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3 Publikationen
2004 | Artikel | FH-PUB-ID: 3542
Hamelmann, Frank, A. Brechling, A. Aschentrup, U. Heinzmann, P. Jutzi, J. Sandrock, U. Siemeling, T. Ivanova, A. Szekeres, and K. Gesheva. “Thin Molybdenum Oxide Films Produced by Molybdenum Pentacarbonyl 1-Methylbutylisonitrile with Plasma-Assisted Chemical Vapor Deposition.” Thin Solid Films 446, no. 2 (2004): 167–71. https://doi.org/10.1016/j.tsf.2003.09.045.
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| DOI
2000 | Artikel | FH-PUB-ID: 3550
Hamelmann, Frank, G Haindl, J Schmalhorst, A Aschentrup, E Majkova, U Kleineberg, U Heinzmann, et al. “Metal Oxide/Silicon Oxide Multilayer with Smooth Interfaces Produced by in Situ Controlled Plasma-Enhanced MOCVD.” Thin Solid Films 358, no. 1–2 (2000): 90–93. https://doi.org/10.1016/S0040-6090(99)00695-1.
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| DOI
1999 | Artikel | FH-PUB-ID: 3553
Hamelmann, Frank, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, and U. Heinzmann. “W/Si Multilayers Deposited by Hot-Filament MOCVD.” Thin Solid Films 338, no. 1–2 (1999): 70–74. https://doi.org/10.1016/S0040-6090(98)00996-1.
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| DOI