---
_id: '4766'
author:
- first_name: Svetozara
full_name: Petrova, Svetozara
id: '201871'
last_name: Petrova
- first_name: L.
full_name: Tobiska, L.
last_name: Tobiska
- first_name: P.S.
full_name: Vassilevski, P.S.
last_name: Vassilevski
citation:
alphadin: 'Petrova, Svetozara ; Tobiska, L. ; Vassilevski,
P.S.: Multigrid methods based on matrix-dependent coarse spaces for nonconforming
streamline-diffusion finite element discretization of convection-diffusion problems.
In: EAST WEST JOURNAL OF NUMERICAL MATHEMATICS Bd. 8, VSP BV (2000), Nr. 3,
S. 223–242'
ama: Petrova S, Tobiska L, Vassilevski PS. Multigrid methods based on matrix-dependent
coarse spaces for nonconforming streamline-diffusion finite element discretization
of convection-diffusion problems. EAST WEST JOURNAL OF NUMERICAL MATHEMATICS.
2000;8(3):223-242.
apa: Petrova, S., Tobiska, L., & Vassilevski, P. S. (2000). Multigrid methods
based on matrix-dependent coarse spaces for nonconforming streamline-diffusion
finite element discretization of convection-diffusion problems. EAST WEST JOURNAL
OF NUMERICAL MATHEMATICS, 8(3), 223–242.
bibtex: '@article{Petrova_Tobiska_Vassilevski_2000, title={Multigrid methods based
on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite
element discretization of convection-diffusion problems}, volume={8}, number={3},
journal={EAST WEST JOURNAL OF NUMERICAL MATHEMATICS}, publisher={VSP BV}, author={Petrova,
Svetozara and Tobiska, L. and Vassilevski, P.S.}, year={2000}, pages={223–242}
}'
chicago: 'Petrova, Svetozara, L. Tobiska, and P.S. Vassilevski. “Multigrid Methods
Based on Matrix-Dependent Coarse Spaces for Nonconforming Streamline-Diffusion
Finite Element Discretization of Convection-Diffusion Problems.” EAST WEST
JOURNAL OF NUMERICAL MATHEMATICS 8, no. 3 (2000): 223–42.'
ieee: S. Petrova, L. Tobiska, and P. S. Vassilevski, “Multigrid methods based on
matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element
discretization of convection-diffusion problems,” EAST WEST JOURNAL OF NUMERICAL
MATHEMATICS, vol. 8, no. 3, pp. 223–242, 2000.
mla: Petrova, Svetozara, et al. “Multigrid Methods Based on Matrix-Dependent Coarse
Spaces for Nonconforming Streamline-Diffusion Finite Element Discretization of
Convection-Diffusion Problems.” EAST WEST JOURNAL OF NUMERICAL MATHEMATICS,
vol. 8, no. 3, VSP BV, 2000, pp. 223–42.
short: S. Petrova, L. Tobiska, P.S. Vassilevski, EAST WEST JOURNAL OF NUMERICAL
MATHEMATICS 8 (2000) 223–242.
date_created: 2024-07-04T11:33:57Z
date_updated: 2026-03-17T15:29:06Z
intvolume: ' 8'
issue: '3'
language:
- iso: eng
main_file_link:
- url: https://www.researchgate.net/publication/268251851_Multigrid_methods_based_on_matrix-dependent_coarse_spaces_for_nonconforming_streamline-diffusion_finite_element_discretization_of_convection-diffusion_problems
page: 223-242
project:
- _id: f432a2ee-bceb-11ed-a251-a83585c5074d
name: Institute for Data Science Solutions
publication: EAST WEST JOURNAL OF NUMERICAL MATHEMATICS
publication_identifier:
issn:
- 1570-2820
publisher: VSP BV
status: public
title: Multigrid methods based on matrix-dependent coarse spaces for nonconforming
streamline-diffusion finite element discretization of convection-diffusion problems
type: journal_article
user_id: '220548'
volume: 8
year: '2000'
...
---
_id: '3548'
author:
- first_name: A.
full_name: Klipp, A.
last_name: Klipp
- first_name: S. H. A.
full_name: Petri, S. H. A.
last_name: Petri
- first_name: P.
full_name: Jutzi, P.
last_name: Jutzi
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: U.
full_name: Heinmann, U.
last_name: Heinmann
citation:
alphadin: 'Klipp, A. ; Petri,
S. H. A. ; Jutzi, P. ; Hamelmann, Frank ; Heinmann,
U.: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
under Thermal CVD Conditions. In: Auner,
N. ; Weis, J. (Hrsg.): Organosilicon
Chemistry IV. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 806–811'
ama: 'Klipp A, Petri SHA, Jutzi P, Hamelmann F, Heinmann U. The Synthesis of Cyclopentadienyl
Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions. In:
Auner N, Weis J, eds. Organosilicon Chemistry IV. Weinheim, Germany: Wiley-VCH
Verlag GmbH; 2000:806-811. doi:10.1002/9783527619917.ch123'
apa: 'Klipp, A., Petri, S. H. A., Jutzi, P., Hamelmann, F., & Heinmann, U. (2000).
The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
under Thermal CVD Conditions. In N. Auner & J. Weis (Eds.), Organosilicon
Chemistry IV (pp. 806–811). Weinheim, Germany: Wiley-VCH Verlag GmbH. https://doi.org/10.1002/9783527619917.ch123'
bibtex: '@inbook{Klipp_Petri_Jutzi_Hamelmann_Heinmann_2000, place={Weinheim, Germany},
title={The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
under Thermal CVD Conditions}, DOI={10.1002/9783527619917.ch123},
booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Klipp,
A. and Petri, S. H. A. and Jutzi, P. and Hamelmann, Frank and Heinmann, U.}, editor={Auner,
Norbert and Weis, JohannEditors}, year={2000}, pages={806–811} }'
chicago: 'Klipp, A., S. H. A. Petri, P. Jutzi, Frank Hamelmann, and U. Heinmann.
“The Synthesis of Cyclopentadienyl Silanes and Disilanes and Their Fragmentation
under Thermal CVD Conditions.” In Organosilicon Chemistry IV, edited by
Norbert Auner and Johann Weis, 806–11. Weinheim, Germany: Wiley-VCH Verlag GmbH,
2000. https://doi.org/10.1002/9783527619917.ch123.'
ieee: 'A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis
of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal
CVD Conditions,” in Organosilicon Chemistry IV, N. Auner and J. Weis, Eds.
Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.'
mla: Klipp, A., et al. “The Synthesis of Cyclopentadienyl Silanes and Disilanes
and Their Fragmentation under Thermal CVD Conditions.” Organosilicon Chemistry
IV, edited by Norbert Auner and Johann Weis, Wiley-VCH Verlag GmbH, 2000,
pp. 806–11, doi:10.1002/9783527619917.ch123.
short: 'A. Klipp, S.H.A. Petri, P. Jutzi, F. Hamelmann, U. Heinmann, in: N. Auner,
J. Weis (Eds.), Organosilicon Chemistry IV, Wiley-VCH Verlag GmbH, Weinheim, Germany,
2000, pp. 806–811.'
date_created: 2023-09-01T10:01:28Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/9783527619917.ch123
editor:
- first_name: Norbert
full_name: Auner, Norbert
last_name: Auner
- first_name: Johann
full_name: Weis, Johann
last_name: Weis
language:
- iso: eng
page: 806-811
place: Weinheim, Germany
publication: Organosilicon Chemistry IV
publication_identifier:
eisbn:
- '9783527619917'
isbn:
- '9783527298549'
publication_status: published
publisher: Wiley-VCH Verlag GmbH
status: public
title: The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation
under Thermal CVD Conditions
type: book_chapter
user_id: '216459'
year: '2000'
...
