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Thin film zinc oxide deposited by CVD and PVD

F. Hamelmann, Journal of Physics: Conference Series 764 (2016).

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Artikel | Veröffentlicht | Englisch
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Journal of Physics: Conference Series
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764
Artikelnummer
012001
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Hamelmann, Frank: Thin film zinc oxide deposited by CVD and PVD. In: Journal of Physics: Conference Series Bd. 764, IOP Publishing (2016)
Hamelmann F. Thin film zinc oxide deposited by CVD and PVD. Journal of Physics: Conference Series. 2016;764. doi:10.1088/1742-6596/764/1/012001
Hamelmann, F. (2016). Thin film zinc oxide deposited by CVD and PVD. Journal of Physics: Conference Series, 764. https://doi.org/10.1088/1742-6596/764/1/012001
@article{Hamelmann_2016, title={Thin film zinc oxide deposited by CVD and PVD}, volume={764}, DOI={10.1088/1742-6596/764/1/012001}, number={012001}, journal={Journal of Physics: Conference Series}, publisher={IOP Publishing}, author={Hamelmann, Frank}, year={2016} }
Hamelmann, Frank. “Thin Film Zinc Oxide Deposited by CVD and PVD.” Journal of Physics: Conference Series 764 (2016). https://doi.org/10.1088/1742-6596/764/1/012001.
F. Hamelmann, “Thin film zinc oxide deposited by CVD and PVD,” Journal of Physics: Conference Series, vol. 764, 2016.
Hamelmann, Frank. “Thin Film Zinc Oxide Deposited by CVD and PVD.” Journal of Physics: Conference Series, vol. 764, 012001, IOP Publishing, 2016, doi:10.1088/1742-6596/764/1/012001.

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