{"doi":"10.1016/S0368-2048(98)00374-0","type":"journal_article","date_created":"2023-09-01T10:07:44Z","status":"public","publication_identifier":{"issn":["03682048"]},"year":"1999","publication":"Journal of Electron Spectroscopy and Related Phenomena","_id":"3555","citation":{"alphadin":"Kleineberg, U ; Menke, D ; Hamelmann, Frank ; Heinzmann, U ; Schmidt, O ; Fecher, G.H ; Schoenhense, G: Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. In: Journal of Electron Spectroscopy and Related Phenomena Bd. 101–103, Elsevier BV (1999), S. 931–936","chicago":"Kleineberg, U, D Menke, Frank Hamelmann, U Heinzmann, O Schmidt, G.H Fecher, and G Schoenhense. “Photoemission Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY.” Journal of Electron Spectroscopy and Related Phenomena 101–103 (1999): 931–36. https://doi.org/10.1016/S0368-2048(98)00374-0.","mla":"Kleineberg, U., et al. “Photoemission Microscopy with Microspot-XPS by Use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY.” Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103, Elsevier BV, 1999, pp. 931–36, doi:10.1016/S0368-2048(98)00374-0.","short":"U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.. Fecher, G. Schoenhense, Journal of Electron Spectroscopy and Related Phenomena 101–103 (1999) 931–936.","ieee":"U. Kleineberg et al., “Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY,” Journal of Electron Spectroscopy and Related Phenomena, vol. 101–103, pp. 931–936, 1999.","bibtex":"@article{Kleineberg_Menke_Hamelmann_Heinzmann_Schmidt_Fecher_Schoenhense_1999, title={Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY}, volume={101–103}, DOI={10.1016/S0368-2048(98)00374-0}, journal={Journal of Electron Spectroscopy and Related Phenomena}, publisher={Elsevier BV}, author={Kleineberg, U and Menke, D and Hamelmann, Frank and Heinzmann, U and Schmidt, O and Fecher, G.H and Schoenhense, G}, year={1999}, pages={931–936} }","apa":"Kleineberg, U., Menke, D., Hamelmann, F., Heinzmann, U., Schmidt, O., Fecher, G. ., & Schoenhense, G. (1999). Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena, 101–103, 931–936. https://doi.org/10.1016/S0368-2048(98)00374-0","ama":"Kleineberg U, Menke D, Hamelmann F, et al. Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY. Journal of Electron Spectroscopy and Related Phenomena. 1999;101-103:931-936. doi:10.1016/S0368-2048(98)00374-0"},"date_updated":"2023-09-01T10:19:09Z","language":[{"iso":"eng"}],"title":"Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY","publisher":"Elsevier BV","author":[{"first_name":"U","last_name":"Kleineberg","full_name":"Kleineberg, U"},{"full_name":"Menke, D","first_name":"D","last_name":"Menke"},{"full_name":"Hamelmann, Frank","last_name":"Hamelmann","first_name":"Frank","id":"208487"},{"first_name":"U","last_name":"Heinzmann","full_name":"Heinzmann, U"},{"full_name":"Schmidt, O","last_name":"Schmidt","first_name":"O"},{"first_name":"G.H","last_name":"Fecher","full_name":"Fecher, G.H"},{"full_name":"Schoenhense, G","first_name":"G","last_name":"Schoenhense"}],"volume":"101-103","page":"931-936","publication_status":"published","user_id":"216459"}