---
_id: '3549'
author:
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: G.
full_name: Haindl, G.
last_name: Haindl
- first_name: J.
full_name: Hartwich, J.
last_name: Hartwich
- first_name: U.
full_name: Kleineberg, U.
last_name: Kleineberg
- first_name: U.
full_name: Heinzmann, U.
last_name: Heinzmann
- first_name: A.
full_name: Klipp, A.
last_name: Klipp
- first_name: S. H. A.
full_name: Petri, S. H. A.
last_name: Petri
- first_name: P.
full_name: Jutzi, P.
last_name: Jutzi
citation:
alphadin: 'Hamelmann, Frank ; Haindl, G. ; Hartwich,
J. ; Kleineberg, U. ; Heinzmann, U. ; Klipp,
A. ; Petri, S. H. A. ; Jutzi, P.: In-Situ Controlled Deposition
of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3
as Silicon Precursors. In: Auner, N.
; Weis, J. (Hrsg.): Organosilicon
Chemistry IV. Weinheim, Germany : Wiley-VCH Verlag GmbH, 2000, S. 798–805'
ama: 'Hamelmann F, Haindl G, Hartwich J, et al. In-Situ Controlled Deposition of
Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as
Silicon Precursors. In: Auner N, Weis J, eds. Organosilicon Chemistry IV.
Weinheim, Germany: Wiley-VCH Verlag GmbH; 2000:798-805. doi:10.1002/9783527619917.ch122'
apa: 'Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Heinzmann, U., Klipp,
A., … Jutzi, P. (2000). In-Situ Controlled Deposition of Thin Silicon Films by
Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors. In
N. Auner & J. Weis (Eds.), Organosilicon Chemistry IV (pp. 798–805).
Weinheim, Germany: Wiley-VCH Verlag GmbH. https://doi.org/10.1002/9783527619917.ch122'
bibtex: '@inbook{Hamelmann_Haindl_Hartwich_Kleineberg_Heinzmann_Klipp_Petri_Jutzi_2000,
place={Weinheim, Germany}, title={In-Situ Controlled Deposition of Thin Silicon
Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors},
DOI={10.1002/9783527619917.ch122},
booktitle={Organosilicon Chemistry IV}, publisher={Wiley-VCH Verlag GmbH}, author={Hamelmann,
Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Heinzmann, U. and
Klipp, A. and Petri, S. H. A. and Jutzi, P.}, editor={Auner, Norbert and Weis,
JohannEditors}, year={2000}, pages={798–805} }'
chicago: 'Hamelmann, Frank, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann,
A. Klipp, S. H. A. Petri, and P. Jutzi. “In-Situ Controlled Deposition of Thin
Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon
Precursors.” In Organosilicon Chemistry IV, edited by Norbert Auner and
Johann Weis, 798–805. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000. https://doi.org/10.1002/9783527619917.ch122.'
ieee: 'F. Hamelmann et al., “In-Situ Controlled Deposition of Thin Silicon
Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,”
in Organosilicon Chemistry IV, N. Auner and J. Weis, Eds. Weinheim, Germany:
Wiley-VCH Verlag GmbH, 2000, pp. 798–805.'
mla: Hamelmann, Frank, et al. “In-Situ Controlled Deposition of Thin Silicon Films
by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors.”
Organosilicon Chemistry IV, edited by Norbert Auner and Johann Weis, Wiley-VCH
Verlag GmbH, 2000, pp. 798–805, doi:10.1002/9783527619917.ch122.
short: 'F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, U. Heinzmann, A. Klipp,
S.H.A. Petri, P. Jutzi, in: N. Auner, J. Weis (Eds.), Organosilicon Chemistry
IV, Wiley-VCH Verlag GmbH, Weinheim, Germany, 2000, pp. 798–805.'
date_created: 2023-09-01T10:02:22Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/9783527619917.ch122
editor:
- first_name: Norbert
full_name: Auner, Norbert
last_name: Auner
- first_name: Johann
full_name: Weis, Johann
last_name: Weis
language:
- iso: eng
page: 798-805
place: Weinheim, Germany
publication: Organosilicon Chemistry IV
publication_identifier:
eisbn:
- '9783527619917'
isbn:
- '9783527298549'
publication_status: published
publisher: Wiley-VCH Verlag GmbH
status: public
title: In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with
(C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors
type: book_chapter
user_id: '216459'
year: '2000'
...
---
_id: '3550'
author:
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: G
full_name: Haindl, G
last_name: Haindl
- first_name: J
full_name: Schmalhorst, J
last_name: Schmalhorst
- first_name: A
full_name: Aschentrup, A
last_name: Aschentrup
- first_name: E
full_name: Majkova, E
last_name: Majkova
- first_name: U
full_name: Kleineberg, U
last_name: Kleineberg
- first_name: U
full_name: Heinzmann, U
last_name: Heinzmann
- first_name: A
full_name: Klipp, A
last_name: Klipp
- first_name: P
full_name: Jutzi, P
last_name: Jutzi
- first_name: A
full_name: Anopchenko, A
last_name: Anopchenko
- first_name: M
full_name: Jergel, M
last_name: Jergel
- first_name: S
full_name: Luby, S
last_name: Luby
citation:
alphadin: 'Hamelmann,
Frank ; Haindl, G ; Schmalhorst, J ; Aschentrup,
A ; Majkova, E ; Kleineberg,
U ; Heinzmann, U ; Klipp, A ; u. a.: Metal oxide/silicon
oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced
MOCVD. In: Thin Solid Films Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93'
ama: Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer
with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. Thin
Solid Films. 2000;358(1-2):90-93. doi:10.1016/S0040-6090(99)00695-1
apa: Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg,
U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces
produced by in situ controlled plasma-enhanced MOCVD. Thin Solid Films,
358(1–2), 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1
bibtex: '@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et
al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced
by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={10.1016/S0040-6090(99)00695-1},
number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann,
Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg,
U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000},
pages={90–93} }'
chicago: 'Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U
Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth
Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” Thin Solid
Films 358, no. 1–2 (2000): 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1.'
ieee: F. Hamelmann et al., “Metal oxide/silicon oxide multilayer with smooth
interfaces produced by in situ controlled plasma-enhanced MOCVD,” Thin Solid
Films, vol. 358, no. 1–2, pp. 90–93, 2000.
mla: Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth
Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” Thin Solid
Films, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:10.1016/S0040-6090(99)00695-1.
short: F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg,
U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid
Films 358 (2000) 90–93.
date_created: 2023-09-01T10:03:34Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0040-6090(99)00695-1
intvolume: ' 358'
issue: 1-2
language:
- iso: eng
page: 90-93
publication: Thin Solid Films
publication_identifier:
issn:
- '00406090'
publication_status: published
publisher: Elsevier BV
status: public
title: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in
situ controlled plasma-enhanced MOCVD
type: journal_article
user_id: '216459'
volume: 358
year: '2000'
...
---
_id: '3551'
author:
- first_name: A.
full_name: Klipp, A.
last_name: Klipp
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: G.
full_name: Haindl, G.
last_name: Haindl
- first_name: J.
full_name: Hartwich, J.
last_name: Hartwich
- first_name: U.
full_name: Kleineberg, U.
last_name: Kleineberg
- first_name: P.
full_name: Jutzi, P.
last_name: Jutzi
- first_name: U.
full_name: Heinzmann, U.
last_name: Heinzmann
citation:
alphadin: 'Klipp, A. ; Hamelmann,
Frank ; Haindl, G. ; Hartwich, J. ; Kleineberg,
U. ; Jutzi, P. ; Heinzmann,
U.: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD
of Thin Silicon Films. In: Chemical Vapor Deposition Bd. 6, Wiley (2000),
Nr. 2, S. 63–66'
ama: Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane
as a Novel Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition.
2000;6(2):63-66. doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
apa: Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi,
P., & Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel
Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition,
6(2), 63–66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
bibtex: '@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000,
title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of
Thin Silicon Films}, volume={6}, DOI={10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q},
number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp,
A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and
Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }'
chicago: 'Klipp, A., Frank Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P.
