl","full_name":"Rappl, Martin"},{"last_name":"Schröder","orcid":"0000-0002-6391-6548","full_name":"Schröder, Christian","first_name":"Christian","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0002-6391-6548/work/173941037","id":"35809"}],"citation":{"chicago":"Beeck, Michael von der, Peter Braun, Martin Rappl, and Christian Schröder. “Modellbasierte Softwareentwicklung Für Automobilspezifische Steuergerätenetzwerke.” Edited by VDI. VDI Berichte, 2001.","short":"M. von der Beeck, P. Braun, M. Rappl, C. Schröder, 1646 (2001) 293.","ama":"von der Beeck M, Braun P, Rappl M, Schröder C. Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke. VDI, ed. 2001;1646:293.","mla":"von der Beeck, Michael, et al. <i>Modellbasierte Softwareentwicklung Für Automobilspezifische Steuergerätenetzwerke</i>. Edited by VDI, vol. 1646, 2001, p. 293.","ieee":"M. von der Beeck, P. Braun, M. Rappl, and C. Schröder, “Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke,” vol. 1646. p. 293, 2001.","apa":"von der Beeck, M., Braun, P., Rappl, M., &#38; Schröder, C. (2001). Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke. (VDI, Ed.). Presented at the VDI Kongress: Elektronik in KFZ, Baden Baden.","bibtex":"@article{von der Beeck_Braun_Rappl_Schröder_2001, series={VDI Berichte}, title={Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke}, volume={1646}, author={von der Beeck, Michael and Braun, Peter and Rappl, Martin and Schröder, Christian}, editor={VDIEditor}, year={2001}, pages={293}, collection={VDI Berichte} }","alphadin":"<span style=\"font-variant:small-caps;\">von der Beeck, Michael</span> ; <span style=\"font-variant:small-caps;\">Braun, Peter</span> ; <span style=\"font-variant:small-caps;\">Rappl, Martin</span> ; <span style=\"font-variant:small-caps;\">Schröder, Christian</span>: Modellbasierte Softwareentwicklung für automobilspezifische Steuergerätenetzwerke. In: <span style=\"font-variant:small-caps;\">VDI</span> (Hrsg.) , <i>VDI Berichte</i>. Bd. 1646 (2001)"},"conference":{"start_date":"2001-09-27","end_date":"2001-09-28","location":"Baden Baden","name":"VDI Kongress: Elektronik in KFZ"},"status":"public"},{"status":"public","author":[{"full_name":"Müller, Achim","last_name":"Müller","first_name":"Achim"},{"first_name":"Marshall","full_name":"Luban, Marshall","last_name":"Luban"},{"last_name":"Schröder","full_name":"Schröder, Christian","orcid":"0000-0002-6391-6548","id":"35809","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0002-6391-6548/work/96660317","first_name":"Christian"},{"last_name":"Modler","full_name":"Modler, Robert","first_name":"Robert"},{"full_name":"Kögerler, Paul","last_name":"Kögerler","first_name":"Paul"},{"first_name":"Maria","last_name":"Axenovich","full_name":"Axenovich, Maria"},{"first_name":"Jürgen","last_name":"Schnack","full_name":"Schnack, Jürgen"},{"first_name":"Paul","full_name":"Canfield, Paul","last_name":"Canfield"},{"full_name":"Bud'ko, Sergey","last_name":"Bud'ko","first_name":"Sergey"},{"first_name":"Neil","full_name":"Harrison, Neil","last_name":"Harrison"}],"citation":{"short":"A. Müller, M. Luban, C. Schröder, R. Modler, P. Kögerler, M. Axenovich, J. Schnack, P. Canfield, S. Bud’ko, N. Harrison, ChemPhysChem 2 (2001) 517–521.","chicago":"Müller, Achim, Marshall Luban, Christian Schröder, Robert Modler, Paul Kögerler, Maria Axenovich, Jürgen Schnack, Paul Canfield, Sergey Bud’ko, and Neil Harrison. “Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules.” <i>ChemPhysChem</i> 2, no. 8–9 (2001): 517–21. <a href=\"https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1\">https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1</a>.","mla":"Müller, Achim, et al. “Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules.” <i>ChemPhysChem</i>, vol. 2, no. 8–9, Wiley, 2001, pp. 517–21, doi:<a href=\"https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1\">10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1</a>.","ama":"Müller A, Luban M, Schröder C, et al. Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules. <i>ChemPhysChem</i>. 2001;2(8-9):517-521. doi:<a href=\"https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1\">10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1</a>","ieee":"A. Müller <i>et al.