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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3544
Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum. 2004;75(4):307-312. doi:10.1016/j.vacuum.2004.03.012
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3545
Ivanova T, Gesheva K, Hamelmann F, et al. Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films. Vacuum. 2004;76(2-3):195-198. doi:10.1016/j.vacuum.2004.07.012
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3543
Hamelmann F, Aschentrup A, Brechling A, et al. Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum. 2004;76(2-3):139-142. doi:10.1016/j.vacuum.2004.07.074
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| DOI