Jutzi, and U. Heinzmann. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
for the CVD of Thin Silicon Films.” Chemical Vapor Deposition 6, no. 2
(2000): 63–66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q.'
ieee: A. Klipp et al., “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
for the CVD of Thin Silicon Films,” Chemical Vapor Deposition, vol. 6,
no. 2, pp. 63–66, 2000.
mla: Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor
for the CVD of Thin Silicon Films.” Chemical Vapor Deposition, vol. 6,
no. 2, Wiley, 2000, pp. 63–66, doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q.
short: A. Klipp, F. Hamelmann, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi,
U. Heinzmann, Chemical Vapor Deposition 6 (2000) 63–66.
date_created: 2023-09-01T10:04:14Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
intvolume: ' 6'
issue: '2'
language:
- iso: eng
page: 63-66
publication: Chemical Vapor Deposition
publication_identifier:
eissn:
- '15213862'
issn:
- '09481907'
publication_status: published
publisher: Wiley
status: public
title: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin
Silicon Films
type: journal_article
user_id: '216459'
volume: 6
year: '2000'
...
---
_id: '3581'
author:
- first_name: Hans
full_name: Brandt-Pook, Hans
id: '206531'
last_name: Brandt-Pook
orcid: 0009-0002-6668-2684
orcid_put_code_url: https://api.orcid.org/v2.0/0009-0002-6668-2684/work/156951512
- first_name: S.
full_name: Wachsmuth, S.
last_name: Wachsmuth
- first_name: G.
full_name: Socher, G.
last_name: Socher
- first_name: F.
full_name: Kummert, F.
last_name: Kummert
- first_name: G.
full_name: Sagerer, G.
last_name: Sagerer
citation:
alphadin: 'Brandt-Pook, Hans ; Wachsmuth, S. ; Socher,
G. ; Kummert, F. ; Sagerer, G.: Integration of vision and
speech understanding using bayesian networks, . In: Videre: A Journal of Computer
Vision Research Bd. 1 (2000), Nr. 4, S. 61–83'
ama: 'Brandt-Pook H, Wachsmuth S, Socher G, Kummert F, Sagerer G. Integration of
vision and speech understanding using bayesian networks, . Videre: A Journal
of Computer Vision Research. 2000;1(4):61-83.'
apa: 'Brandt-Pook, H., Wachsmuth, S., Socher, G., Kummert, F., & Sagerer, G.
(2000). Integration of vision and speech understanding using bayesian networks,
. Videre: A Journal of Computer Vision Research, 1(4), 61–83.'
bibtex: '@article{Brandt-Pook_Wachsmuth_Socher_Kummert_Sagerer_2000, title={Integration
of vision and speech understanding using bayesian networks, }, volume={1}, number={4},
journal={Videre: A Journal of Computer Vision Research}, author={Brandt-Pook,
Hans and Wachsmuth, S. and Socher, G. and Kummert, F. and Sagerer, G.}, year={2000},
pages={61–83} }'
chicago: 'Brandt-Pook, Hans, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer.
“Integration of Vision and Speech Understanding Using Bayesian Networks, .” Videre:
A Journal of Computer Vision Research 1, no. 4 (2000): 61–83.'
ieee: 'H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer, “Integration
of vision and speech understanding using bayesian networks, ,” Videre: A Journal
of Computer Vision Research, vol. 1, no. 4, pp. 61–83, 2000.'
mla: 'Brandt-Pook, Hans, et al. “Integration of Vision and Speech Understanding
Using Bayesian Networks, .” Videre: A Journal of Computer Vision Research,
vol. 1, no. 4, 2000, pp. 61–83.'
short: 'H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, G. Sagerer, Videre:
A Journal of Computer Vision Research 1 (2000) 61–83.'
date_created: 2023-09-11T21:48:21Z
date_updated: 2026-03-17T15:28:46Z
intvolume: ' 1'
issue: '4'
language:
- iso: eng
page: 61-83
publication: 'Videre: A Journal of Computer Vision Research'
publication_identifier:
issn:
- 1089-2788
status: public
title: 'Integration of vision and speech understanding using bayesian networks, '
type: journal_article
user_id: '249224'
volume: 1
year: '2000'
...
---
_id: '2685'
author:
- first_name: S.
full_name: Heitmann, S.
last_name: Heitmann
- first_name: A.
full_name: Hütten, A.
last_name: Hütten
- first_name: T.
full_name: Hempel, T.
last_name: Hempel
- first_name: W.
full_name: Schepper, W.
last_name: Schepper
- first_name: G.
full_name: Reiss, G.
last_name: Reiss
- first_name: C.
full_name: Alof, C.
last_name: Alof
citation:
alphadin: 'Heitmann, S. ; Hütten,
A. ; Hempel, T. ; Schepper,
W. ; Reiss, G. ; Alof,
C.: Interplay of antiferromagnetic coupling in copper/permalloy combination
multilayers. In: Journal of Applied Physics Bd. 87, AIP Publishing (2000),
Nr. 9, S. 4849–4851'
ama: Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic
coupling in copper/permalloy combination multilayers. Journal of Applied Physics.
2000;87(9):4849-4851. doi:10.1063/1.373179
apa: Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., & Alof,
C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination
multilayers. Journal of Applied Physics, 87(9), 4849–4851. https://doi.org/10.1063/1.373179
bibtex: '@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay
of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87},
DOI={10.1063/1.373179}, number={9},
journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann,
S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.},
year={2000}, pages={4849–4851} }'
chicago: 'Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof.
“Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.”
Journal of Applied Physics 87, no. 9 (2000): 4849–51. https://doi.org/10.1063/1.373179.'
ieee: S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay
of antiferromagnetic coupling in copper/permalloy combination multilayers,” Journal
of Applied Physics, vol. 87, no. 9, pp. 4849–4851, 2000.
mla: Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy
Combination Multilayers.” Journal of Applied Physics, vol. 87, no. 9, AIP
Publishing, 2000, pp. 4849–51, doi:10.1063/1.373179.
short: S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal
of Applied Physics 87 (2000) 4849–4851.
date_created: 2023-03-24T13:13:01Z
date_updated: 2026-03-17T15:28:35Z
doi: 10.1063/1.373179
extern: '1'
intvolume: ' 87'
issue: '9'
language:
- iso: eng
page: 4849-4851
publication: Journal of Applied Physics
publication_identifier:
eissn:
- 1089-7550
issn:
- 0021-8979
publication_status: published
publisher: AIP Publishing
status: public
title: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers
type: journal_article
user_id: '245590'
volume: 87
year: '2000'
...
---
_id: '1505'
article_number: A57
author:
- first_name: Bernhard
full_name: Bachmann, Bernhard
id: '33931'
last_name: Bachmann
orcid: 0000-0002-4339-0438
orcid_put_code_url: https://api.orcid.org/v2.0/0000-0002-4339-0438/work/102900665
- first_name: H.
full_name: Wiesmann, H.
last_name: Wiesmann
citation:
alphadin: 'Bachmann, Bernhard ; Wiesmann, H.: Objektorientierte Modellierung
Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems,
Part 15). In: at - Automatisierungstechnik Bd. 48, Walter de Gruyter GmbH
(2000), Nr. 8'
ama: Bachmann B, Wiesmann H. Objektorientierte Modellierung Physikalischer Systeme,
Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). at - Automatisierungstechnik.