</i>, “Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules,” <i>ChemPhysChem</i>, vol. 2, no. 8–9, pp. 517–521, 2001.","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Müller, Achim</span> ; <span style=\"font-variant:small-caps;\">Luban, Marshall</span> ; <span style=\"font-variant:small-caps;\">Schröder, Christian</span> ; <span style=\"font-variant:small-caps;\">Modler, Robert</span> ; <span style=\"font-variant:small-caps;\">Kögerler, Paul</span> ; <span style=\"font-variant:small-caps;\">Axenovich, Maria</span> ; <span style=\"font-variant:small-caps;\">Schnack, Jürgen</span> ; <span style=\"font-variant:small-caps;\">Canfield, Paul</span> ; u. a.</span>: Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules. In: <i>ChemPhysChem</i> Bd. 2, Wiley (2001), Nr. 8–9, S. 517–521","apa":"Müller, A., Luban, M., Schröder, C., Modler, R., Kögerler, P., Axenovich, M., … Harrison, N. (2001). Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules. <i>ChemPhysChem</i>, <i>2</i>(8–9), 517–521. <a href=\"https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1\">https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1</a>","bibtex":"@article{Müller_Luban_Schröder_Modler_Kögerler_Axenovich_Schnack_Canfield_Bud’ko_Harrison_2001, title={Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules}, volume={2}, DOI={<a href=\"https://doi.org/10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1\">10.1002/1439-7641(20010917)2:8/9&#60;517::AID-CPHC517&#62;3.0.CO;2-1</a>}, number={8–9}, journal={ChemPhysChem}, publisher={Wiley}, author={Müller, Achim and Luban, Marshall and Schröder, Christian and Modler, Robert and Kögerler, Paul and Axenovich, Maria and Schnack, Jürgen and Canfield, Paul and Bud’ko, Sergey and Harrison, Neil}, year={2001}, pages={517–521} }"},"date_updated":"2026-03-17T15:28:21Z","publisher":"Wiley","page":"517-521","doi":"10.1002/1439-7641(20010917)2:8/9<517::AID-CPHC517>3.0.CO;2-1","intvolume":"         2","language":[{"iso":"eng"}],"_id":"1455","year":"2001","quality_controlled":"1","volume":2,"date_created":"2021-07-06T09:07:56Z","title":"Classical and Quantum Magnetism in Giant Keplerate Magnetic Molecules","user_id":"35809","project":[{"name":"Bielefelder Institut für Angewandte Materialforschung","_id":"f89a05bb-bcea-11ed-9442-ed382659bc06"}],"type":"journal_article","publication_identifier":{"issn":["1439-4235"],"eissn":["1439-7641"]},"issue":"8-9","publication_status":"published","publication":"ChemPhysChem"},{"year":"2000","_id":"2685","language":[{"iso":"eng"}],"intvolume":"        87","doi":"10.1063/1.373179","publisher":"AIP Publishing","page":"4849-4851","date_updated":"2026-05-11T08:27:08Z","author":[{"first_name":"S.","full_name":"Heitmann, S.","last_name":"Heitmann"},{"first_name":"A.","last_name":"Hütten","full_name":"Hütten, A."},{"last_name":"Hempel","full_name":"Hempel, T.","first_name":"T."},{"first_name":"W.","full_name":"Schepper, W.","last_name":"Schepper"},{"last_name":"Reiss","full_name":"Reiss, G.","first_name":"G."},{"first_name":"C.","last_name":"Alof","full_name":"Alof, C."}],"citation":{"ieee":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers,” <i>Journal of Applied Physics</i>, vol. 87, no. 9, pp. 4849–4851, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Heitmann, S.</span> ; <span style=\"font-variant:small-caps;\">Hütten, A.</span> ; <span style=\"font-variant:small-caps;\">Hempel, T.</span> ; <span style=\"font-variant:small-caps;\">Schepper, W.</span> ; <span style=\"font-variant:small-caps;\">Reiss, G.</span> ; <span style=\"font-variant:small-caps;\">Alof, C.</span>: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. In: <i>Journal of Applied Physics</i> Bd. 87, AIP Publishing (2000), Nr. 9, S. 4849–4851","apa":"Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., &#38; Alof, C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>, <i>87</i>(9), 4849–4851. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>","bibtex":"@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87}, DOI={<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann, S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.}, year={2000}, pages={4849–4851} }","short":"S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal of Applied Physics 87 (2000) 4849–4851.","chicago":"Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i> 87, no. 9 (2000): 4849–51. <a href=\"https://doi.org/10.1063/1.373179\">https://doi.org/10.1063/1.373179</a>.","mla":"Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.” <i>Journal of Applied Physics</i>, vol. 87, no. 9, AIP Publishing, 2000, pp. 4849–51, doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>.","ama":"Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>. 