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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3544
Hamelmann, Frank ; Aschentrup, A ; Brechling, A ; Heinzmann, U ; Gushterov, A ; Szekeres, A ; Simeonov, S: Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. In: Vacuum Bd. 75, Elsevier BV (2004), Nr. 4, S. 307–312
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| DOI
2004 | Artikel | FH-PUB-ID: 3543
Hamelmann, Frank ; Aschentrup, A. ; Brechling, A. ; Heinzmann, U. ; Abrashev, M. ; Szekeres, A. ; Gesheva, K.: Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. In: Vacuum Bd. 76, Elsevier BV (2004), Nr. 2–3, S. 139–142
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| DOI