2000;48(8). doi:10.1524/auto.2000.48.8.a57
apa: Bachmann, B., & Wiesmann, H. (2000). Objektorientierte Modellierung Physikalischer
Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15). at
- Automatisierungstechnik, 48(8). https://doi.org/10.1524/auto.2000.48.8.a57
bibtex: '@article{Bachmann_Wiesmann_2000, title={Objektorientierte Modellierung
Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems,
Part 15)}, volume={48}, DOI={10.1524/auto.2000.48.8.a57},
number={8A57}, journal={at - Automatisierungstechnik}, publisher={Walter de Gruyter
GmbH}, author={Bachmann, Bernhard and Wiesmann, H.}, year={2000} }'
chicago: Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer
Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” at
- Automatisierungstechnik 48, no. 8 (2000). https://doi.org/10.1524/auto.2000.48.8.a57.
ieee: B. Bachmann and H. Wiesmann, “Objektorientierte Modellierung Physikalischer
Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15),” at
- Automatisierungstechnik, vol. 48, no. 8, 2000.
mla: Bachmann, Bernhard, and H. Wiesmann. “Objektorientierte Modellierung Physikalischer
Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15).” at
- Automatisierungstechnik, vol. 48, no. 8, A57, Walter de Gruyter GmbH, 2000,
doi:10.1524/auto.2000.48.8.a57.
short: B. Bachmann, H. Wiesmann, at - Automatisierungstechnik 48 (2000).
date_created: 2021-11-09T13:12:41Z
date_updated: 2026-03-17T15:28:21Z
doi: 10.1524/auto.2000.48.8.a57
intvolume: ' 48'
issue: '8'
language:
- iso: ger
publication: at - Automatisierungstechnik
publication_identifier:
eissn:
- 2196-677X
issn:
- 0178-2312
publication_status: published
publisher: Walter de Gruyter GmbH
status: public
title: Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented
Modeling of Physical Systems, Part 15)
type: journal_article
user_id: '220548'
volume: 48
year: '2000'
...
---
_id: '1156'
article_type: original
author:
- first_name: Markus
full_name: Pannenberg, Markus
id: '201086'
last_name: Pannenberg
- first_name: Johannes
full_name: Schwarze, Johannes
last_name: Schwarze
citation:
alphadin: 'Pannenberg, Markus ; Schwarze, Johannes: Wage Dynamics and
Unemployment in Germany: Evidence from Regional Panel Data. In: Labour
Bd. 14, Wiley (2000), Nr. 4, S. 645–655'
ama: 'Pannenberg M, Schwarze J. Wage Dynamics and Unemployment in Germany: Evidence
from Regional Panel Data. Labour. 2000;14(4):645-655. doi:10.1111/1467-9914.00150'
apa: 'Pannenberg, M., & Schwarze, J. (2000). Wage Dynamics and Unemployment
in Germany: Evidence from Regional Panel Data. Labour, 14(4), 645–655.
https://doi.org/10.1111/1467-9914.00150'
bibtex: '@article{Pannenberg_Schwarze_2000, title={Wage Dynamics and Unemployment
in Germany: Evidence from Regional Panel Data}, volume={14}, DOI={10.1111/1467-9914.00150},
number={4}, journal={Labour}, publisher={Wiley}, author={Pannenberg, Markus and
Schwarze, Johannes}, year={2000}, pages={645–655} }'
chicago: 'Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment
in Germany: Evidence from Regional Panel Data.” Labour 14, no. 4 (2000):
645–55. https://doi.org/10.1111/1467-9914.00150.'
ieee: 'M. Pannenberg and J. Schwarze, “Wage Dynamics and Unemployment in Germany:
Evidence from Regional Panel Data,” Labour, vol. 14, no. 4, pp. 645–655,
2000.'
mla: 'Pannenberg, Markus, and Johannes Schwarze. “Wage Dynamics and Unemployment
in Germany: Evidence from Regional Panel Data.” Labour, vol. 14, no. 4,
Wiley, 2000, pp. 645–55, doi:10.1111/1467-9914.00150.'
short: M. Pannenberg, J. Schwarze, Labour 14 (2000) 645–655.
date_created: 2021-06-03T12:37:56Z
date_updated: 2026-03-17T15:28:15Z
doi: 10.1111/1467-9914.00150
intvolume: ' 14'
issue: '4'
language:
- iso: eng
page: 645-655
publication: Labour
publication_identifier:
eissn:
- 1467-9914
issn:
- 1121-7081
publication_status: published
publisher: Wiley
quality_controlled: '1'
status: public
title: 'Wage Dynamics and Unemployment in Germany: Evidence from Regional Panel Data'
type: journal_article
user_id: '249199'
volume: 14
year: '2000'
...
---
_id: '5681'
author:
- first_name: Claudia
full_name: Cottin, Claudia
id: '33935'
last_name: Cottin
orcid: 0000-0001-9212-5027
orcid_put_code_url: https://api.orcid.org/v2.0/0000-0001-9212-5027/work/178953091
citation:
alphadin: 'Cottin, Claudia: Bericht
von der 17. Tagung der Deutschen AFIR-Gruppe am 29. April 99 in Berlin. In: Der
Aktuar (1999), Nr. 3'
ama: Cottin C. Bericht von der 17. Tagung der Deutschen AFIR-Gruppe am 29. April
99 in Berlin. Der Aktuar. 1999;(3).
apa: Cottin, C. (1999). Bericht von der 17. Tagung der Deutschen AFIR-Gruppe am
29. April 99 in Berlin. Der Aktuar.
bibtex: '@article{Cottin_1999, title={Bericht von der 17. Tagung der Deutschen AFIR-Gruppe
am 29. April 99 in Berlin}, number={3}, journal={Der Aktuar}, author={Cottin,
Claudia}, year={1999} }'
chicago: Cottin, Claudia. “Bericht von der 17. Tagung der Deutschen AFIR-Gruppe
am 29. April 99 in Berlin.” Der Aktuar, 1999.
ieee: C. Cottin, “Bericht von der 17. Tagung der Deutschen AFIR-Gruppe am 29. April
99 in Berlin,” Der Aktuar, no. 3. 1999.
mla: Cottin, Claudia. “Bericht von der 17. Tagung der Deutschen AFIR-Gruppe am 29.
April 99 in Berlin.” Der Aktuar, no. 3, 1999.
short: C. Cottin, Der Aktuar (1999).
date_created: 2025-02-18T18:07:48Z
date_updated: 2026-03-17T15:29:21Z
department:
- _id: '103'
issue: '3'
language:
- iso: ger
publication: Der Aktuar
publication_status: published
status: public
title: Bericht von der 17. Tagung der Deutschen AFIR-Gruppe am 29. April 99 in Berlin
type: review
user_id: '220548'
year: '1999'
...
---
_id: '5634'
alternative_id:
- '4472'
article_number: '126510'
author:
- first_name: Claudia
full_name: Cottin, Claudia
id: '33935'
last_name: Cottin
orcid: 0000-0001-9212-5027
- first_name: Ioan
full_name: Gavrea, Ioan
last_name: Gavrea
- first_name: Heiner
full_name: Gonska, Heiner
last_name: Gonska
- first_name: Daniela P
full_name: Kacsó, Daniela P
last_name: Kacsó
- first_name: Ding-Xuan
full_name: Zhou, Ding-Xuan
last_name: Zhou
citation:
alphadin: 'Cottin, Claudia ; Gavrea, Ioan ; Gonska,
Heiner ; Kacsó, Daniela P
; Zhou, Ding-Xuan: Global smoothness
preservation and the variation-diminishing property. In: Journal of Inequalities
and Applications Bd. 1999, Springer Science and Business Media LLC (1999),
Nr. 2'
ama: Cottin C, Gavrea I, Gonska H, Kacsó DP, Zhou D-X. Global smoothness preservation
and the variation-diminishing property. Journal of Inequalities and Applications.
1999;1999(2). doi:10.1155/S1025583499000314
apa: Cottin, C., Gavrea, I., Gonska, H., Kacsó, D. P., & Zhou, D.-X. (1999).
Global smoothness preservation and the variation-diminishing property. Journal
of Inequalities and Applications, 1999(2). https://doi.org/10.1155/S1025583499000314
bibtex: '@article{Cottin_Gavrea_Gonska_Kacsó_Zhou_1999, title={Global smoothness
preservation and the variation-diminishing property}, volume={1999}, DOI={10.1155/S1025583499000314},
number={2126510}, journal={Journal of Inequalities and Applications}, publisher={Springer
Science and Business Media LLC}, author={Cottin, Claudia and Gavrea, Ioan and
Gonska, Heiner and Kacsó, Daniela P and Zhou, Ding-Xuan}, year={1999} }'
chicago: Cottin, Claudia, Ioan Gavrea, Heiner Gonska, Daniela P Kacsó, and Ding-Xuan
Zhou. “Global Smoothness Preservation and the Variation-Diminishing Property.”
