{"publisher":"Elsevier BV","publication":"Applied Surface Science","author":[{"full_name":"Luby, S","last_name":"Luby","first_name":"S"},{"full_name":"Jergel, M","last_name":"Jergel","first_name":"M"},{"last_name":"Anopchenko","first_name":"A","full_name":"Anopchenko, A"},{"full_name":"Aschentrup, A","last_name":"Aschentrup","first_name":"A"},{"id":"208487","last_name":"Hamelmann","first_name":"Frank","full_name":"Hamelmann, Frank"},{"full_name":"Majkova, E","last_name":"Majkova","first_name":"E"},{"full_name":"Kleineberg, U","first_name":"U","last_name":"Kleineberg"},{"last_name":"Heinzmann","first_name":"U","full_name":"Heinzmann, U"}],"publication_status":"published","status":"public","date_updated":"2023-09-01T10:20:28Z","issue":"1-4","date_created":"2023-09-01T10:06:52Z","year":"1999","_id":"3554","citation":{"ieee":"S. Luby <i>et al.</i>, “Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing,” <i>Applied Surface Science</i>, vol. 150, no. 1–4, pp. 178–184, 1999.","alphadin":"<span style=\"font-variant:small-caps;\">Luby, S</span> ; <span style=\"font-variant:small-caps;\">Jergel, M</span> ; <span style=\"font-variant:small-caps;\">Anopchenko, A</span> ; <span style=\"font-variant:small-caps;\">Aschentrup, A</span> ; <span style=\"font-variant:small-caps;\">Hamelmann, Frank</span> ; <span style=\"font-variant:small-caps;\">Majkova, E</span> ; <span style=\"font-variant:small-caps;\">Kleineberg, U</span> ; <span style=\"font-variant:small-caps;\">Heinzmann, U</span>: Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. In: <i>Applied Surface Science</i> Bd. 150, Elsevier BV (1999), Nr. 1–4, S. 178–184","chicago":"Luby, S, M Jergel, A Anopchenko, A Aschentrup, Frank Hamelmann, E Majkova, U Kleineberg, and U Heinzmann. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal Annealing.” <i>Applied Surface Science</i> 150, no. 1–4 (1999): 178–84. <a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">https://doi.org/10.1016/S0169-4332(99)00243-3</a>.","mla":"Luby, S., et al. “Thermal Behaviour of Co/Si/W/Si Multilayers under Rapid Thermal Annealing.” <i>Applied Surface Science</i>, vol. 150, no. 1–4, Elsevier BV, 1999, pp. 178–84, doi:<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>.","bibtex":"@article{Luby_Jergel_Anopchenko_Aschentrup_Hamelmann_Majkova_Kleineberg_Heinzmann_1999, title={Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing}, volume={150}, DOI={<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>}, number={1–4}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Luby, S and Jergel, M and Anopchenko, A and Aschentrup, A and Hamelmann, Frank and Majkova, E and Kleineberg, U and Heinzmann, U}, year={1999}, pages={178–184} }","apa":"Luby, S., Jergel, M., Anopchenko, A., Aschentrup, A., Hamelmann, F., Majkova, E., … Heinzmann, U. (1999). Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. <i>Applied Surface Science</i>, <i>150</i>(1–4), 178–184. <a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">https://doi.org/10.1016/S0169-4332(99)00243-3</a>","short":"S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova, U. Kleineberg, U. Heinzmann, Applied Surface Science 150 (1999) 178–184.","ama":"Luby S, Jergel M, Anopchenko A, et al. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing. <i>Applied Surface Science</i>. 1999;150(1-4):178-184. doi:<a href=\"https://doi.org/10.1016/S0169-4332(99)00243-3\">10.1016/S0169-4332(99)00243-3</a>"},"title":"Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing","publication_identifier":{"issn":["01694332"]},"type":"journal_article","volume":150,"doi":"10.1016/S0169-4332(99)00243-3","page":"178-184","intvolume":"       150","language":[{"iso":"eng"}],"user_id":"216459"}