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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3544
Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Silicon Oxide Films in a Remote PECVD Reactor and Characterization of Films Produced under Different Conditions.” Vacuum, vol. 75, no. 4, Elsevier BV, 2004, pp. 307–12, doi:10.1016/j.vacuum.2004.03.012.
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3545
Ivanova, T., et al. “Optical and Electrochromic Properties of CVD Mixed MoO3–WO3 Thin Films.” Vacuum, vol. 76, no. 2–3, Elsevier BV, 2004, pp. 195–98, doi:10.1016/j.vacuum.2004.07.012.
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3543
Hamelmann, Frank, et al. “Plasma-Assisted Deposition of Thin Carbon Films from Methane and the Influence of the Plasma Parameters and Additional Gases.” Vacuum, vol. 76, no. 2–3, Elsevier BV, 2004, pp. 139–42, doi:10.1016/j.vacuum.2004.07.074.
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| DOI