Journal of Inequalities and Applications 1999, no. 2 (1999). https://doi.org/10.1155/S1025583499000314.
ieee: C. Cottin, I. Gavrea, H. Gonska, D. P. Kacsó, and D.-X. Zhou, “Global smoothness
preservation and the variation-diminishing property,” Journal of Inequalities
and Applications, vol. 1999, no. 2, 1999.
mla: Cottin, Claudia, et al. “Global Smoothness Preservation and the Variation-Diminishing
Property.” Journal of Inequalities and Applications, vol. 1999, no. 2,
126510, Springer Science and Business Media LLC, 1999, doi:10.1155/S1025583499000314.
short: C. Cottin, I. Gavrea, H. Gonska, D.P. Kacsó, D.-X. Zhou, Journal of Inequalities
and Applications 1999 (1999).
date_created: 2025-02-16T18:52:27Z
date_updated: 2026-03-17T15:29:20Z
department:
- _id: '103'
doi: 10.1155/S1025583499000314
intvolume: ' 1999'
issue: '2'
language:
- iso: eng
publication: Journal of Inequalities and Applications
publication_identifier:
issn:
- 1029-242X
publication_status: published
publisher: Springer Science and Business Media LLC
status: public
title: Global smoothness preservation and the variation-diminishing property
type: journal_article
user_id: '33935'
volume: 1999
year: '1999'
...
---
_id: '5260'
author:
- first_name: Konstantin
full_name: Meskouris, Konstantin
last_name: Meskouris
- first_name: Wolfhard
full_name: Zahlten, Wolfhard
last_name: Zahlten
- first_name: Uwe
full_name: Weitkemper, Uwe
id: '202449'
last_name: Weitkemper
citation:
alphadin: 'Meskouris, Konstantin ;
Zahlten, Wolfhard ; Weitkemper,
Uwe: Seismische Schädigung von Stahlbetonhochhäusern. In: Bauingenieur
Bd. 74 (1999), Nr. 7/8, S. 325–331'
ama: Meskouris K, Zahlten W, Weitkemper U. Seismische Schädigung von Stahlbetonhochhäusern.
Bauingenieur. 1999;74(7/8):325-331.
apa: Meskouris, K., Zahlten, W., & Weitkemper, U. (1999). Seismische Schädigung
von Stahlbetonhochhäusern. Bauingenieur, 74(7/8), 325–331.
bibtex: '@article{Meskouris_Zahlten_Weitkemper_1999, title={Seismische Schädigung
von Stahlbetonhochhäusern}, volume={74}, number={7/8}, journal={Bauingenieur},
author={Meskouris, Konstantin and Zahlten, Wolfhard and Weitkemper, Uwe}, year={1999},
pages={325–331} }'
chicago: 'Meskouris, Konstantin, Wolfhard Zahlten, and Uwe Weitkemper. “Seismische
Schädigung von Stahlbetonhochhäusern.” Bauingenieur 74, no. 7/8 (1999):
325–31.'
ieee: K. Meskouris, W. Zahlten, and U. Weitkemper, “Seismische Schädigung von Stahlbetonhochhäusern,”
Bauingenieur, vol. 74, no. 7/8, pp. 325–331, 1999.
mla: Meskouris, Konstantin, et al. “Seismische Schädigung von Stahlbetonhochhäusern.”
Bauingenieur, vol. 74, no. 7/8, 1999, pp. 325–31.
short: K. Meskouris, W. Zahlten, U. Weitkemper, Bauingenieur 74 (1999) 325–331.
date_created: 2025-01-03T08:18:19Z
date_updated: 2026-03-17T15:29:15Z
department:
- _id: '102'
intvolume: ' 74'
issue: 7/8
language:
- iso: ger
page: 325-331
publication: Bauingenieur
publication_status: published
status: public
title: Seismische Schädigung von Stahlbetonhochhäusern
type: journal_article
user_id: '220548'
volume: 74
year: '1999'
...
---
_id: '5262'
author:
- first_name: Konstantin
full_name: Meskouris, Konstantin
last_name: Meskouris
- first_name: Uwe
full_name: Weitkemper, Uwe
id: '202449'
last_name: Weitkemper
citation:
alphadin: 'Meskouris, Konstantin ;
Weitkemper, Uwe: Zur Schädigung
von Wandscheibenbauten unter Erdbebenbeanspruchung. In: Baustatik - Baupraxis
7, Berichte der 7. Fachtagung „Baustatik - Baupraxis“ . Rotterdam : A.A. Balkema
Publishers, 1999'
ama: 'Meskouris K, Weitkemper U. Zur Schädigung von Wandscheibenbauten unter Erdbebenbeanspruchung.
In: Baustatik - Baupraxis 7, Berichte der 7. Fachtagung “Baustatik - Baupraxis”
. Rotterdam: A.A. Balkema Publishers; 1999.'
apa: 'Meskouris, K., & Weitkemper, U. (1999). Zur Schädigung von Wandscheibenbauten
unter Erdbebenbeanspruchung. In Baustatik - Baupraxis 7, Berichte der 7. Fachtagung
“Baustatik - Baupraxis” . Rotterdam: A.A. Balkema Publishers.'
bibtex: '@inproceedings{Meskouris_Weitkemper_1999, place={Rotterdam}, title={Zur
Schädigung von Wandscheibenbauten unter Erdbebenbeanspruchung}, booktitle={Baustatik
- Baupraxis 7, Berichte der 7. Fachtagung “Baustatik - Baupraxis” }, publisher={A.A.
Balkema Publishers}, author={Meskouris, Konstantin and Weitkemper, Uwe}, year={1999}
}'
chicago: 'Meskouris, Konstantin, and Uwe Weitkemper. “Zur Schädigung von Wandscheibenbauten
unter Erdbebenbeanspruchung.” In Baustatik - Baupraxis 7, Berichte der 7. Fachtagung
“Baustatik - Baupraxis” . Rotterdam: A.A. Balkema Publishers, 1999.'
ieee: K. Meskouris and U. Weitkemper, “Zur Schädigung von Wandscheibenbauten unter
Erdbebenbeanspruchung,” in Baustatik - Baupraxis 7, Berichte der 7. Fachtagung
“Baustatik - Baupraxis” , Aachen, 1999.
mla: Meskouris, Konstantin, and Uwe Weitkemper. “Zur Schädigung von Wandscheibenbauten
unter Erdbebenbeanspruchung.” Baustatik - Baupraxis 7, Berichte der 7. Fachtagung
“Baustatik - Baupraxis” , A.A. Balkema Publishers, 1999.
short: 'K. Meskouris, U. Weitkemper, in: Baustatik - Baupraxis 7, Berichte der 7.
Fachtagung “Baustatik - Baupraxis” , A.A. Balkema Publishers, Rotterdam, 1999.'
conference:
end_date: 1999-03-19
location: Aachen
name: Baustatik - Baupraxis 7
start_date: 1999-03-18
date_created: 2025-01-03T08:40:46Z
date_updated: 2026-03-17T15:29:15Z
department:
- _id: '102'
language:
- iso: ger
place: Rotterdam
publication: 'Baustatik - Baupraxis 7, Berichte der 7. Fachtagung "Baustatik - Baupraxis" '
publication_identifier:
isbn:
- 978-9058090447
publication_status: published
publisher: A.A. Balkema Publishers
status: public
title: Zur Schädigung von Wandscheibenbauten unter Erdbebenbeanspruchung
type: conference
user_id: '220548'
year: '1999'
...
