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1 Publikation
2000 | Artikel | FH-PUB-ID: 3551
Klipp, A., et al. “Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the CVD of Thin Silicon Films.” Chemical Vapor Deposition, vol. 6, no. 2, Wiley, 2000, pp. 63–66, doi:10.1002/(SICI)1521-3862(200004)6:2<63::AID-CVDE63>3.0.CO;2-Q.
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