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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
@article{Klipp_Hamelmann_Haindl_Hartwich_Kleineberg_Jutzi_Heinzmann_2000, title={Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films}, volume={6}, DOI={10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q}, number={2}, journal={Chemical Vapor Deposition}, publisher={Wiley}, author={Klipp, A. and Hamelmann, Frank and Haindl, G. and Hartwich, J. and Kleineberg, U. and Jutzi, P. and Heinzmann, U.}, year={2000}, pages={63–66} }
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