{"publication":"Chemical Solution Synthesis for Materials Design and Thin Film Device Applications","abstract":[{"lang":"eng","text":"Magnetoresistive (or magnetic) random-access memories (MRAMs) belong to the nonvolatile memory devices, using magnetism to store information for long time periods. MRAMs are faster than mechanical hard disk drives and unlike solid-state drives (SSDs), can store data even without regular energy supply. A few other ideas, such as ferroelectric and phase-change materials, are also expected to show similar properties but are scarcely investigated.\r\nTechnologically, MRAMs are often produced by sputtering, atomic layer deposition, or similar thin-film technologies. Chemical methods, however, are also involved, such as deposition of thin films by chemical solution routes, wet etching to produce patterned structures, and chemical polishing to create the desired surface roughness.\r\nHere, we give an overview of possible chemical techniques applicable to the production of magnetic nonvolatile memory devices, offering possibilities to use new materials and process them differently from the pure physical route."}],"publisher":"Elsevier","_id":"1629","date_created":"2022-01-01T14:43:06Z","date_updated":"2024-05-11T09:50:00Z","year":"2021","publication_status":"published","author":[{"full_name":"Ehrmann, Andrea","orcid_put_code_url":"https://api.orcid.org/v2.0/0000-0003-0695-3905/work/105571299","id":"223776","last_name":"Ehrmann","first_name":"Andrea","orcid":"0000-0003-0695-3905"},{"full_name":"Blachowicz, Tomasz","last_name":"Blachowicz","first_name":"Tomasz"}],"status":"public","publication_identifier":{"isbn":["9780128197189"]},"title":"Chemical routes to magnetic nonvolatile memory devices","main_file_link":[{"url":"https://doi.org/10.1016/B978-0-12-819718-9.00010-8"}],"editor":[{"full_name":"Das , Soumen ","first_name":"Soumen ","last_name":"Das "},{"full_name":"Dhara, Sandip ","first_name":"Sandip ","last_name":"Dhara"}],"keyword":["MRAM Nonvolatile Magnetic memory Chemical deposition Chemical etching Dry etching Tunnel magnetoresistance Giant magnetoresistance"],"citation":{"alphadin":"Ehrmann, Andrea ; Blachowicz, Tomasz: Chemical routes to magnetic nonvolatile memory devices. In: Das , S. ; Dhara, S. (Hrsg.): Chemical Solution Synthesis for Materials Design and Thin Film Device Applications : Elsevier, 2021, S. 665–677","ieee":"A. Ehrmann and T. Blachowicz, “Chemical routes to magnetic nonvolatile memory devices,” in Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, S. Das and S. Dhara, Eds. Elsevier, 2021, pp. 665–677.","chicago":"Ehrmann, Andrea, and Tomasz Blachowicz. “Chemical Routes to Magnetic Nonvolatile Memory Devices.” In Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, edited by Soumen Das and Sandip Dhara, 665–77. Elsevier, 2021. https://doi.org/10.1016/B978-0-12-819718-9.00010-8.","mla":"Ehrmann, Andrea, and Tomasz Blachowicz. “Chemical Routes to Magnetic Nonvolatile Memory Devices.” Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, edited by Soumen Das and Sandip Dhara, Elsevier, 2021, pp. 665–77, doi:10.1016/B978-0-12-819718-9.00010-8.","apa":"Ehrmann, A., & Blachowicz, T. (2021). Chemical routes to magnetic nonvolatile memory devices. In S. Das & S. Dhara (Eds.), Chemical Solution Synthesis for Materials Design and Thin Film Device Applications (pp. 665–677). Elsevier. https://doi.org/10.1016/B978-0-12-819718-9.00010-8","bibtex":"@inbook{Ehrmann_Blachowicz_2021, title={Chemical routes to magnetic nonvolatile memory devices}, DOI={10.1016/B978-0-12-819718-9.00010-8}, booktitle={Chemical Solution Synthesis for Materials Design and Thin Film Device Applications}, publisher={Elsevier}, author={Ehrmann, Andrea and Blachowicz, Tomasz}, editor={Das , Soumen and Dhara, Sandip Editors}, year={2021}, pages={665–677} }","ama":"Ehrmann A, Blachowicz T. Chemical routes to magnetic nonvolatile memory devices. In: Das S, Dhara S, eds. Chemical Solution Synthesis for Materials Design and Thin Film Device Applications. Elsevier; 2021:665-677. doi:10.1016/B978-0-12-819718-9.00010-8","short":"A. Ehrmann, T. Blachowicz, in: S. Das , S. Dhara (Eds.), Chemical Solution Synthesis for Materials Design and Thin Film Device Applications, Elsevier, 2021, pp. 665–677."},"quality_controlled":"1","user_id":"220548","language":[{"iso":"eng"}],"department":[{"_id":"103"}],"doi":"10.1016/B978-0-12-819718-9.00010-8","page":"665-677","type":"book_chapter"}