2000;87(9):4849-4851. doi:<a href=\"https://doi.org/10.1063/1.373179\">10.1063/1.373179</a>"},"status":"public","issue":"9","publication":"Journal of Applied Physics","publication_status":"published","research_group":[{"_id":"af778127-b366-11ed-bde2-daed2b8eafee","name":"Bielefelder Institut für Angewandte Materialforschung (BIfAM)"}],"publication_identifier":{"issn":["0021-8979"],"eissn":["1089-7550"]},"type":"journal_article","user_id":"220548","extern":"1","alternative_id":["6895"],"title":"Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers","date_created":"2023-03-24T13:13:01Z","volume":87,"department":[{"_id":"103"}]},{"language":[{"iso":"ger"}],"year":"2000","_id":"5682","status":"public","citation":{"bibtex":"@article{Cottin_2000, title={Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München}, number={1}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. In: <i>Der Aktuar</i> (2000), Nr. 1","ieee":"C. Cottin, “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München,” <i>Der Aktuar</i>, no. 1. 2000.","ama":"Cottin C. Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München. <i>Der Aktuar</i>. 2000;(1).","mla":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, no. 1, 2000.","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München.” <i>Der Aktuar</i>, 2000."},"author":[{"id":"33935","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953063","first_name":"Claudia","last_name":"Cottin","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027"}],"date_updated":"2026-03-17T15:29:21Z","user_id":"220548","type":"review","publication":"Der Aktuar","publication_status":"published","issue":"1","department":[{"_id":"103"}],"title":"Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München","date_created":"2025-02-18T18:09:08Z"},{"publication":"Der Aktuar","publication_status":"published","issue":"2","type":"review","user_id":"220548","title":"Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg","date_created":"2025-02-18T18:24:41Z","department":[{"_id":"103"}],"year":"2000","_id":"5683","language":[{"iso":"ger"}],"date_updated":"2026-03-17T15:29:21Z","author":[{"orcid":"0000-0001-9212-5027","full_name":"Cottin, Claudia","last_name":"Cottin","first_name":"Claudia","id":"33935","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953010"}],"citation":{"ama":"Cottin C. Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>. 2000;(2).","mla":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, no. 2, 2000.","chicago":"Cottin, Claudia. “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg.” <i>Der Aktuar</i>, 2000.","short":"C. Cottin, Der Aktuar (2000).","apa":"Cottin, C. (2000). Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. <i>Der Aktuar</i>.","bibtex":"@article{Cottin_2000, title={Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg. In: <i>Der Aktuar</i> (2000), Nr. 2","ieee":"C. Cottin, “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg,” <i>Der Aktuar</i>, no. 2. 2000."},"status":"public"},{"date_created":"2025-02-18T18:26:23Z","title":"Arbeitsmarkt für (Versicherungs-)Mathematiker","department":[{"_id":"103"}],"publication_status":"published","issue":"2","publication":"Der Aktuar","user_id":"33935","publication_identifier":{"issn":["0948-7794"]},"type":"journal_article","date_updated":"2026-03-17T15:29:21Z","status":"public","citation":{"apa":"Cottin, C. (2000). Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>, (2).","bibtex":"@article{Cottin_2000, title={Arbeitsmarkt für (Versicherungs-)Mathematiker}, number={2}, journal={Der Aktuar}, author={Cottin, Claudia}, year={2000} }","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Arbeitsmarkt für (Versicherungs-)Mathematiker. In: <i>Der Aktuar</i> (2000), Nr. 2","ieee":"C. Cottin, “Arbeitsmarkt für (Versicherungs-)Mathematiker,” <i>Der Aktuar</i>, no. 2, 2000.","ama":"Cottin C. Arbeitsmarkt für (Versicherungs-)Mathematiker. <i>Der Aktuar</i>. 2000;(2).","mla":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2, 2000.","short":"C. Cottin, Der Aktuar (2000).","chicago":"Cottin, Claudia. “Arbeitsmarkt für (Versicherungs-)Mathematiker.” <i>Der Aktuar</i>, no. 2 (2000)."