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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
Klipp, A., Hamelmann, F., Haindl, G., Hartwich, J., Kleineberg, U., Jutzi, P., & Heinzmann, U. (2000). Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition, 6(2), 63–66. https://doi.org/10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
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