---
_id: '5116'
author:
- first_name: Dwight
full_name: Deugo, Dwight
last_name: Deugo
- first_name: Franz
full_name: Oppacher, Franz
last_name: Oppacher
- first_name: Jochen
full_name: Küster, Jochen
id: '217892'
last_name: Küster
- first_name: Ingo
full_name: von Otte, Ingo
last_name: von Otte
citation:
alphadin: 'Deugo, Dwight ; Oppacher,
Franz ; Küster, Jochen ;
von Otte, Ingo: Patterns as a Means
for Intelligent Software Engineering. In: Arabnia,
H. R. ; CSREA Press (Hrsg.):
Proceedings of the International Conference on Artificial Intelligence, IC-AI
’99, June 28 - July 1, 1999, Las Vegas, Nevada, USA, Volume 2,
1999, S. 605–611'
ama: 'Deugo D, Oppacher F, Küster J, von Otte I. Patterns as a Means for Intelligent
Software Engineering. In: Arabnia HR, CSREA Press, eds. Proceedings of the
International Conference on Artificial Intelligence, IC-AI ’99, June 28 - July
1, 1999, Las Vegas, Nevada, USA, Volume 2. ; 1999:605-611.'
apa: Deugo, D., Oppacher, F., Küster, J., & von Otte, I. (1999). Patterns as
a Means for Intelligent Software Engineering. In H. R. Arabnia & CSREA Press
(Eds.), Proceedings of the International Conference on Artificial Intelligence,
IC-AI ’99, June 28 - July 1, 1999, Las Vegas, Nevada, USA, Volume
2 (pp. 605–611). Las Vegas, Nevada.
bibtex: '@inproceedings{Deugo_Oppacher_Küster_von Otte_1999, title={Patterns as
a Means for Intelligent Software Engineering}, booktitle={Proceedings of the International
Conference on Artificial Intelligence, IC-AI ’99, June 28 - July 1, 1999, Las
Vegas, Nevada, USA, Volume 2}, author={Deugo, Dwight and Oppacher,
Franz and Küster, Jochen and von Otte, Ingo}, editor={Arabnia, Hamid R. and CSREA
PressEditors}, year={1999}, pages={605–611} }'
chicago: Deugo, Dwight, Franz Oppacher, Jochen Küster, and Ingo von Otte. “Patterns
as a Means for Intelligent Software Engineering.” In Proceedings of the International
Conference on Artificial Intelligence, IC-AI ’99, June 28 - July 1, 1999, Las
Vegas, Nevada, USA, Volume 2, edited by Hamid R. Arabnia
and CSREA Press, 605–11, 1999.
ieee: D. Deugo, F. Oppacher, J. Küster, and I. von Otte, “Patterns as a Means for
Intelligent Software Engineering,” in Proceedings of the International Conference
on Artificial Intelligence, IC-AI ’99, June 28 - July 1, 1999, Las Vegas, Nevada,
USA, Volume 2, Las Vegas, Nevada, 1999, pp. 605–611.
mla: Deugo, Dwight, et al. “Patterns as a Means for Intelligent Software Engineering.”
Proceedings of the International Conference on Artificial Intelligence, IC-AI
’99, June 28 - July 1, 1999, Las Vegas, Nevada, USA, Volume 2,
edited by Hamid R. Arabnia and CSREA Press, 1999, pp. 605–11.
short: 'D. Deugo, F. Oppacher, J. Küster, I. von Otte, in: H.R. Arabnia, CSREA Press
(Eds.), Proceedings of the International Conference on Artificial Intelligence,
IC-AI ’99, June 28 - July 1, 1999, Las Vegas, Nevada, USA, Volume
2, 1999, pp. 605–611.'
conference:
end_date: 1999-07-01
location: Las Vegas, Nevada
name: International Conference on Artificial Intelligence, IC-AI '99
start_date: 1999-06-28
corporate_editor:
- CSREA Press
date_created: 2024-11-19T12:10:46Z
date_updated: 2026-03-17T15:29:13Z
editor:
- first_name: Hamid R.
full_name: Arabnia, Hamid R.
last_name: Arabnia
language:
- iso: eng
page: 605-611
project:
- _id: f432a2ee-bceb-11ed-a251-a83585c5074d
name: Institute for Data Science Solutions
publication: Proceedings of the International Conference on Artificial Intelligence,
IC-AI '99, June 28 - July 1, 1999, Las Vegas, Nevada, USA, Volume 2
status: public
title: Patterns as a Means for Intelligent Software Engineering
type: conference
user_id: '220548'
year: '1999'
...
---
_id: '4767'
author:
- first_name: Marcin
full_name: Paprzycki, Marcin
last_name: Paprzycki
- first_name: Svetozara
full_name: Petrova, Svetozara
id: '201871'
last_name: Petrova
- first_name: Julian
full_name: Sanchez, Julian
last_name: Sanchez
citation:
alphadin: 'Paprzycki, Marcin ; Petrova, Svetozara ; Sanchez,
Julian: Implementing parallel elliptic solver on a Beowulf cluster. In:
Electronic Journal of Differential Equations, 1999'
ama: 'Paprzycki M, Petrova S, Sanchez J. Implementing parallel elliptic solver on
a Beowulf cluster. In: Electronic Journal of Differential Equations. ;
1999.'
apa: Paprzycki, M., Petrova, S., & Sanchez, J. (1999). Implementing parallel
elliptic solver on a Beowulf cluster. In Electronic Journal of Differential
Equations. University of Central Oklahoma .
bibtex: '@inproceedings{Paprzycki_Petrova_Sanchez_1999, title={Implementing parallel
elliptic solver on a Beowulf cluster}, booktitle={Electronic Journal of Differential
Equations}, author={Paprzycki, Marcin and Petrova, Svetozara and Sanchez, Julian},
year={1999} }'
chicago: Paprzycki, Marcin, Svetozara Petrova, and Julian Sanchez. “Implementing
Parallel Elliptic Solver on a Beowulf Cluster.” In Electronic Journal of Differential
Equations, 1999.
ieee: M. Paprzycki, S. Petrova, and J. Sanchez, “Implementing parallel elliptic
solver on a Beowulf cluster,” in Electronic Journal of Differential Equations,
University of Central Oklahoma , 1999.
mla: Paprzycki, Marcin, et al. “Implementing Parallel Elliptic Solver on a Beowulf
Cluster.” Electronic Journal of Differential Equations, 1999.
short: 'M. Paprzycki, S. Petrova, J. Sanchez, in: Electronic Journal of Differential
Equations, 1999.'
conference:
end_date: 1999-02-13
location: 'University of Central Oklahoma '
name: 15th Annual Conference of Applied Mathematic
start_date: 1999-02-12
date_created: 2024-07-04T11:40:21Z
date_updated: 2026-03-17T15:29:06Z
language:
- iso: eng
main_file_link:
- url: https://www.emis.de/journals/EJDE/conf-proc/02/p1/abstr.html
project:
- _id: f432a2ee-bceb-11ed-a251-a83585c5074d
name: Institute for Data Science Solutions
publication: Electronic Journal of Differential Equations
publication_identifier:
issn:
- 1072-669
status: public
title: Implementing parallel elliptic solver on a Beowulf cluster
type: conference
user_id: '220548'
year: '1999'
...
---
_id: '4579'
author:
- first_name: Thomas
full_name: Buhl, Thomas
id: '252916'
last_name: Buhl
orcid: 0009-0003-6411-7566
orcid_put_code_url: https://api.orcid.org/v2.0/0009-0003-6411-7566/work/160058223
citation:
alphadin: 'Buhl, Thomas: Positive-Negative
Asymmetry in Social Discrimination: Meta-Analytical Evidence. In: Group Processes
& Intergroup Relations Bd. 2, SAGE Publications (1999), Nr. 1, S. 51–58'
ama: 'Buhl T. Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical
Evidence. Group Processes & Intergroup Relations. 1999;2(1):51-58.
doi:10.1177/1368430299021004'
apa: 'Buhl, T. (1999). Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical
Evidence. Group Processes & Intergroup Relations, 2(1), 51–58.
https://doi.org/10.1177/1368430299021004'
bibtex: '@article{Buhl_1999, title={Positive-Negative Asymmetry in Social Discrimination:
Meta-Analytical Evidence}, volume={2}, DOI={10.1177/1368430299021004},
number={1}, journal={Group Processes & Intergroup Relations}, publisher={SAGE
Publications}, author={Buhl, Thomas}, year={1999}, pages={51–58} }'
chicago: 'Buhl, Thomas. “Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical
Evidence.” Group Processes & Intergroup Relations 2, no. 1 (1999):
51–58. https://doi.org/10.1177/1368430299021004.'
ieee: 'T. Buhl, “Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical
Evidence,” Group Processes & Intergroup Relations, vol. 2, no. 1, pp.
