{"volume":76,"issue":"2-3","author":[{"last_name":"Hamelmann","first_name":"Frank","id":"208487","full_name":"Hamelmann, Frank"},{"full_name":"Aschentrup, A.","last_name":"Aschentrup","first_name":"A."},{"full_name":"Brechling, A.","last_name":"Brechling","first_name":"A."},{"first_name":"U.","last_name":"Heinzmann","full_name":"Heinzmann, U."},{"full_name":"Abrashev, M.","first_name":"M.","last_name":"Abrashev"},{"full_name":"Szekeres, A.","first_name":"A.","last_name":"Szekeres"},{"first_name":"K.","last_name":"Gesheva","full_name":"Gesheva, K."}],"user_id":"216459","publication_status":"published","intvolume":"        76","page":"139-142","date_updated":"2023-09-01T09:58:40Z","language":[{"iso":"eng"}],"publisher":"Elsevier BV","title":"Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases","year":"2004","publication":"Vacuum","citation":{"chicago":"Hamelmann, Frank, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A. Szekeres, and K. Gesheva. “Plasma-Assisted Deposition of Thin Carbon Films from Methane and the Influence of the Plasma Parameters and Additional Gases.” <i>Vacuum</i> 76, no. 2–3 (2004): 139–42. <a href=\"https://doi.org/10.1016/j.vacuum.2004.07.074\">https://doi.org/10.1016/j.vacuum.2004.07.074</a>.","alphadin":"<span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A.</span> ; <span style=\"font-variant:small-caps;\">Brechling, A.</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U.</span> ; <span style=\"font-variant:small-caps;\">Abrashev, M.</span> ; <span style=\"font-variant:small-caps;\">Szekeres, A.</span> ; <span style=\"font-variant:small-caps;\">Gesheva, K.</span>: Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. In: <i>Vacuum</i> Bd. 76, Elsevier BV (2004), Nr. 2–3, S. 139–142","ieee":"F. Hamelmann <i>et al.</i>, “Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases,” <i>Vacuum</i>, vol. 76, no. 2–3, pp. 139–142, 2004.","short":"F. Hamelmann, A. Aschentrup, A. Brechling, U. Heinzmann, M. Abrashev, A. Szekeres, K. Gesheva, Vacuum 76 (2004) 139–142.","mla":"Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Carbon Films from Methane and the Influence of the Plasma Parameters and Additional Gases.” <i>Vacuum</i>, vol. 76, no. 2–3, Elsevier BV, 2004, pp. 139–42, doi:<a href=\"https://doi.org/10.1016/j.vacuum.2004.07.074\">10.1016/j.vacuum.2004.07.074</a>.","bibtex":"@article{Hamelmann_Aschentrup_Brechling_Heinzmann_Abrashev_Szekeres_Gesheva_2004, title={Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases}, volume={76}, DOI={<a href=\"https://doi.org/10.1016/j.vacuum.2004.07.074\">10.1016/j.vacuum.2004.07.074</a>}, number={2–3}, journal={Vacuum}, publisher={Elsevier BV}, author={Hamelmann, Frank and Aschentrup, A. and Brechling, A. and Heinzmann, U. and Abrashev, M. and Szekeres, A. and Gesheva, K.}, year={2004}, pages={139–142} }","ama":"Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. <i>Vacuum</i>. 2004;76(2-3):139-142. doi:<a href=\"https://doi.org/10.1016/j.vacuum.2004.07.074\">10.1016/j.vacuum.2004.07.074</a>","apa":"Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Abrashev, M., Szekeres, A., &#38; Gesheva, K. (2004). Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. <i>Vacuum</i>, <i>76</i>(2–3), 139–142. <a href=\"https://doi.org/10.1016/j.vacuum.2004.07.074\">https://doi.org/10.1016/j.vacuum.2004.07.074</a>"},"_id":"3543","publication_identifier":{"issn":["0042207X"]},"type":"journal_article","date_created":"2023-09-01T09:56:38Z","doi":"10.1016/j.vacuum.2004.07.074","status":"public"}