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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3544
Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Gushterov, A., Szekeres, A., & Simeonov, S. (2004). Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions. Vacuum, 75(4), 307–312. https://doi.org/10.1016/j.vacuum.2004.03.012
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3545
Ivanova, T., Gesheva, K., Hamelmann, F., Popkirov, G., Abrashev, M., Ganchev, M., & Tzvetkova, E. (2004). Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films. Vacuum, 76(2–3), 195–198. https://doi.org/10.1016/j.vacuum.2004.07.012
HSBI-PUB
| DOI
2004 | Artikel | FH-PUB-ID: 3543
Hamelmann, F., Aschentrup, A., Brechling, A., Heinzmann, U., Abrashev, M., Szekeres, A., & Gesheva, K. (2004). Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases. Vacuum, 76(2–3), 139–142. https://doi.org/10.1016/j.vacuum.2004.07.074
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| DOI