51–58, 1999.'
mla: 'Buhl, Thomas. “Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical
Evidence.” Group Processes & Intergroup Relations, vol. 2, no. 1, SAGE
Publications, 1999, pp. 51–58, doi:10.1177/1368430299021004.'
short: T. Buhl, Group Processes & Intergroup Relations 2 (1999) 51–58.
date_created: 2024-05-21T11:01:09Z
date_updated: 2026-03-17T15:29:03Z
doi: 10.1177/1368430299021004
intvolume: ' 2'
issue: '1'
language:
- iso: eng
page: 51-58
publication: Group Processes & Intergroup Relations
publication_identifier:
eissn:
- 1461-7188
issn:
- 1368-4302
publication_status: published
publisher: SAGE Publications
status: public
title: 'Positive-Negative Asymmetry in Social Discrimination: Meta-Analytical Evidence'
type: journal_article
user_id: '220548'
volume: 2
year: '1999'
...
---
_id: '3553'
author:
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: S.H.A.
full_name: Petri, S.H.A.
last_name: Petri
- first_name: A.
full_name: Klipp, A.
last_name: Klipp
- first_name: G.
full_name: Haindl, G.
last_name: Haindl
- first_name: J.
full_name: Hartwich, J.
last_name: Hartwich
- first_name: L.
full_name: Dreeskornfeld, L.
last_name: Dreeskornfeld
- first_name: U.
full_name: Kleineberg, U.
last_name: Kleineberg
- first_name: P.
full_name: Jutzi, P.
last_name: Jutzi
- first_name: U.
full_name: Heinzmann, U.
last_name: Heinzmann
citation:
alphadin: 'Hamelmann,
Frank ; Petri, S.H.A. ; Klipp, A. ; Haindl,
G. ; Hartwich, J. ; Dreeskornfeld, L. ; Kleineberg,
U. ; Jutzi, P. ; u. a.:
W/Si multilayers deposited by hot-filament MOCVD. In: Thin Solid Films
Bd. 338, Elsevier BV (1999), Nr. 1–2, S. 70–74'
ama: Hamelmann F, Petri SHA, Klipp A, et al. W/Si multilayers deposited by hot-filament
MOCVD. Thin Solid Films. 1999;338(1-2):70-74. doi:10.1016/S0040-6090(98)00996-1
apa: Hamelmann, F., Petri, S. H. A., Klipp, A., Haindl, G., Hartwich, J., Dreeskornfeld,
L., … Heinzmann, U. (1999). W/Si multilayers deposited by hot-filament MOCVD.
Thin Solid Films, 338(1–2), 70–74. https://doi.org/10.1016/S0040-6090(98)00996-1
bibtex: '@article{Hamelmann_Petri_Klipp_Haindl_Hartwich_Dreeskornfeld_Kleineberg_Jutzi_Heinzmann_1999,
title={W/Si multilayers deposited by hot-filament MOCVD}, volume={338}, DOI={10.1016/S0040-6090(98)00996-1},
number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann,
Frank and Petri, S.H.A. and Klipp, A. and Haindl, G. and Hartwich, J. and Dreeskornfeld,
L. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={1999}, pages={70–74}
}'
chicago: 'Hamelmann, Frank, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld,
U. Kleineberg, P. Jutzi, and U. Heinzmann. “W/Si Multilayers Deposited by Hot-Filament
MOCVD.” Thin Solid Films 338, no. 1–2 (1999): 70–74. https://doi.org/10.1016/S0040-6090(98)00996-1.'
ieee: F. Hamelmann et al., “W/Si multilayers deposited by hot-filament MOCVD,”
Thin Solid Films, vol. 338, no. 1–2, pp. 70–74, 1999.
mla: Hamelmann, Frank, et al. “W/Si Multilayers Deposited by Hot-Filament MOCVD.”
Thin Solid Films, vol. 338, no. 1–2, Elsevier BV, 1999, pp. 70–74, doi:10.1016/S0040-6090(98)00996-1.
short: F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld,
U. Kleineberg, P. Jutzi, U. Heinzmann, Thin Solid Films 338 (1999) 70–74.
date_created: 2023-09-01T10:05:42Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0040-6090(98)00996-1
intvolume: ' 338'
issue: 1-2
language:
- iso: eng
page: 70-74
publication: Thin Solid Films
publication_identifier:
issn:
- '00406090'
publication_status: published
publisher: Elsevier BV
status: public
title: W/Si multilayers deposited by hot-filament MOCVD
type: journal_article
user_id: '216459'
volume: 338
year: '1999'
...
---
_id: '3554'
author:
- first_name: S
full_name: Luby, S
last_name: Luby
- first_name: M
full_name: Jergel, M
last_name: Jergel
- first_name: A
full_name: Anopchenko, A
last_name: Anopchenko
- first_name: A
full_name: Aschentrup, A
last_name: Aschentrup
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: E
full_name: Majkova, E
last_name: Majkova
- first_name: U
full_name: Kleineberg, U
last_name: Kleineberg
- first_name: U
full_name: Heinzmann, U
last_name: Heinzmann
citation:
alphadin: 'Luby, S ; Jergel,
M ; Anopchenko, A ; Aschentrup, A ; Hamelmann,
Frank ; Majkova, E ; Kleineberg, U ; Heinzmann,
U: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing.
In: Applied Surface Science Bd. 150, Elsevier BV (1999), Nr. 1–4, S. 178–184'
ama: Luby S, Jergel M, Anopchenko A, et al. Thermal behaviour of Co/Si/W/Si multilayers
under rapid thermal annealing. Applied Surface Science. 1999;150(1-4):178-184.
doi:10.1016/S0169-4332(99)00243-3
apa: Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova,
E., … Heinzmann, U. (1999). Thermal behaviour of Co/Si/W/Si multilayers under
rapid thermal annealing. Applied Surface Science, 150(1–4), 178–184.
https://doi.org/10.1016/S0169-4332(99)00243-3
bibtex: '@article{Luby_Jergel_Anopchenko_Aschentrup_Hamelmann_Majkova_Kleineberg_Heinzmann_1999,
title={Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing},
volume={150}, DOI={10.1016/S0169-4332(99)00243-3},
number={1–4}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Luby,
S and Jergel, M and Anopchenko, A and Aschentrup, A and Hamelmann, Frank and Majkova,
E and Kleineberg, U and Heinzmann, U}, year={1999}, pages={178–184} }'
chicago: 'Luby, S, M Jergel, A Anopchenko, A Aschentrup, Frank Hamelmann, E Majkova,
U Kleineberg, and U Heinzmann. “Thermal Behaviour of Co/Si/W/Si Multilayers under
Rapid Thermal Annealing.” Applied Surface Science 150, no. 1–4 (1999):
178–84. https://doi.org/10.1016/S0169-4332(99)00243-3.'
ieee: S. Luby et al., “Thermal behaviour of Co/Si/W/Si multilayers under
rapid thermal annealing,” Applied Surface Science, vol. 150, no. 1–4, pp.
178–184, 1999.
mla: Luby, S., et al. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal
Annealing.” Applied Surface Science, vol. 150, no. 1–4, Elsevier BV, 1999,
pp. 178–84, doi:10.1016/S0169-4332(99)00243-3.
short: S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova,
U. Kleineberg, U. Heinzmann, Applied Surface Science 150 (1999) 178–184.
date_created: 2023-09-01T10:06:52Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0169-4332(99)00243-3
intvolume: ' 150'
issue: 1-4
language:
- iso: eng
page: 178-184
publication: Applied Surface Science
publication_identifier:
issn:
- '01694332'
publication_status: published
publisher: Elsevier BV
status: public
title: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
type: journal_article
user_id: '216459'
volume: 150
year: '1999'
...
