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3 Publikationen


2004 | Artikel | FH-PUB-ID: 3544
F. Hamelmann et al., “Plasma-assisted deposition of thin silicon oxide films in a remote PECVD reactor and characterization of films produced under different conditions,” Vacuum, vol. 75, no. 4, pp. 307–312, 2004.
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2004 | Artikel | FH-PUB-ID: 3545
T. Ivanova et al., “Optical and electrochromic properties of CVD mixed MoO3–WO3 thin films,” Vacuum, vol. 76, no. 2–3, pp. 195–198, 2004.
HSBI-PUB | DOI
 

2004 | Artikel | FH-PUB-ID: 3543
F. Hamelmann et al., “Plasma-assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases,” Vacuum, vol. 76, no. 2–3, pp. 139–142, 2004.
HSBI-PUB | DOI
 

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