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Heinzmann, Applied Surface Science 150 (1999) 178–184.","chicago":"Luby, S, M Jergel, A Anopchenko, A Aschentrup, Frank Hamelmann, E Majkova, U Kleineberg, and U Heinzmann. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal Annealing.” <i>Applied Surface Science</i> 150, no. 1–4 (1999): 178–84. <a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">https://doi.org/10.1016/S0169-4332(99)00243-3</a>."},"author":[{"full_name":"Luby, S","last_name":"Luby","first_name":"S"},{"first_name":"M","full_name":"Jergel, M","last_name":"Jergel"},{"full_name":"Anopchenko, A","last_name":"Anopchenko","first_name":"A"},{"first_name":"A","last_name":"Aschentrup","full_name":"Aschentrup, A"},{"orcid":"0000-0001-6141-9874","full_name":"Hamelmann, Frank","last_name":"Hamelmann","first_name":"Frank","id":"208487"},{"first_name":"E","full_name":"Majkova, E","last_name":"Majkova"},{"full_name":"Kleineberg, U","last_name":"Kleineberg","first_name":"U"},{"first_name":"U","full_name":"Heinzmann, U","last_name":"Heinzmann"}],"language":[{"iso":"eng"}],"_id":"3554","year":"1999"},{"volume":"101-103","title":"Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY","date_created":"2023-09-01T10:07:44Z","user_id":"216459","publication_identifier":{"issn":["03682048"]},"type":"journal_article","publication":"Journal of Electron Spectroscopy and Related Phenomena","publication_status":"published","status":"public","citation":{"alphadin":"<span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Menke, D</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Schmidt, O</span> ; <span style=\"font-variant:small-caps;\">Fecher, G.H</span> ; <span style=\"font-variant:small-caps;\">Schoenhense, G</span>: Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. 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