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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
Klipp A, Hamelmann F, Haindl G, et al. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films. Chemical Vapor Deposition. 2000;6(2):63-66. doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q
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