},"author":[{"last_name":"Cottin","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","id":"33935","first_name":"Claudia"}],"language":[{"iso":"ger"}],"_id":"5684","year":"2000"},{"type":"review","user_id":"220548","publication_status":"published","issue":"4","department":[{"_id":"103"}],"title":"Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München","date_created":"2025-02-18T18:27:36Z","year":"2000","_id":"5685","language":[{"iso":"ger"}],"citation":{"ama":"Cottin C. Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München. 2000;(4).","mla":"Cottin, Claudia. <i>Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München</i>. no. 4, 2000.","chicago":"Cottin, Claudia. “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” 2000.","short":"C. Cottin, (2000).","bibtex":"@article{Cottin_2000, title={Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München}, number={4}, author={Cottin, Claudia}, year={2000} }","apa":"Cottin, C. (2000). Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München.","alphadin":"<span style=\"font-variant:small-caps;\">Cottin, Claudia</span>: Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München (2000), Nr. 4","ieee":"C. Cottin, “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” no. 4. 2000."},"author":[{"id":"33935","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178952850","first_name":"Claudia","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","last_name":"Cottin"}],"status":"public","date_updated":"2026-03-17T15:29:21Z"},{"title":"Minimal Boolean sum and blending-type projections and extensions","date_created":"2025-02-16T18:47:25Z","volume":40,"department":[{"_id":"103"}],"publication_status":"published","publication":"Computers & Mathematics with Applications","issue":"1","publication_identifier":{"issn":["0898-1221"]},"type":"journal_article","user_id":"33935","alternative_id":["4475"],"intvolume":"        40","doi":"10.1016/S0898-1221(00)00140-1","publisher":"Elsevier BV","page":"63-70","date_updated":"2026-03-17T15:29:20Z","author":[{"first_name":"Bruce","full_name":"Chalmers, Bruce","last_name":"Chalmers"},{"id":"33935","first_name":"Claudia","full_name":"Cottin, Claudia","orcid":"0000-0001-9212-5027","last_name":"Cottin"},{"first_name":"Boris","full_name":"Shekhtman, Boris","last_name":"Shekhtman"}],"citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Chalmers, Bruce</span> ; <span style=\"font-variant:small-caps;\">Cottin, Claudia</span> ; <span style=\"font-variant:small-caps;\">Shekhtman, Boris</span>: Minimal Boolean sum and blending-type projections and extensions. In: <i>Computers &#38; Mathematics with Applications</i> Bd. 40, Elsevier BV (2000), Nr. 1, S. 63–70","apa":"Chalmers, B., Cottin, C., &#38; Shekhtman, B. (2000). Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>, <i>40</i>(1), 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>","bibtex":"@article{Chalmers_Cottin_Shekhtman_2000, title={Minimal Boolean sum and blending-type projections and extensions}, volume={40}, DOI={<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>}, number={1}, journal={Computers &#38; Mathematics with Applications}, publisher={Elsevier BV}, author={Chalmers, Bruce and Cottin, Claudia and Shekhtman, Boris}, year={2000}, pages={63–70} }","ieee":"B. Chalmers, C. Cottin, and B. Shekhtman, “Minimal Boolean sum and blending-type projections and extensions,” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, pp. 63–70, 2000.","mla":"Chalmers, Bruce, et al. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i>, vol. 40, no. 1, Elsevier BV, 2000, pp. 63–70, doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>.","ama":"Chalmers B, Cottin C, Shekhtman B. Minimal Boolean sum and blending-type projections and extensions. <i>Computers &#38; Mathematics with Applications</i>. 2000;40(1):63-70. doi:<a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">10.1016/S0898-1221(00)00140-1</a>","short":"B. Chalmers, C. Cottin, B. Shekhtman, Computers &#38; Mathematics with Applications 40 (2000) 63–70.","chicago":"Chalmers, Bruce, Claudia Cottin, and Boris Shekhtman. “Minimal Boolean Sum and Blending-Type Projections and Extensions.” <i>Computers &#38; Mathematics with Applications</i> 40, no. 1 (2000): 63–70. <a href=\"https://doi.org/10.1016/S0898-1221(00)00140-1\">https://doi.org/10.1016/S0898-1221(00)00140-1</a>."