{"year":"2004","publication":"Thin Solid Films","_id":"3542","citation":{"chicago":"Hamelmann, Frank, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, and K. Gesheva. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” <i>Thin Solid Films</i> 446, no. 2 (2004): 167–71. <a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">https://doi.org/10.1016/j.tsf.2003.09.045</a>.","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Brechling, A.</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Jutzi, P.</span> ; <span style=\"font-variant:small-caps;\">Sandrock, J.</span> ; <span style=\"font-variant:small-caps;\">Siemeling, U.</span> ; <span style=\"font-variant:small-caps;\">Ivanova, T.</span> ; u. a.</span>: Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. In: <i>Thin Solid Films</i> Bd. 446, Elsevier BV (2004), Nr. 2, S. 167–171","ieee":"F. Hamelmann <i>et al.</i>, “Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition,” <i>Thin Solid Films</i>, vol. 446, no. 2, pp. 167–171, 2004.","short":"F. Hamelmann, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, K. Gesheva, Thin Solid Films 446 (2004) 167–171.","mla":"Hamelmann, Frank, et al. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” <i>Thin Solid Films</i>, vol. 446, no. 2, Elsevier BV, 2004, pp. 167–71, doi:<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>.","bibtex":"@article{Hamelmann_Brechling_Aschentrup_Heinzmann_Jutzi_Sandrock_Siemeling_Ivanova_Szekeres_Gesheva_2004, title={Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition}, volume={446}, DOI={<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>}, number={2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Brechling, A. and Aschentrup, A. and Heinzmann, U. and Jutzi, P. and Sandrock, J. and Siemeling, U. and Ivanova, T. and Szekeres, A. and Gesheva, K.}, year={2004}, pages={167–171} }","ama":"Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. <i>Thin Solid Films</i>. 2004;446(2):167-171. doi:<a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">10.1016/j.tsf.2003.09.045</a>","apa":"Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., … Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. <i>Thin Solid Films</i>, <i>446</i>(2), 167–171. <a href=\"https://doi.org/10.1016/j.tsf.2003.09.045\">https://doi.org/10.1016/j.tsf.2003.09.045</a>"},"publication_identifier":{"issn":["00406090"]},"date_created":"2023-09-01T09:55:56Z","type":"journal_article","doi":"10.1016/j.tsf.2003.09.045","status":"public","volume":446,"author":[{"id":"208487","first_name":"Frank","last_name":"Hamelmann","full_name":"Hamelmann, Frank"},{"full_name":"Brechling, A.","last_name":"Brechling","first_name":"A."},{"first_name":"A.","last_name":"Aschentrup","full_name":"Aschentrup, A."},{"full_name":"Heinzmann, U.","first_name":"U.","last_name":"Heinzmann"},{"first_name":"P.","last_name":"Jutzi","full_name":"Jutzi, P."},{"first_name":"J.","last_name":"Sandrock","full_name":"Sandrock, J."},{"full_name":"Siemeling, U.","last_name":"Siemeling","first_name":"U."},{"last_name":"Ivanova","first_name":"T.","full_name":"Ivanova, T."},{"first_name":"A.","last_name":"Szekeres","full_name":"Szekeres, A."},{"full_name":"Gesheva, K.","last_name":"Gesheva","first_name":"K."}],"issue":"2","publication_status":"published","user_id":"216459","intvolume":"       446","page":"167-171","date_updated":"2023-09-01T10:25:43Z","language":[{"iso":"eng"}],"publisher":"Elsevier BV","title":"Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition"}