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1 Publikation


2000 | Artikel | FH-PUB-ID: 3551
A. Klipp et al., “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films,” Chemical Vapor Deposition, vol. 6, no. 2, pp. 63–66, 2000.
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Zitationsstil: IEEE

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