},"status":"public","year":"2000","_id":"5631","language":[{"iso":"eng"}]},{"department":[{"_id":"102"}],"title":"Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung","date_created":"2025-01-03T08:14:23Z","volume":77,"type":"journal_article","publication_identifier":{"issn":["0932-8351"]},"user_id":"220548","publication":"Die Bautechnik","publication_status":"published","issue":"3","citation":{"ieee":"K. Meskouris and U. Weitkemper, “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung,” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Meskouris, Konstantin</span> ; <span style=\"font-variant:small-caps;\">Weitkemper, Uwe</span>: Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. In: <i>Die Bautechnik</i> Bd. 77 (2000), Nr. 3","bibtex":"@article{Meskouris_Weitkemper_2000, title={Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung}, volume={77}, number={3}, journal={Die Bautechnik}, author={Meskouris, Konstantin and Weitkemper, Uwe}, year={2000} }","apa":"Meskouris, K., &#38; Weitkemper, U. (2000). Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>, <i>77</i>(3).","short":"K. Meskouris, U. Weitkemper, Die Bautechnik 77 (2000).","chicago":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i> 77, no. 3 (2000).","mla":"Meskouris, Konstantin, and Uwe Weitkemper. “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung.” <i>Die Bautechnik</i>, vol. 77, no. 3, 2000.","ama":"Meskouris K, Weitkemper U. Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung. <i>Die Bautechnik</i>. 2000;77(3)."},"author":[{"full_name":"Meskouris, Konstantin","last_name":"Meskouris","first_name":"Konstantin"},{"full_name":"Weitkemper, Uwe","last_name":"Weitkemper","id":"202449","first_name":"Uwe"}],"status":"public","intvolume":"        77","date_updated":"2026-03-17T15:29:15Z","year":"2000","_id":"5259","language":[{"iso":"ger"}]},{"title":"Applications of the Newton interior-point method for Maxwell´s equations","date_created":"2024-07-04T11:30:04Z","publication":"16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000","user_id":"220548","type":"conference","publication_identifier":{"isbn":["3-9522075-1-9"]},"project":[{"name":"Institute for Data Science Solutions","_id":"f432a2ee-bceb-11ed-a251-a83585c5074d"}],"publisher":"IMACS","date_updated":"2026-03-17T15:29:06Z","conference":{"start_date":"2000-08-21","end_date":"2000-08-25","name":"16th IMACS World Congress on Scientific Computation","location":"Lausanne, Schweiz"},"status":"public","place":"New Brunswick, NJ","author":[{"last_name":"Hoppe","full_name":"Hoppe, Ronald H.W.","first_name":"Ronald H.W."},{"id":"201871","first_name":"Svetozara","last_name":"Petrova","full_name":"Petrova, Svetozara"}],"citation":{"mla":"Hoppe, Ronald H. W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville, IMACS, 2000.","ama":"Hoppe RHW, Petrova S. Applications of the Newton interior-point method for Maxwell´s equations. In: Deville M, ed. <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS; 2000.","chicago":"Hoppe, Ronald H.W., and Svetozara Petrova. “Applications of the Newton Interior-Point Method for Maxwell´s Equations.” In <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, edited by Michel Deville. New Brunswick, NJ: IMACS, 2000.","short":"R.H.W. Hoppe, S. Petrova, in: M. Deville (Ed.), 16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000, IMACS, New Brunswick, NJ, 2000.","alphadin":"<span style=\"font-variant:small-caps;\">Hoppe, Ronald H.W.</span> ; <span style=\"font-variant:small-caps;\">Petrova, Svetozara</span>: Applications of the Newton interior-point method for Maxwell´s equations. In: <span style=\"font-variant:small-caps;\">Deville, M.</span> (Hrsg.): <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ : IMACS, 2000","apa":"Hoppe, R. H. W., &#38; Petrova, S. (2000). Applications of the Newton interior-point method for Maxwell´s equations. In M. Deville (Ed.), <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>. New Brunswick, NJ: IMACS.","bibtex":"@inproceedings{Hoppe_Petrova_2000, place={New Brunswick, NJ}, title={Applications of the Newton interior-point method for Maxwell´s equations}, booktitle={16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000}, publisher={IMACS}, author={Hoppe, Ronald H.W. and Petrova, Svetozara}, editor={Deville, MichelEditor}, year={2000} }","ieee":"R. H. W. Hoppe and S. Petrova, “Applications of the Newton interior-point method for Maxwell´s equations,” in <i>16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000</i>, Lausanne, Schweiz, 2000."