{"user_id":"216459","publication_status":"published","page":"90-93","intvolume":"       358","volume":358,"issue":"1-2","author":[{"id":"208487","last_name":"Hamelmann","first_name":"Frank","full_name":"Hamelmann, Frank"},{"last_name":"Haindl","first_name":"G","full_name":"Haindl, G"},{"last_name":"Schmalhorst","first_name":"J","full_name":"Schmalhorst, J"},{"full_name":"Aschentrup, A","first_name":"A","last_name":"Aschentrup"},{"full_name":"Majkova, E","last_name":"Majkova","first_name":"E"},{"first_name":"U","last_name":"Kleineberg","full_name":"Kleineberg, U"},{"last_name":"Heinzmann","first_name":"U","full_name":"Heinzmann, U"},{"last_name":"Klipp","first_name":"A","full_name":"Klipp, A"},{"full_name":"Jutzi, P","first_name":"P","last_name":"Jutzi"},{"first_name":"A","last_name":"Anopchenko","full_name":"Anopchenko, A"},{"full_name":"Jergel, M","first_name":"M","last_name":"Jergel"},{"last_name":"Luby","first_name":"S","full_name":"Luby, S"}],"publisher":"Elsevier BV","title":"Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD","date_updated":"2023-09-01T10:24:28Z","language":[{"iso":"eng"}],"publication":"Thin Solid Films","year":"2000","citation":{"bibtex":"@article{Hamelmann_Haindl_Schmalhorst_Aschentrup_Majkova_Kleineberg_Heinzmann_Klipp_Jutzi_Anopchenko_et al._2000, title={Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD}, volume={358}, DOI={<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hamelmann, Frank and Haindl, G and Schmalhorst, J and Aschentrup, A and Majkova, E and Kleineberg, U and Heinzmann, U and Klipp, A and Jutzi, P and Anopchenko, A and et al.}, year={2000}, pages={90–93} }","ama":"Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>. 2000;358(1-2):90-93. doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>","apa":"Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. <i>Thin Solid Films</i>, <i>358</i>(1–2), 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>","chicago":"Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i> 358, no. 1–2 (2000): 90–93. <a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">https://doi.org/10.1016/S0040-6090(99)00695-1</a>.","alphadin":"<span style=\"font-variant:small-caps;\"><span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Haindl, G</span> ; <span style=\"font-variant:small-caps;\">Schmalhorst, J</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span> ; <span style=\"font-variant:small-caps;\">Klipp, A</span> ; u. a.</span>: Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. In: <i>Thin Solid Films</i> Bd. 358, Elsevier BV (2000), Nr. 1–2, S. 90–93","ieee":"F. Hamelmann <i>et al.</i>, “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” <i>Thin Solid Films</i>, vol. 358, no. 1–2, pp. 90–93, 2000.","short":"F. Hamelmann, G. Haindl, J. Schmalhorst, A. Aschentrup, E. Majkova, U. Kleineberg, U. Heinzmann, A. Klipp, P. Jutzi, A. Anopchenko, M. Jergel, S. Luby, Thin Solid Films 358 (2000) 90–93.","mla":"Hamelmann, Frank, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” <i>Thin Solid Films</i>, vol. 358, no. 1–2, Elsevier BV, 2000, pp. 90–93, doi:<a href=\"https://doi.org/10.1016/S0040-6090(99)00695-1\">10.1016/S0040-6090(99)00695-1</a>."},"_id":"3550","publication_identifier":{"issn":["00406090"]},"status":"public","date_created":"2023-09-01T10:03:34Z","type":"journal_article","doi":"10.1016/S0040-6090(99)00695-1"}