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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3542
Hamelmann, F., Brechling, A., Aschentrup, A., Heinzmann, U., Jutzi, P., Sandrock, J., … Gesheva, K. (2004). Thin molybdenum oxide films produced by molybdenum pentacarbonyl 1-methylbutylisonitrile with plasma-assisted chemical vapor deposition. Thin Solid Films, 446(2), 167–171. https://doi.org/10.1016/j.tsf.2003.09.045
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| DOI
2000 | Artikel | FH-PUB-ID: 3550
Hamelmann, F., Haindl, G., Schmalhorst, J., Aschentrup, A., Majkova, E., Kleineberg, U., … Luby, S. (2000). Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD. Thin Solid Films, 358(1–2), 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1
HSBI-PUB
| DOI
1999 | Artikel | FH-PUB-ID: 3553
Hamelmann, F., Petri, S. H. A., Klipp, A., Haindl, G., Hartwich, J., Dreeskornfeld, L., … Heinzmann, U. (1999). W/Si multilayers deposited by hot-filament MOCVD. Thin Solid Films, 338(1–2), 70–74. https://doi.org/10.1016/S0040-6090(98)00996-1
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| DOI