},"language":[{"iso":"eng"}],"year":"2000","_id":"4765","editor":[{"last_name":"Deville","full_name":"Deville, Michel","first_name":"Michel"}]},{"page":"223-242","publisher":"VSP BV","date_updated":"2026-03-17T15:29:06Z","intvolume":"         8","status":"public","citation":{"apa":"Petrova, S., Tobiska, L., &#38; Vassilevski, P. S. (2000). Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, <i>8</i>(3), 223–242.","bibtex":"@article{Petrova_Tobiska_Vassilevski_2000, title={Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems}, volume={8}, number={3}, journal={EAST WEST JOURNAL OF NUMERICAL MATHEMATICS}, publisher={VSP BV}, author={Petrova, Svetozara and Tobiska, L. and Vassilevski, P.S.}, year={2000}, pages={223–242} }","alphadin":"<span style=\"font-variant:small-caps;\">Petrova, Svetozara</span> ; <span style=\"font-variant:small-caps;\">Tobiska, L.</span> ; <span style=\"font-variant:small-caps;\">Vassilevski, P.S.</span>: Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. In: <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> Bd. 8, VSP BV (2000), Nr. 3, S. 223–242","ieee":"S. Petrova, L. Tobiska, and P. S. Vassilevski, “Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems,” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, pp. 223–242, 2000.","ama":"Petrova S, Tobiska L, Vassilevski PS. Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems. <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>. 2000;8(3):223-242.","mla":"Petrova, Svetozara, et al. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i>, vol. 8, no. 3, VSP BV, 2000, pp. 223–42.","chicago":"Petrova, Svetozara, L. Tobiska, and P.S. Vassilevski. “Multigrid Methods Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of Convection-Diffusion Problems.” <i>EAST WEST JOURNAL OF NUMERICAL MATHEMATICS</i> 8, no. 3 (2000): 223–42.","short":"S. Petrova, L. Tobiska, P.S. Vassilevski, EAST WEST JOURNAL OF NUMERICAL MATHEMATICS 8 (2000) 223–242."},"author":[{"last_name":"Petrova","full_name":"Petrova, Svetozara","first_name":"Svetozara","id":"201871"},{"last_name":"Tobiska","full_name":"Tobiska, L.","first_name":"L."},{"first_name":"P.S.","full_name":"Vassilevski, P.S.","last_name":"Vassilevski"}],"language":[{"iso":"eng"}],"year":"2000","_id":"4766","volume":8,"title":"Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems","date_created":"2024-07-04T11:33:57Z","issue":"3","publication":"EAST WEST JOURNAL OF NUMERICAL MATHEMATICS","user_id":"220548","main_file_link":[{"url":"https://www.researchgate.net/publication/268251851_Multigrid_methods_based_on_matrix-dependent_coarse_spaces_for_nonconforming_streamline-diffusion_finite_element_discretization_of_convection-diffusion_problems"}],"publication_identifier":{"issn":["1570-2820"]},"type":"journal_article","project":[{"name":"Institute for Data Science Solutions","_id":"f432a2ee-bceb-11ed-a251-a83585c5074d"}]},{"title":"The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions","date_created":"2023-09-01T10:01:28Z","publication":"Organosilicon Chemistry IV","publication_status":"published","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"type":"book_chapter","user_id":"216459","doi":"10.1002/9783527619917.ch123","page":"806-811","publisher":"Wiley-VCH Verlag GmbH","date_updated":"2026-03-17T15:28:46Z","place":"Weinheim, Germany","citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Heinmann, U.</span>: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811","apa":"Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., &#38; Heinmann, U. (2000). The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>","bibtex":"@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany}, title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp, A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }","ieee":"A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.","mla":"Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 806–11, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>.","ama":"Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:806-811. