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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3542
Hamelmann F, Brechling A, Aschentrup A, et al. Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. Thin Solid Films. 2004;446(2):167-171. doi:10.1016/j.tsf.2003.09.045
HSBI-PUB
| DOI
2000 | Artikel | FH-PUB-ID: 3550
Hamelmann F, Haindl G, Schmalhorst J, et al. Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. Thin Solid Films. 2000;358(1-2):90-93. doi:10.1016/S0040-6090(99)00695-1
HSBI-PUB
| DOI
1999 | Artikel | FH-PUB-ID: 3553
Hamelmann F, Petri SHA, Klipp A, et al. W/Si multilayers deposited by hot-filament MOCVD. Thin Solid Films. 1999;338(1-2):70-74. doi:10.1016/S0040-6090(98)00996-1
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| DOI