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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
Klipp, A. ; Hamelmann, Frank ; Haindl, G. ; Hartwich, J. ; Kleineberg, U. ; Jutzi, P. ; Heinzmann, U.: Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. In: Chemical Vapor Deposition Bd. 6, Wiley (2000), Nr. 2, S. 63–66
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