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch123\">10.1002/9783527619917.ch123</a>","short":"A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 806–811.","chicago":"Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann. “The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation under Thermal CVD Conditions.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch123\">https://doi.org/10.1002/9783527619917.ch123</a>."},"author":[{"last_name":"Klipp","full_name":"Klipp, A.","first_name":"A."},{"last_name":"Petri","full_name":"Petri, S. H. A.","first_name":"S. H. A."},{"last_name":"Jutzi","full_name":"Jutzi, P.","first_name":"P."},{"full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","last_name":"Hamelmann","id":"208487","first_name":"Frank"},{"first_name":"U.","last_name":"Heinmann","full_name":"Heinmann, U."}],"status":"public","year":"2000","editor":[{"last_name":"Auner","full_name":"Auner, Norbert","first_name":"Norbert"},{"first_name":"Johann","last_name":"Weis","full_name":"Weis, Johann"}],"_id":"3548","language":[{"iso":"eng"}]},{"title":"In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors","date_created":"2023-09-01T10:02:22Z","user_id":"216459","publication_identifier":{"eisbn":["9783527619917"],"isbn":["9783527298549"]},"type":"book_chapter","publication":"Organosilicon Chemistry IV","publication_status":"published","status":"public","place":"Weinheim, Germany","author":[{"orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank","last_name":"Hamelmann","first_name":"Frank","id":"208487"},{"first_name":"G.","full_name":"Haindl, G.","last_name":"Haindl"},{"first_name":"J.","full_name":"Hartwich, J.","last_name":"Hartwich"},{"first_name":"U.","full_name":"Kleineberg, U.","last_name":"Kleineberg"},{"full_name":"Heinzmann, U.","last_name":"Heinzmann","first_name":"U."},{"last_name":"Klipp","full_name":"Klipp, A.","first_name":"A."},{"full_name":"Petri, S. H. A.","last_name":"Petri","first_name":"S. H. A."},{"full_name":"Jutzi, P.","last_name":"Jutzi","first_name":"P."}],"citation":{"ieee":"F. Hamelmann <i>et al.</i>, “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in <i>Organosilicon Chemistry IV</i>, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Petri, S. H. A.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span>: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: <span style=\"font-variant:small-caps;\">Auner, N.</span> ; <span style=\"font-variant:small-caps;\">Weis, J.</span> (Hrsg.): <i>Organosilicon Chemistry IV</i>. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805","apa":"Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp, A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In N. Auner &#38; J. Weis (Eds.), <i>Organosilicon Chemistry IV</i> (pp. 798–805). Weinheim, Germany: Wiley-VCH Verlag GmbH. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>","bibtex":"@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000, place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors}, DOI={<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>}, booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis, JohannEditors}, year={2000}, pages={798–805} }","short":"F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.","chicago":"Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” In <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. <a href=\"https://doi.org/10.1002/9783527619917.ch122\">https://doi.org/10.1002/9783527619917.ch122</a>.","mla":"Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.” <i>Organosilicon Chemistry IV</i>, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000, pp. 798–805, doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>.","ama":"Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In: Auner N, Weis J, eds. <i>Organosilicon Chemistry IV</i>. Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:<a href=\"https://doi.org/10.1002/9783527619917.ch122\">10.1002/9783527619917.ch122</a>"},"page":"798-805","publisher":"Wiley-VCH Verlag GmbH","date_updated":"2026-03-17T15:28:46Z","doi":"10.1002/9783527619917.ch122","language":[{"iso":"eng"}],"year":"2000","editor":[{"last_name":"Auner","full_name":"Auner, Norbert","first_name":"Norbert"},{"full_name":"Weis, Johann","last_name":"Weis","first_name":"Johann"}],"_id":"3549"},{"language":[{"iso":"eng"}],"_id":"3550","year":"2000","date_updated":"2026-03-17T15:28:46Z","publisher":"Elsevier BV","page":"90-93","doi":"10.1016/S0040-6090(99)00695-1","intvolume":"       