---
_id: '3555'
author:
- first_name: U
full_name: Kleineberg, U
last_name: Kleineberg
- first_name: D
full_name: Menke, D
last_name: Menke
- first_name: Frank
full_name: Hamelmann, Frank
id: '208487'
last_name: Hamelmann
orcid: 0000-0001-6141-9874
- first_name: U
full_name: Heinzmann, U
last_name: Heinzmann
- first_name: O
full_name: Schmidt, O
last_name: Schmidt
- first_name: G.H
full_name: Fecher, G.H
last_name: Fecher
- first_name: G
full_name: Schoenhense, G
last_name: Schoenhense
citation:
alphadin: 'Kleineberg, U ; Menke,
D ; Hamelmann, Frank ; Heinzmann, U ; Schmidt,
O ; Fecher, G.H ; Schoenhense,
G: Photoemission microscopy with microspot-XPS by use of undulator radiation
and a high-throughput multilayer monochromator at BESSY. In: Journal of Electron
Spectroscopy and Related Phenomena Bd. 101–103, Elsevier BV (1999), S. 931–936'
ama: Kleineberg U, Menke D, Hamelmann F, et al. Photoemission microscopy with microspot-XPS
by use of undulator radiation and a high-throughput multilayer monochromator at
BESSY. Journal of Electron Spectroscopy and Related Phenomena. 1999;101-103:931-936.
doi:10.1016/S0368-2048(98)00374-0
apa: Kleineberg, U., Menke, D., Hamelmann, F., Heinzmann, U., Schmidt, O., Fecher,
G. ., & Schoenhense, G. (1999). Photoemission microscopy with microspot-XPS
by use of undulator radiation and a high-throughput multilayer monochromator at
BESSY. Journal of Electron Spectroscopy and Related Phenomena, 101–103,
931–936. https://doi.org/10.1016/S0368-2048(98)00374-0
bibtex: '@article{Kleineberg_Menke_Hamelmann_Heinzmann_Schmidt_Fecher_Schoenhense_1999,
title={Photoemission microscopy with microspot-XPS by use of undulator radiation
and a high-throughput multilayer monochromator at BESSY}, volume={101–103}, DOI={10.1016/S0368-2048(98)00374-0},
journal={Journal of Electron Spectroscopy and Related Phenomena}, publisher={Elsevier
BV}, author={Kleineberg, U and Menke, D and Hamelmann, Frank and Heinzmann, U
and Schmidt, O and Fecher, G.H and Schoenhense, G}, year={1999}, pages={931–936}
}'
chicago: 'Kleineberg, U, D Menke, Frank Hamelmann, U Heinzmann, O Schmidt, G.H Fecher,
and G Schoenhense. “Photoemission Microscopy with Microspot-XPS by Use of Undulator
Radiation and a High-Throughput Multilayer Monochromator at BESSY.” Journal
of Electron Spectroscopy and Related Phenomena 101–103 (1999): 931–36. https://doi.org/10.1016/S0368-2048(98)00374-0.'
ieee: U. Kleineberg et al., “Photoemission microscopy with microspot-XPS
by use of undulator radiation and a high-throughput multilayer monochromator at
BESSY,” Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103,
pp. 931–936, 1999.
mla: Kleineberg, U., et al. “Photoemission Microscopy with Microspot-XPS by Use
of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY.”
Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103, Elsevier
BV, 1999, pp. 931–36, doi:10.1016/S0368-2048(98)00374-0.
short: U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.. Fecher,
G. Schoenhense, Journal of Electron Spectroscopy and Related Phenomena 101–103
(1999) 931–936.
date_created: 2023-09-01T10:07:44Z
date_updated: 2026-03-17T15:28:46Z
doi: 10.1016/S0368-2048(98)00374-0
language:
- iso: eng
page: 931-936
publication: Journal of Electron Spectroscopy and Related Phenomena
publication_identifier:
issn:
- '03682048'
publication_status: published
publisher: Elsevier BV
status: public
title: Photoemission microscopy with microspot-XPS by use of undulator radiation and
a high-throughput multilayer monochromator at BESSY
type: journal_article
user_id: '216459'
volume: 101-103
year: '1999'
...
---
_id: '3584'
author:
- first_name: Hans
full_name: Brandt-Pook, Hans
id: '206531'
last_name: Brandt-Pook
orcid: 0009-0002-6668-2684
orcid_put_code_url: https://api.orcid.org/v2.0/0009-0002-6668-2684/work/156951518
- first_name: G.A.
full_name: Fink, G.A.
last_name: Fink
- first_name: S.
full_name: Wachsmuth, S.
last_name: Wachsmuth
- first_name: G.
full_name: Sagerer, G.
last_name: Sagerer
citation:
alphadin: 'Brandt-Pook, Hans ; Fink, G.A. ; Wachsmuth,
S. ; Sagerer, G.: Integrated
recognition and interpretaion of speech for a construction task domain. In: Bullinger, H. ; Ziegler,
J. (Hrsg.): Proceedings 8th International Conference on Human-Computer
Interaction, Bd.1. München, 1999, S. 550–555'
ama: 'Brandt-Pook H, Fink GA, Wachsmuth S, Sagerer G. Integrated recognition and
interpretaion of speech for a construction task domain. In: Bullinger H, Ziegler
J, eds. Proceedings 8th International Conference on Human-Computer Interaction,
Bd.1. München; 1999:550-555.'
apa: Brandt-Pook, H., Fink, G. A., Wachsmuth, S., & Sagerer, G. (1999). Integrated
recognition and interpretaion of speech for a construction task domain. In H.
Bullinger & J. Ziegler (Eds.), Proceedings 8th International Conference
on Human-Computer Interaction, Bd.1 (pp. 550–555). München.
bibtex: '@inbook{Brandt-Pook_Fink_Wachsmuth_Sagerer_1999, place={München}, title={Integrated
recognition and interpretaion of speech for a construction task domain}, booktitle={Proceedings
8th International Conference on Human-Computer Interaction, Bd.1}, author={Brandt-Pook,
Hans and Fink, G.A. and Wachsmuth, S. and Sagerer, G.}, editor={Bullinger, H.
and Ziegler, J.Editors}, year={1999}, pages={550–555} }'
chicago: Brandt-Pook, Hans, G.A. Fink, S. Wachsmuth, and G. Sagerer. “Integrated
Recognition and Interpretaion of Speech for a Construction Task Domain.” In Proceedings
8th International Conference on Human-Computer Interaction, Bd.1, edited by
H. Bullinger and J. Ziegler, 550–55. München, 1999.
ieee: H. Brandt-Pook, G. A. Fink, S. Wachsmuth, and G. Sagerer, “Integrated recognition
and interpretaion of speech for a construction task domain,” in Proceedings
8th International Conference on Human-Computer Interaction, Bd.1, H. Bullinger
and J. Ziegler, Eds. München, 1999, pp. 550–555.
mla: Brandt-Pook, Hans, et al. “Integrated Recognition and Interpretaion of Speech
for a Construction Task Domain.” Proceedings 8th International Conference on
Human-Computer Interaction, Bd.1, edited by H. Bullinger and J. Ziegler, 1999,
pp. 550–55.
short: 'H. Brandt-Pook, G.A. Fink, S. Wachsmuth, G. Sagerer, in: H. Bullinger, J.
Ziegler (Eds.), Proceedings 8th International Conference on Human-Computer Interaction,
Bd.1, München, 1999, pp. 550–555.'
date_created: 2023-09-11T21:52:55Z
date_updated: 2026-03-17T15:28:46Z
editor:
- first_name: H.
full_name: Bullinger, H.
last_name: Bullinger
- first_name: J.
full_name: Ziegler, J.
last_name: Ziegler
language:
- iso: eng
page: 550-555
place: München
publication: Proceedings 8th International Conference on Human-Computer Interaction,
Bd.1
status: public
title: Integrated recognition and interpretaion of speech for a construction task
domain
type: book_chapter
user_id: '249224'
year: '1999'
...