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3788 Publikationen


2001 | Artikel | FH-PUB-ID: 3580
H. Brandt-Pook, B. Korzen, J. Boidol, and H. Peyn, “Anwendungsentwicklung in zeitrestriktiven dynamischen Projekten,” Wirtschaftsinformatik, vol. 43, no. 3, pp. 247–254, 2001.
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2001 | Fachbuch | FH-PUB-ID: 3865
W. Vogelgesang, I. Eisenbürger, A. Haubrichs, and M. Schorch, Meine Zukunft bin ich! Alltag und Lebensplanung Jugendlicher. Frankfurt/Main: Campus-Verlag, 2001.
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2001 | Artikel | FH-PUB-ID: 3546
F. Hamelmann et al., “Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD,” Le Journal de Physique IV, vol. 11, no. 3, pp. 431–436, 2001.
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2001 | Artikel | FH-PUB-ID: 2684
S. Heitmann, A. Hütten, T. Hempel, W. Schepper, and G. Reiss, “Enhanced GMR amplitude and temperature stability of copper/permalloy combination multilayers,” Journal of Magnetism and Magnetic Materials, vol. 226–230, pp. 1752–1754, 2001.
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2001 | Artikel | FH-PUB-ID: 2683
J. Schleiwies, G. Schmitz, S. Heitmann, and A. Hütten, “Nanoanalysis of Co/Cu/NiFe thin films by tomographic atom probe,” Applied Physics Letters, vol. 78, no. 22, pp. 3439–3441, 2001.
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2001 | Artikel | FH-PUB-ID: 2139
U. Wagner and S. Battermann, “Use of the New Laboratory Device Communication Profile Standard Based on Measurement Bus,” Chemie Ingenieur Technik, vol. 73, no. 6, pp. 656–656, 2001.
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2000 | Rezension | FH-PUB-ID: 5682
C. Cottin, “Bericht von der 18. Tagung der Deutschen AFIR-Gruppe am 15. November 99 in München,” Der Aktuar, no. 1. 2000.
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2000 | Rezension | FH-PUB-ID: 5683
C. Cottin, “Bericht von der 19. Tagung der Deutschen AFIR-Gruppe am 27. April 2000 in Hamburg,” Der Aktuar, no. 2. 2000.
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2000 | Rezension | FH-PUB-ID: 5685
C. Cottin, “Bericht von der 20. Tagung der Deutschen AFIR-Gruppe am 20. November 2000 in München,” no. 4. 2000.
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2000 | Artikel | FH-PUB-ID: 5684
C. Cottin, “Arbeitsmarkt für (Versicherungs-)Mathematiker,” Der Aktuar, no. 2, 2000.
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2000 | Artikel | FH-PUB-ID: 5631
B. Chalmers, C. Cottin, and B. Shekhtman, “Minimal Boolean sum and blending-type projections and extensions,” Computers & Mathematics with Applications, vol. 40, no. 1, pp. 63–70, 2000.
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2000 | Artikel | FH-PUB-ID: 5259
K. Meskouris and U. Weitkemper, “Numerische Modellierung von Wandscheibenbauten unter Erdbebenbeanspruchung,” Die Bautechnik, vol. 77, no. 3, 2000.
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2000 | Artikel | FH-PUB-ID: 1505
B. Bachmann and H. Wiesmann, “Objektorientierte Modellierung Physikalischer Systeme, Teil 15 (Object-Oriented Modeling of Physical Systems, Part 15),” at - Automatisierungstechnik, vol. 48, no. 8, 2000.
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2000 | Konferenzbeitrag | FH-PUB-ID: 4765
R. H. W. Hoppe and S. Petrova, “Applications of the Newton interior-point method for Maxwell´s equations,” in 16th IMACS World Congress on Scientific Computation, Applied Mathematics and Simulation: Lausanne, Switzerland, August 21 - 25, 2000, Lausanne, Schweiz, 2000.
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2000 | Artikel | FH-PUB-ID: 4766
S. Petrova, L. Tobiska, and P. S. Vassilevski, “Multigrid methods based on matrix-dependent coarse spaces for nonconforming streamline-diffusion finite element discretization of convection-diffusion problems,” EAST WEST JOURNAL OF NUMERICAL MATHEMATICS, vol. 8, no. 3, pp. 223–242, 2000.
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2000 | Artikel | FH-PUB-ID: 3581
H. Brandt-Pook, S. Wachsmuth, G. Socher, F. Kummert, and G. Sagerer, “Integration of vision and speech understanding using bayesian networks, ,” Videre: A Journal of Computer Vision Research, vol. 1, no. 4, pp. 61–83, 2000.
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2000 | Buchbeitrag | FH-PUB-ID: 3548
A. Klipp, S. H. A. Petri, P. Jutzi, F. Hamelmann, and U. Heinmann, “The Synthesis of Cyclopentadienyl Silanes and Disilanes and their Fragmentation under Thermal CVD Conditions,” in Organosilicon Chemistry IV, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 806–811.
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2000 | Artikel | FH-PUB-ID: 3550
F. Hamelmann et al., “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” Thin Solid Films, vol. 358, no. 1–2, pp. 90–93, 2000.
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2000 | Artikel | FH-PUB-ID: 3551
A. Klipp et al., “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” Chemical Vapor Deposition, vol. 6, no. 2, pp. 63–66, 2000.
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2000 | Buchbeitrag | FH-PUB-ID: 3549
F. Hamelmann et al., “In-Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me4H)SiH3 as Silicon Precursors,” in Organosilicon Chemistry IV, N. Auner and J. Weis, Eds. Weinheim, Germany: Wiley-VCH Verlag GmbH, 2000, pp. 798–805.
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