358","status":"public","author":[{"full_name":"Hamelmann, Frank","orcid":"0000-0001-6141-9874","last_name":"Hamelmann","id":"208487","first_name":"Frank"},{"first_name":"G","full_name":"Haindl, G","last_name":"Haindl"},{"last_name":"Schmalhorst","full_name":"Schmalhorst, J","first_name":"J"},{"full_name":"Aschentrup, A","last_name":"Aschentrup","first_name":"A"},{"first_name":"E","last_name":"Majkova","full_name":"Majkova, E"},{"first_name":"U","full_name":"Kleineberg, U","last_name":"Kleineberg"},{"first_name":"U","full_name":"Heinzmann, U","last_name":"Heinzmann"},{"full_name":"Klipp, A","last_name":"Klipp","first_name":"A"},{"last_name":"Jutzi","full_name":"Jutzi, P","first_name":"P"},{"last_name":"Anopchenko","full_name":"Anopchenko, A","first_name":"A"},{"full_name":"Jergel, M","last_name":"Jergel","first_name":"M"},{"first_name":"S","last_name":"Luby","full_name":"Luby, S"}],"citation":{"chicago":"Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i> 358, no. 1–2 (2000): 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.","short":"F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.","ama":"Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>. 2000;358(1-2):90-93. doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>","mla":"Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>.","ieee":"F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000.","bibtex":"@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }","apa":"Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>, <i>358</i>(1–2), 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93"},"issue":"1-2","publication":"Thin Solid Films","publication_status":"published","user_id":"216459","type":"journal_article","publication_identifier":{"issn":["00406090"]},"volume":358,"date_created":"2023-09-01T10:03:34Z","title":"Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD"},{"language":[{"iso":"eng"}],"_id":"3551","year":"2000","status":"public","author":[{"last_name":"Klipp","full_name":"Klipp, A.","first_name":"A."},{"first_name":"Frank","id":"208487","orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank","last_name":"Hamelmann"},{"full_name":"Haindl, G.","last_name":"Haindl","first_name":"G."},{"full_name":"Hartwich, J.","last_name":"Hartwich","first_name":"J."},{"first_name":"U.","last_name":"Kleineberg","full_name":"Kleineberg, U."},{"full_name":"Jutzi, P.","last_name":"Jutzi","first_name":"P."},{"first_name":"U.","full_name":"Heinzmann, U.","last_name":"Heinzmann"}],"citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Klipp, A.</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G.</span> ; <span style=\"font-variant:small-caps;\">Hartwich, J.</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span>: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: <i>Chemical Vapor Deposition</i> Bd. 6, Wiley (2000), Nr. 2, S. 63–66","apa":"Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., &#38; Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>, <i>6</i>(2), 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","bibtex":"@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }","ieee":"A. Klipp <i>et al.</i>, “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, pp. 63–66, 2000.","mla":"Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i>, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.","ama":"Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. <i>Chemical Vapor Deposition</i>. 2000;6(2):63-66. doi:<a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>","chicago":"Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” <i>Chemical Vapor Deposition</i> 6, no. 2 (2000): 63–66. <a href=\"https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q\">https://doi.org/10.1002/(SICI)1521-3862(200004)6:2&#60;63::AID-CVDE63&#62;3.0.CO;2-Q</a>.","short":"A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66."},"date_updated":"2026-03-17T15:28:46Z","page":"63-66","publisher":"Wiley","doi":"10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q","intvolume":"         6","user_id":"216459","publication_identifier":{"issn":["09481907"],"eissn":["15213862"]},"type":"journal_article","issue":"2","publication":"Chemical Vapor Deposition","publication_status":"published","volume":6,"date_created":"2023-09-01T10:04:14Z","title":"Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films"}]