---
_id: '6895'
abstract:
- lang: eng
  text: "                  The evolution of the giant magnetoresistance (GMR) effect
    in sputtered combination multilayers (CMLs) of type Py1.8nm//{(Cu1.8nm/Py1.6nm)N/(Cu0.9nm/Py1.6nm)N}y
    with Py (permalloy=Ni81Fe19) has been investigated at room temperature. It is
    shown that the GMR characteristic of these CMLs can be phenomenologically predicted,
    if the physical properties are known, i.e., the GMR effect amplitude, double layer
    conductance, and bilinear and biquadratic antiferromagnetic exchange coupling
    constants of the two underlying {Cu/Py}N base systems at the first (Cu0.9nm) and
    second (Cu1.8nm) antiferromagnetic coupling maximum (AFCM). The GMR characteristic
    of the simplest CML with N=1 is, e.g., determined by averaging the bilinear and
    biquadratic exchange coupling constants of the two base systems. The GMR characteristics
    of CML with N⩾2 are a superposition of that of the underlying {Cu/Py}N base systems
    weighted by the fraction of the corresponding double layer conductance. Furthermore,
    it is demonstrated that the CMLs are interesting from an application point of
    view since they combine the temperature stability of the underlying {Cu/Py}N base
    system at the second AFCM with a larger GMR effect amplitude.\r\n                "
article_type: original
author:
- first_name: S.
  full_name: Heitmann, S.
  last_name: Heitmann
- first_name: A.
  full_name: Hütten, A.
  last_name: Hütten
- first_name: T.
  full_name: Hempel, T.
  last_name: Hempel
- first_name: W.
  full_name: Schepper, W.
  last_name: Schepper
- first_name: G.
  full_name: Reiss, G.
  last_name: Reiss
- first_name: C.
  full_name: Alof, C.
  last_name: Alof
citation:
  alphadin: '<span style="font-variant:small-caps;">Heitmann, S.</span> ; <span style="font-variant:small-caps;">Hütten,
    A.</span> ; <span style="font-variant:small-caps;">Hempel, T.</span> ; <span style="font-variant:small-caps;">Schepper,
    W.</span> ; <span style="font-variant:small-caps;">Reiss, G.</span> ; <span style="font-variant:small-caps;">Alof,
    C.</span>: Interplay of antiferromagnetic coupling in copper/permalloy combination
    multilayers. In: <i>Journal of Applied Physics</i> Bd. 87, AIP Publishing (2000),
    Nr. 9, S. 4849–4851'
  ama: Heitmann S, Hütten A, Hempel T, Schepper W, Reiss G, Alof C. Interplay of antiferromagnetic
    coupling in copper/permalloy combination multilayers. <i>Journal of Applied Physics</i>.
    2000;87(9):4849-4851. doi:<a href="https://doi.org/10.1063/1.373179">10.1063/1.373179</a>
  apa: Heitmann, S., Hütten, A., Hempel, T., Schepper, W., Reiss, G., &#38; Alof,
    C. (2000). Interplay of antiferromagnetic coupling in copper/permalloy combination
    multilayers. <i>Journal of Applied Physics</i>, <i>87</i>(9), 4849–4851. <a href="https://doi.org/10.1063/1.373179">https://doi.org/10.1063/1.373179</a>
  bibtex: '@article{Heitmann_Hütten_Hempel_Schepper_Reiss_Alof_2000, title={Interplay
    of antiferromagnetic coupling in copper/permalloy combination multilayers}, volume={87},
    DOI={<a href="https://doi.org/10.1063/1.373179">10.1063/1.373179</a>}, number={9},
    journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Heitmann,
    S. and Hütten, A. and Hempel, T. and Schepper, W. and Reiss, G. and Alof, C.},
    year={2000}, pages={4849–4851} }'
  chicago: 'Heitmann, S., A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof.
    “Interplay of Antiferromagnetic Coupling in Copper/Permalloy Combination Multilayers.”
    <i>Journal of Applied Physics</i> 87, no. 9 (2000): 4849–51. <a href="https://doi.org/10.1063/1.373179">https://doi.org/10.1063/1.373179</a>.'
  ieee: S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, and C. Alof, “Interplay
    of antiferromagnetic coupling in copper/permalloy combination multilayers,” <i>Journal
    of Applied Physics</i>, vol. 87, no. 9, pp. 4849–4851, 2000.
  mla: Heitmann, S., et al. “Interplay of Antiferromagnetic Coupling in Copper/Permalloy
    Combination Multilayers.” <i>Journal of Applied Physics</i>, vol. 87, no. 9, AIP
    Publishing, 2000, pp. 4849–51, doi:<a href="https://doi.org/10.1063/1.373179">10.1063/1.373179</a>.
  short: S. Heitmann, A. Hütten, T. Hempel, W. Schepper, G. Reiss, C. Alof, Journal
    of Applied Physics 87 (2000) 4849–4851.
date_created: 2026-05-08T14:09:24Z
date_updated: 2026-05-08T14:09:52Z
department:
- _id: '103'
doi: 10.1063/1.373179
intvolume: '        87'
issue: '9'
language:
- iso: eng
page: 4849-4851
publication: Journal of Applied Physics
publication_identifier:
  eissn:
  - 1089-7550
  issn:
  - 0021-8979
publication_status: published
publisher: AIP Publishing
quality_controlled: '1'
research_group:
- _id: af778127-b366-11ed-bde2-daed2b8eafee
  name: Bielefelder Institut für Angewandte Materialforschung (BIfAM)
status: public
title: Interplay of antiferromagnetic coupling in copper/permalloy combination multilayers
type: journal_article
user_id: '202389'
volume: 87
year: '2000'
...